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Herein, by leveraging the dynamic covalent disulfide bonding of thioctic acid (TA) groups, we successfully integrate photo\u2010patterning and thermal\u2010healing capabilities into a single diketopyrrolopyrrole (DPP)\u2010based polymer semiconductor for the first time. The results show that the thin film of DPP\u2010based conjugated donor\u2010acceptor polymer with TA groups in the side chains exhibits excellent photo\u2010patterning capability under 365\u2005nm UV light irradiation, with sensitivity (\n                    <jats:italic>S<\/jats:italic>\n                    ) of 210\u2005mJ\u22c5cm\n                    <jats:sup>\u22122<\/jats:sup>\n                    and contrast (\n                    <jats:italic>\u03b3<\/jats:italic>\n                    ) of 1.2. Importantly, the patterning process has minimal impact on thin film morphology, interchain stacking, and charge transport mobility. Moreover, the patterned thin films, which were initially scratched, can be well healed after exposure to chloroform vapor and further thermal annealing, and simultaneously the charge mobility can be restored. In comparison, the scratched thin film of\n                    <jats:bold>PDPP4T<\/jats:bold>\n                    without TA groups in the side chains achieves only 82.6\u2009% recovery of scratch depth and 54.5\u2009% recovery of charge mobility under the same conditions. These results demonstrate the feasibility of constructing multifunctional polymer semiconductors by incorporating TA groups in the side chains, offering a new pathway to lithography\u2010compatible, self\u2010healing smart flexible devices.\n                  <\/jats:p>","DOI":"10.1002\/anie.202425172","type":"journal-article","created":{"date-parts":[[2025,2,15]],"date-time":"2025-02-15T02:24:41Z","timestamp":1739586281000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":16,"title":["Photo\u2010Patternable and Healable Polymer Semiconductor Enabled by Dynamic Covalent Disulfide Bonding"],"prefix":"10.1002","volume":"64","author":[{"given":"Xiang","family":"Xue","sequence":"first","affiliation":[{"name":"Beijing National Laboratory for Molecular Science CAS Key Laboratory for Organic Solids Institute of Chemistry Chinese Academy of Sciences  Beijing 100190 China"},{"name":"School of Chemical Sciences University of Chinese 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