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The performance of these devices is highly dependent on the fabrication quality of TFLN. Although state\u2010of\u2010the\u2010art TFLN microrings with an intrinsic quality factor (<jats:italic>Q<\/jats:italic>\u2010factor) exceeding 1 \u00d7 10<jats:sup>7<\/jats:sup> have been realized by inductively coupled plasma\u2013reactive ion etching (ICP\u2010RIE) and chemical mechanical polishing (CMP), ICP\u2010RIE has moderate throughput, moderate reproducibility, and high cost in etching TFLN, while CMP features moderate throughput and low cost in etching TFLN. Here, a wet etching method for TFLN, leading to the fabrication of a micro\u2010racetrack with an intrinsic <jats:italic>Q<\/jats:italic>\u2010factor of over 9.27 \u00d7 10<jats:sup>6<\/jats:sup> is developed. The suitability of this method to fabricate a narrow coupling gap between the bus waveguide and microring enables the coupling conditions of the microring to be customized. This method features a high throughput, a high reproducibility, and a low cost in etching TFLN, showing the potential to boost the mass production of integrated LN photonic devices with high fidelity and affordability\u00a0dramatically.<\/jats:p>","DOI":"10.1002\/adma.202208113","type":"journal-article","created":{"date-parts":[[2022,11,3]],"date-time":"2022-11-03T02:55:39Z","timestamp":1667444139000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":98,"title":["High\u2010<i>Q<\/i> Thin\u2010Film Lithium Niobate Microrings Fabricated with Wet Etching"],"prefix":"10.1002","volume":"35","author":[{"given":"Rongjin","family":"Zhuang","sequence":"first","affiliation":[{"name":"State Key Laboratory of Precision Measurement Technology and Instruments Department of Precision Instrument Tsinghua University  Beijing 100084 China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jinze","family":"He","sequence":"additional","affiliation":[{"name":"State Key Laboratory of Precision Measurement Technology and Instruments Department of Precision Instrument Tsinghua University  Beijing 100084 China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yifan","family":"Qi","sequence":"additional","affiliation":[{"name":"State Key Laboratory of Precision Measurement Technology and Instruments Department of Precision Instrument Tsinghua University  Beijing 100084 China"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-1938-5858","authenticated-orcid":false,"given":"Yang","family":"Li","sequence":"additional","affiliation":[{"name":"State Key Laboratory of Precision Measurement Technology and Instruments Department of Precision Instrument Tsinghua University  Beijing 100084 China"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"311","published-online":{"date-parts":[[2022,12,14]]},"reference":[{"key":"e_1_2_8_1_1","doi-asserted-by":"publisher","DOI":"10.1007\/BF00614817"},{"key":"e_1_2_8_2_1","doi-asserted-by":"publisher","DOI":"10.1002\/lpor.201700256"},{"key":"e_1_2_8_3_1","doi-asserted-by":"publisher","DOI":"10.1515\/nanoph-2020-0013"},{"key":"e_1_2_8_4_1","doi-asserted-by":"publisher","DOI":"10.1038\/s41586-018-0551-y"},{"key":"e_1_2_8_5_1","doi-asserted-by":"publisher","DOI":"10.1364\/AOP.411024"},{"key":"e_1_2_8_6_1","doi-asserted-by":"publisher","DOI":"10.1002\/adma.201806452"},{"key":"e_1_2_8_7_1","doi-asserted-by":"publisher","DOI":"10.1364\/OE.26.001547"},{"key":"e_1_2_8_8_1","doi-asserted-by":"publisher","DOI":"10.1038\/s41566-019-0378-6"},{"key":"e_1_2_8_9_1","doi-asserted-by":"publisher","DOI":"10.1364\/PRJ.7.001003"},{"key":"e_1_2_8_10_1","doi-asserted-by":"publisher","DOI":"10.1063\/5.0012288"},{"key":"e_1_2_8_11_1","doi-asserted-by":"publisher","DOI":"10.1364\/OE.397138"},{"key":"e_1_2_8_12_1","doi-asserted-by":"publisher","DOI":"10.1038\/s41586-019-1110-x"},{"key":"e_1_2_8_13_1","doi-asserted-by":"publisher","DOI":"10.1038\/s41586-019-1008-7"},{"key":"e_1_2_8_14_1","doi-asserted-by":"publisher","DOI":"10.1038\/s41467-019-08969-6"},{"key":"e_1_2_8_15_1","doi-asserted-by":"publisher","DOI":"10.1364\/OPTICA.5.001438"},{"key":"e_1_2_8_16_1","doi-asserted-by":"publisher","DOI":"10.1364\/OPTICA.6.001455"},{"key":"e_1_2_8_17_1","doi-asserted-by":"publisher","DOI":"10.1103\/PhysRevLett.125.263602"},{"key":"e_1_2_8_18_1","doi-asserted-by":"publisher","DOI":"10.1063\/1.1655547"},{"key":"e_1_2_8_19_1","doi-asserted-by":"publisher","DOI":"10.1063\/1.4931601"},{"key":"e_1_2_8_20_1","first-page":"3400114","volume":"24","author":"Rao A.","year":"2017","journal-title":"IEEE J. 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