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However, their poor UV resistance and surface inertness seriously hinder their utilization, especially in harsh environments. Here, a dual\u2010layer ultrathin Al\n                    <jats:sub>2<\/jats:sub>\n                    O\n                    <jats:sub>3<\/jats:sub>\n                    \u2013TiO\n                    <jats:sub>2<\/jats:sub>\n                    coating with a thickness of 70\u2013180 nm is fabricated on aramid fibers by a modified atomic layer deposition (ALD) method. The tenacity of ALD\u2010coated aramid fibers decreases only by \u22480.85% after exposure to intense UV light (4260 W m\n                    <jats:sup>\u22122<\/jats:sup>\n                    ) under high temperature (&gt;200\u00a0\u2103) for 90 min, which equals to continuous exposure to sunlight for about 17\u00a0500 days. The as\u2010prepared aramid fibers also show excellent laundering durability, thermal and chemical stabilities. This work presents a green and damage\u2010free approach to achieve the highly anti\u2010UV aramid fibers without sacrificing their outstanding performance, which is expected to guide material design for future innovations in functional fibers and devices.\n                  <\/jats:p>","DOI":"10.1002\/advs.202004171","type":"journal-article","created":{"date-parts":[[2021,5,8]],"date-time":"2021-05-08T11:22:36Z","timestamp":1620472956000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":58,"title":["Unparalleled Armour for Aramid Fiber with Excellent UV Resistance in Extreme Environment"],"prefix":"10.1002","volume":"8","author":[{"ORCID":"https:\/\/orcid.org\/0000-0002-2244-6375","authenticated-orcid":false,"given":"Fengxiang","family":"Chen","sequence":"first","affiliation":[{"name":"State Key Laboratory of New Textile Materials and Advanced Processing Technologies Wuhan Textile University  Wuhan 430200 P. R. 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