{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,8,13]],"date-time":"2026-08-13T15:29:26Z","timestamp":1786634966319,"version":"build-2736575974"},"reference-count":50,"publisher":"Wiley","issue":"45","license":[{"start":{"date-parts":[[2026,5,15]],"date-time":"2026-05-15T00:00:00Z","timestamp":1778803200000},"content-version":"vor","delay-in-days":0,"URL":"http:\/\/creativecommons.org\/licenses\/by\/4.0\/"},{"start":{"date-parts":[[2026,5,15]],"date-time":"2026-05-15T00:00:00Z","timestamp":1778803200000},"content-version":"tdm","delay-in-days":0,"URL":"http:\/\/doi.wiley.com\/10.1002\/tdm_license_1.1"}],"funder":[{"DOI":"10.13039\/100004358","name":"Samsung","doi-asserted-by":"publisher","award":["IO251211\u201014296\u201001"],"award-info":[{"award-number":["IO251211\u201014296\u201001"]}],"id":[{"id":"10.13039\/100004358","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":["advanced.onlinelibrary.wiley.com"],"crossmark-restriction":true},"short-container-title":["Advanced Science"],"published-print":{"date-parts":[[2026,8]]},"abstract":"<jats:title>ABSTRACT<\/jats:title>\n                  <jats:p>\n                    Area\u2010selective atomic\u2010layer deposition (AS\u2010ALD) relies on surface inhibitors; however, their molecular design remains empirical owing to the lack of a unified framework linking the molecular structure to inhibition performance. In this study, we systematically investigate the influence of the carbon\u2010backbone length of trimethoxyphenyl(alkyl)silane small\u2010molecule inhibitors (SMIs) on adsorption behavior and selectivity in the AS\u2010ALD of VO\n                    <jats:sub>2<\/jats:sub>\n                    . We use density functional theory to show that SMI adsorption on hydroxylated SiO\n                    <jats:sub>2<\/jats:sub>\n                    proceeds through a multistep pathway involving physisorption and single\u2010 and double\u2010bonded chemisorption. Longer backbones enhance physisorption via stronger dispersion interactions; however, they impose rapidly increasing kinetic barriers to form a stable double\u2010bonded configuration owing to severe steric and conformational constraints. Random sequential adsorption simulations show that the achievable surface coverage is dictated by a tradeoff between the molecular packing density and steric exclusion, resulting in a nonmonotonic dependence on the backbone length. These coupled chemical and geometric effects define the optimal intermediate backbone\u2010length range. This prediction is validated by VO\n                    <jats:sub>2<\/jats:sub>\n                    AS\u2010ALD experiments, in which only intermediate\u2010length SMIs maintain high selectivity (&gt; 90%) over extended cycling. This study establishes a predictive and chemically and geometrically grounded design principle for molecular inhibitors in AS\u2010ALD, and broadly for area\u2010selective atomic\u2010layer processing.\n                  <\/jats:p>","DOI":"10.1002\/advs.75705","type":"journal-article","created":{"date-parts":[[2026,5,15]],"date-time":"2026-05-15T14:56:59Z","timestamp":1778857019000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":0,"title":["Backbone\u2010Length\u2010Optimized Inhibitors Deliver Long\u2010Retention Selectivity in Area\u2010Selective ALD of VO\n                    <sub>2<\/sub>"],"prefix":"10.1002","volume":"13","author":[{"given":"Hae Lin","family":"Yang","sequence":"first","affiliation":[{"name":"Division of Materials Science and Engineering Hanyang University  Seoul Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Eun Chong","family":"Cho","sequence":"additional","affiliation":[{"name":"Thin Film Materials Research Center Research Institute of Chemical Technology (KRICT)  Daejeon Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Minchan","family":"Kim","sequence":"additional","affiliation":[{"name":"Division of Materials Science and Engineering Hanyang University  Seoul Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Hye In","family":"Park","sequence":"additional","affiliation":[{"name":"Department of Semiconductor Engineering Hanyang University  Seoul Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Ga\u2010young","family":"Lee","sequence":"additional","affiliation":[{"name":"Division of Materials Science and Engineering Hanyang University  Seoul Republic of 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