{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2023,10,23]],"date-time":"2023-10-23T06:41:24Z","timestamp":1698043284850},"reference-count":10,"publisher":"Wiley","issue":"9","license":[{"start":{"date-parts":[[2007,3,22]],"date-time":"2007-03-22T00:00:00Z","timestamp":1174521600000},"content-version":"vor","delay-in-days":6289,"URL":"http:\/\/onlinelibrary.wiley.com\/termsAndConditions#vor"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Systems &amp;amp; Computers in Japan"],"published-print":{"date-parts":[[1990,1]]},"abstract":"<jats:title>Abstract<\/jats:title><jats:p>A new defect detection algorithm that compares grayscale images of actual patterns and an automatic visual inspection system implementing this algorithm have been developed. The objective is to detect defects reliably down to 0.3 \u03bcm in LSI photoresist patterns on a silicon wafer. To detect defects reliably while remaining uninfluenced by tiny differences between two images of satisfactory patterns, the images are matched in local windows by perturbing one image in the <jats:italic>x\u2010y<\/jats:italic> plane and in the brightness direction against the other image. The resulting unmatched regions are recognized as defects. One unique feature of the algorithm is its utilization of polarity changes in the subtracted images during the perturbation for deleting tiny differences between two images. All processing can be done in real time by local, one\u2010pass operators. The developed automatic visual inspection system has achieved a 100 percent detection rate for defects down to 0.3 \u03bcm.<\/jats:p>","DOI":"10.1002\/scj.4690210910","type":"journal-article","created":{"date-parts":[[2007,7,7]],"date-time":"2007-07-07T19:33:12Z","timestamp":1183836792000},"page":"99-112","source":"Crossref","is-referenced-by-count":3,"title":["Precise Visual Inspection of LSI Wafer Patterns by Local Perturbation Pattern Matching Algorithm"],"prefix":"10.1002","volume":"21","author":[{"given":"Yukio","family":"Matsuyama","sequence":"first","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hisafumi","family":"Iwata","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hitoshi","family":"Kubota","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Yasuo Nakagawa,","family":"Nonmembers","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"311","published-online":{"date-parts":[[2007,3,22]]},"reference":[{"key":"e_1_2_1_2_2","doi-asserted-by":"publisher","DOI":"10.1117\/12.947756"},{"key":"e_1_2_1_3_2","doi-asserted-by":"crossref","unstructured":"H.Ishihara T.Sooma M.Misonoo K.Takatsu andK.Akanuma.High\u2010speed reticle qualification system. Proc. SPIE 772. Optical Microlithography VI pp.248\u2013255(1987).","DOI":"10.1117\/12.967057"},{"issue":"11","key":"e_1_2_1_4_2","first-page":"1687","article-title":"A real time image processing algorithm for visual inspection of semiconductor wafer patterns","volume":"69","author":"Sakou H.","year":"1986","journal-title":"Trans. I.E.C.E."},{"key":"e_1_2_1_5_2","unstructured":"S.Fushimi H.Kubota Y.Hara andY.Nakagawa.Automated visual inspection system for aluminum patterns on LSI wafers. Proc. Kodak Microelectronics Seminar Interface '85 pp.93\u201397(1985)."},{"key":"e_1_2_1_6_2","unstructured":"K.Harris P.Sandland andR.Singleton.Automated inspection of wafer patterns with applications in stepping projection and direct write lithography. Solid\u2010State Technology pp.159\u2013179(Feb.1984)."},{"key":"e_1_2_1_7_2","unstructured":"Lasertec Corp.3WD36 Automatic Wafer Inspection System. 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Proc. 2nd Symposium on Industrial Image Sensing Technology pp.295\u2013300(July1987)."},{"key":"e_1_2_1_11_2","first-page":"46","volume-title":"Digital Picture Processing (2)","author":"Rosenfeld A.","year":"1982"}],"container-title":["Systems and Computers in Japan"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.wiley.com\/onlinelibrary\/tdm\/v1\/articles\/10.1002%2Fscj.4690210910","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/onlinelibrary.wiley.com\/doi\/pdf\/10.1002\/scj.4690210910","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2023,10,22]],"date-time":"2023-10-22T20:24:20Z","timestamp":1698006260000},"score":1,"resource":{"primary":{"URL":"https:\/\/onlinelibrary.wiley.com\/doi\/10.1002\/scj.4690210910"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[1990,1]]},"references-count":10,"journal-issue":{"issue":"9","published-print":{"date-parts":[[1990,1]]}},"alternative-id":["10.1002\/scj.4690210910"],"URL":"https:\/\/doi.org\/10.1002\/scj.4690210910","archive":["Portico"],"relation":{},"ISSN":["0882-1666","1520-684X"],"issn-type":[{"value":"0882-1666","type":"print"},{"value":"1520-684X","type":"electronic"}],"subject":[],"published":{"date-parts":[[1990,1]]}}}