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The problem arises because contact resistance at the metal electrode\/organic interface is an amalgamation of physical phenomena: From ubiquitous defect states and Fermi level pinning, to the energy difference between the electrode work function and semiconductor transport level. Here, an original approach is taken to address the established OTFT contact resistance challenge. First, a new characterization technique, scanning microwave impedance microscopy (sMIM), is introduced for imaging buried metal electrode\/organic interfaces. sMIM indicates contact resistance is arguably intrinsic in certain metal electrode\/organic systems; namely, contact resistance exists when charge injection is theoretically Ohmic. The latter is explained by Fermi level pinning far from the organic semiconductor ionization energy, which is confirmed using ultraviolet photoelectron spectroscopy (UPS). Second, organic source\u2010gated transistors (OSGTs) are developed by exploiting contact resistance as a design principle. OSGTs made from small\u2010molecule\/polymer blends, using 2,8\u2010difluoro\u20105,11\u2010triethylsilylethynyl anthradithiophene (diF\u2010TES ADT) and poly(triarylamine) (PTAA), show distinct, low\u2010voltage saturation, while temperature\u2010dependent measurements indicate localized carriers govern charge transport. Overall, combining a new measurement technique with novel transistor operating mechanisms leads to a new approach for addressing the complex, and established, contact resistance challenge.<\/jats:p>","DOI":"10.1002\/adma.75026","type":"journal-article","created":{"date-parts":[[2026,10,6]],"date-time":"2026-10-06T08:08:47Z","timestamp":1791274127000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":0,"title":["Contact Resistance at Interfaces Buried Within Organic Transistors Imaged Using Scanning Microwave Impedance Microscopy"],"prefix":"10.1002","author":[{"ORCID":"https:\/\/orcid.org\/0000-0001-5812-6640","authenticated-orcid":false,"given":"Gehan S.","family":"Rupasinghe","sequence":"first","affiliation":[{"name":"Department of Chemical and Materials Engineering University of Kentucky  Lexington Kentucky USA"},{"name":"Center for Applied Energy Research University of Kentucky  Lexington Kentucky 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