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Here, we report the first epitaxial integration of KNbO\n                    <jats:sub>3<\/jats:sub>\n                    thin films on silicon, establishing a new materials platform for silicon\u2010integrated electro\u2010optics. Silicon integration of KNbO\n                    <jats:sub>3<\/jats:sub>\n                    has remained unexplored due to potassium volatility challenges during synthesis. Employing suboxide molecular\u2010beam sources assisted by in situ RHEED monitoring and guided by thermodynamic simulations, we establish an adsorption\u2010controlled growth window for phase\u2010pure KNbO\n                    <jats:sub>3<\/jats:sub>\n                    films. Temperature dependent x\u2010ray diffraction, optical second\u2010harmonic generation, piezo\u2010response force microscopy, and transmission electron microscopy aided by phase\u2010field simulations confirm high\u2010quality epitaxial films with sharp interfaces and structural phase transitions mirroring KNbO\n                    <jats:sub>3<\/jats:sub>\n                    single crystals. Electro\u2010optic measurements demonstrate a linear Pockels response with an effective electro\u2010optic response of 146\u2005 \u00b1 \u200514\u2005pm\u2005V\n                    <jats:sup>\u22121<\/jats:sup>\n                    at 1550\u00a0nm. Phase\u2010field simulations further predict that modest compressive strain can drive the electro\u2010optic response to \u223c900\u2005pm\u2005V\n                    <jats:sup>\u22121<\/jats:sup>\n                    . Beyond KNbO\n                    <jats:sub>3<\/jats:sub>\n                    , this integration pathway provides access to the broader (K,Na)(Ta,Nb)O\n                    <jats:sub>3<\/jats:sub>\n                    family, opening pathways to harness their strong electro\u2010optic response, nonlinear optical response, piezoelectric response and ferroelectric properties for next\u2010generation silicon photonics and electronics beyond current BaTiO\n                    <jats:sub>3<\/jats:sub>\n                    \u2010based approaches.\n                  <\/jats:p>","DOI":"10.1002\/adma.75067","type":"journal-article","created":{"date-parts":[[2026,9,28]],"date-time":"2026-09-28T07:35:11Z","timestamp":1790580911000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":0,"title":["Epitaxially Integrated Electro\u2010Optic KNbO\n                    <sub>3<\/sub>\n                    Thin Films on 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