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Here, all the independent elements of the spin torque conductivity tensor allowed by bulk crystal symmetries for the tetragonal conductor IrO\n                    <jats:sub>2<\/jats:sub>\n                    are determined via measurements of conventional (in\u2010plane) anti\u2010damping torques for IrO\n                    <jats:sub>2<\/jats:sub>\n                    thin films in the high\u2010symmetry (001) and (100) orientations. It is then tested whether rotational transformations of this same tensor can predict both the conventional and unconventional anti\u2010damping torques for IrO\n                    <jats:sub>2<\/jats:sub>\n                    thin films in the lower\u2010symmetry (101), (110), and (111) orientations, finding good agreement. The results confirm that spin\u2010orbit torques from all these orientations are consistent with the bulk symmetries of IrO\n                    <jats:sub>2<\/jats:sub>\n                    , and show how simple measurements of conventional torques from high\u2010symmetry orientations of anisotropic thin films can provide an accurate prediction of the unconventional torques from lower\u2010symmetry orientations.\n                  <\/jats:p>","DOI":"10.1002\/adma.202414267","type":"journal-article","created":{"date-parts":[[2025,1,23]],"date-time":"2025-01-23T09:52:51Z","timestamp":1737625971000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":7,"title":["Crystallographic Spin Torque Conductivity Tensor of Epitaxial IrO\n                    <sub>2<\/sub>\n                    Thin Films for Oxide Spintronics"],"prefix":"10.1002","volume":"37","author":[{"given":"Michael","family":"Patton","sequence":"first","affiliation":[{"name":"Department of Materials Science and Engineering University of Wisconsin\u2010Madison  Madison Wisconsin 53706 USA"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Daniel A.","family":"Pharis","sequence":"additional","affiliation":[{"name":"Cornell University  Ithaca New York 14853 USA"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Gautam","family":"Gurung","sequence":"additional","affiliation":[{"name":"Clarendon Laboratory Department of Physics University of Oxford  Parks Road Oxford OX1 3PU UK"},{"name":"Trinity College University of Oxford  Oxford OX1 3BH UK"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Xiaoxi","family":"Huang","sequence":"additional","affiliation":[{"name":"Cornell University  Ithaca New York 14853 USA"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Gahee","family":"Noh","sequence":"additional","affiliation":[{"name":"Department of Materials Science and Engineering Pohang University of Science and Technology  Pohang Gyeongbuk 37673 South Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Evgeny Y.","family":"Tsymbal","sequence":"additional","affiliation":[{"name":"Department of Physics and Astronomy &amp; Nebraska Center for Materials and Nanoscience University of Nebraska  Lincoln NE 68588 USA"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Si\u2010Young","family":"Choi","sequence":"additional","affiliation":[{"name":"Department of Materials Science and Engineering Pohang University of Science and Technology  Pohang Gyeongbuk 37673 South Korea"},{"name":"Center for Van der Waals Quantum Solids Institute for Basic Science (IBS)  Pohang 37673 Republic of Korea"},{"name":"Semiconductor Engineering Pohang University of Science and Technology (POSTECH)  Pohang 37673 Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Daniel C.","family":"Ralph","sequence":"additional","affiliation":[{"name":"Cornell University  Ithaca New York 14853 USA"},{"name":"Kavli Institute at Cornell for Nanoscale Science  Ithaca New York 14853 USA"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Mark S.","family":"Rzchowski","sequence":"additional","affiliation":[{"name":"Department of Physics University of Wisconsin\u2010Madison  Madison Wisconsin 53706 USA"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-8854-1439","authenticated-orcid":false,"given":"Chang\u2010Beom","family":"Eom","sequence":"additional","affiliation":[{"name":"Department of Materials Science and Engineering University of Wisconsin\u2010Madison  Madison Wisconsin 53706 USA"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"311","published-online":{"date-parts":[[2025,1,23]]},"reference":[{"key":"e_1_2_9_1_1","doi-asserted-by":"publisher","DOI":"10.1103\/PhysRevB.92.155138"},{"key":"e_1_2_9_2_1","doi-asserted-by":"publisher","DOI":"10.1038\/nnano.2016.29"},{"key":"e_1_2_9_3_1","doi-asserted-by":"publisher","DOI":"10.1038\/s41467-017-00967-w"},{"key":"e_1_2_9_4_1","doi-asserted-by":"publisher","DOI":"10.1038\/nphys3933"},{"key":"e_1_2_9_5_1","first-page":"2599","volume":"13","author":"Stiehl G. 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