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The approach is demonstrated using redissolved precipitates from three CHO\u2010derived mAbs generated by a continuous, PEG\/ZnCl\u2082\u2010mediated precipitation capture process. Size Exclusion Chromatography (SEC) fingerprinting and a percent SEC clearance (PSC) metric are developed to enable simultaneous quantification of monomer yield and impurity removal during high\u2010throughput screening and scale\u2010down column studies. Batch slurry plate screens are used to evaluate multimodal anion exchange (MMA) resins and an activated carbon composite adsorber under varying pH and ionic strengths, assessing partition coefficients and PSC values against both low\u2010molecular\u2010weight (LMW) and high\u2010molecular\u2010weight (HMW) impurities. Top candidates were then assessed in single\u2010column, higher\u2010loading flow\u2010through experiments using the redissolved precipitates as feeds. Activated carbon emerged as a highly effective first polishing step for LMW impurity removal under acidic, low\u2010conductivity conditions, while MMA resins provided complementary LMW and HMW clearances in a subsequent flow\u2010through step. The two\u2010step processes achieved overall mAb recoveries of 80%\u201387%, reduced HMW species from &gt;1.7% down to 1.1%, and decreased host\u2010cell protein levels from &gt;10,000 to &lt;40\u2009ppm for all three mAbs. SEC fingerprints showed the ability to identify orthogonal impurity removal opportunities between the two polishing materials, validating the screening methodology for a process devoid of bind\u2010elute processing steps. This work demonstrates that SEC\u2010based impurity profiling and PSC metrics can guide the development of flow\u2010through polishing processes and offer a useful intensification strategy to alleviate DSP bottlenecks and reduce reliance on affinity capture.<\/jats:p>","DOI":"10.1002\/btpr.70104","type":"journal-article","created":{"date-parts":[[2026,1,19]],"date-time":"2026-01-19T11:27:20Z","timestamp":1768822040000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":0,"title":["A size\u2010exclusion chromatography\u00a0fingerprinting workflow for the development of flow\u2010through polishing operations for mAbs derived from  continuous precipitation processes"],"prefix":"10.1002","volume":"42","author":[{"given":"Mario A.","family":"Gutierrez\u2010Diaz","sequence":"first","affiliation":[{"name":"Department of Chemical and Biological Engineering and Center for Biotechnology and Interdisciplinary Studies Rensselaer Polytechnic 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