{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2023,10,23]],"date-time":"2023-10-23T07:40:01Z","timestamp":1698046801688},"reference-count":3,"publisher":"Wiley","issue":"2","license":[{"start":{"date-parts":[[2008,9,12]],"date-time":"2008-09-12T00:00:00Z","timestamp":1221177600000},"content-version":"vor","delay-in-days":6770,"URL":"http:\/\/onlinelibrary.wiley.com\/termsAndConditions#vor"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Trans Emerging Tel Tech"],"published-print":{"date-parts":[[1990,3]]},"abstract":"<jats:title>Abstract<\/jats:title><jats:p>A single\u2010layer resist process for X\u2010ray master mask fabrication by electron beam lithography is theoretically and experimentally investigated. In the mask fabrication process boron nitride membranes are utilized and final absorber structures are obtained by Au electroplating after e\u2010beam patterning at different primary beam energies, on a single PMMA layer of 10000 A. The e\u2010beam energies experimentally utilized are 20 and 30 keV. Detailed Monte Carlo analysis of the rnultilayer structure is carried out at 10, 20, 30 and 40 keV, the corresponding proximity function calculated and compared to experiment. It is found that an important source of backscattering is constituted by the thin metal layer as plating base, while the ultimate limit for resolution seems to be determined by forward scattering. Finally, it is demonstrated that by proper selection of the e\u2010beam energy it is possible to obtain high contrast absorbers down to 0.3 \u03bcm lines and spaces.<\/jats:p>","DOI":"10.1002\/ett.4460010211","type":"journal-article","created":{"date-parts":[[2008,9,12]],"date-time":"2008-09-12T12:57:22Z","timestamp":1221224242000},"page":"143-147","source":"Crossref","is-referenced-by-count":0,"title":["Modeling of electron beam scattering in high resolution lithography for the fabrication of X\u2010Ray masks"],"prefix":"10.1002","volume":"1","author":[{"given":"M.","family":"Gentili","sequence":"first","affiliation":[]},{"given":"A.","family":"Lucchesini","sequence":"additional","affiliation":[]},{"given":"L.","family":"Scopa","sequence":"additional","affiliation":[]},{"given":"P.","family":"Lugli","sequence":"additional","affiliation":[]},{"given":"A.","family":"Paoletti","sequence":"additional","affiliation":[]},{"given":"G.","family":"Messina","sequence":"additional","affiliation":[]},{"given":"S.","family":"Santangelo","sequence":"additional","affiliation":[]},{"given":"A.","family":"Tucciarone","sequence":"additional","affiliation":[]}],"member":"311","published-online":{"date-parts":[[2008,9,12]]},"reference":[{"key":"e_1_2_1_2_2","unstructured":"R.Viswanathan R. E.Acosta D.Seeger H.Voelker A. D.Wilson I.Babich J.Maldonado J.Warlaumont O.Vladimirsky F.Hohn D.Crockatt R.Fair:Fully scaled 0.5 \u03bcm MOS Circuits by synchrotron radiation X\u2010ray lithography: mark fabrication and characterization. In Proc. of Microcircuit Engineering '88 Vienna Austria."},{"key":"e_1_2_1_3_2","unstructured":"D. F.Kyser K.Murata:Monte Carlo simulation of electron beam scattering and energy loss in thin films on thick substrates. In R. Bakish (Ed.) Proceedings of the 6th Int. Conf. on Electron & Ion Beam Science and Yechnol. p.205 Electrochemical Society. Princeton. New Jersey.1974."},{"key":"e_1_2_1_4_2","doi-asserted-by":"publisher","DOI":"10.1016\/B978-0-12-133550-2.50007-9"}],"container-title":["European Transactions on Telecommunications"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.wiley.com\/onlinelibrary\/tdm\/v1\/articles\/10.1002%2Fett.4460010211","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/onlinelibrary.wiley.com\/doi\/pdf\/10.1002\/ett.4460010211","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2023,10,22]],"date-time":"2023-10-22T09:21:59Z","timestamp":1697966519000},"score":1,"resource":{"primary":{"URL":"https:\/\/onlinelibrary.wiley.com\/doi\/10.1002\/ett.4460010211"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[1990,3]]},"references-count":3,"journal-issue":{"issue":"2","published-print":{"date-parts":[[1990,3]]}},"alternative-id":["10.1002\/ett.4460010211"],"URL":"https:\/\/doi.org\/10.1002\/ett.4460010211","archive":["Portico"],"relation":{},"ISSN":["1124-318X","1541-8251"],"issn-type":[{"value":"1124-318X","type":"print"},{"value":"1541-8251","type":"electronic"}],"subject":[],"published":{"date-parts":[[1990,3]]}}}