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Previously, only catalytic systems utilizing precious metals Ir and Rh, in conjunction with N\u2010 and P\u2010 ligands, could achieve this, ensuring bond cleavage and selectivity. In sharp contrast, we discovered an unprecedented and general transition\u2010metal\u2010free system for the hydroboration of C\u2212C single bonds. This methodology is transition\u2010metal and ligand\u2010free and surpasses the transition\u2010metal systems regarding chemo\u2010 and regioselectivities, substrate versatility, or yields. In addition, our system tolerates various functional groups such as Ar\u2212X (X=halides), heterocyclic rings, ketones, esters, amides, nitro, nitriles, and C=C double bonds, which are typically susceptible to hydroboration in the presence of transition metals. As a result, a diverse range of \u03b3\u2010boronated amines with varied structures and functions has been readily obtained. Experimental mechanistic studies, density functional theory (DFT), and intrinsic bond orbital (IBO) calculations unveiled a hydroborane\u2010promoted C\u2212C bond cleavage and hydride\u2010shift reaction pathway. The carbonyl group of the amide suppresses dehydrogenation between the free N\u2212H and hydroborane. The lone pair on the nitrogen of the amide facilitates the cleavage of C\u2212C bonds in cyclopropanes.<\/jats:p>","DOI":"10.1002\/anie.202412368","type":"journal-article","created":{"date-parts":[[2024,8,1]],"date-time":"2024-08-01T22:15:27Z","timestamp":1722550527000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":2,"title":["Selective Hydroboration of C\u2212C Single Bonds without Transition\u2010Metal Catalysis"],"prefix":"10.1002","volume":"63","author":[{"given":"Sida","family":"Li","sequence":"first","affiliation":[{"name":"State Key Laboratory for Oxo Synthesis and Selective Oxidation, Lanzhou Institute of Chemical Physics (LICP) Chinese Academy of Sciences  Lanzhou 730000 P. R. China"},{"name":"University of Chinese Academy of Sciences  Beijing 100049 P. R. 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