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Despite being pyrophoric, homoleptic indium(III) alkyls do not allow atomic layer deposition (ALD) of In<jats:sub>2<\/jats:sub>O<jats:sub>3<\/jats:sub> using water as a co\u2010precursor at substrate temperatures below 200\u2009\u00b0C. Several alternative indium sources have been developed, but none allows ALD at lower temperatures except in the presence of oxidants such as O<jats:sub>2<\/jats:sub> or O<jats:sub>3<\/jats:sub>, which are not compatible with some substrates or alloying processes. We have synthesized a new indium precursor, tris(<jats:italic>N<\/jats:italic>,<jats:italic>N\u2032<\/jats:italic>\u2010diisopropylformamidinato)indium(III), compound\u2005<jats:bold>1<\/jats:bold>, which allows ALD of pure, carbon\u2010free In<jats:sub>2<\/jats:sub>O<jats:sub>3<\/jats:sub> films using H<jats:sub>2<\/jats:sub>O as the only co\u2010reactant, on substrates in the temperature range 150\u2013275\u2009\u00b0C. In contrast, replacing just the H of the anionic <jats:italic>i<\/jats:italic>PrNC(H)N<jats:italic>i<\/jats:italic>Pr ligand with a methyl group (affording the known tris(<jats:italic>N<\/jats:italic>,<jats:italic>N\u2032<\/jats:italic>\u2010diisopropylacetamidinato)indium(III), compound\u2005<jats:bold>2<\/jats:bold>) results in a considerably higher and narrower ALD window in the analogous reaction with H<jats:sub>2<\/jats:sub>O (225\u2013300\u2009\u00b0C). Kinetic studies demonstrate that a higher rate of surface reactions in both parts of the ALD cycle gives rise to this difference in the ALD windows.<\/jats:p>","DOI":"10.1002\/chem.201802317","type":"journal-article","created":{"date-parts":[[2018,6,5]],"date-time":"2018-06-05T06:53:21Z","timestamp":1528181601000},"page":"9525-9529","update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":34,"title":["Obtaining a Low and Wide Atomic Layer Deposition Window (150\u2013275\u2009\u00b0C) for In<sub>2<\/sub>O<sub>3<\/sub> Films Using an In<sup>III<\/sup> Amidinate and H<sub>2<\/sub>O"],"prefix":"10.1002","volume":"24","author":[{"ORCID":"https:\/\/orcid.org\/0000-0002-4086-7296","authenticated-orcid":false,"given":"Sang Bok","family":"Kim","sequence":"first","affiliation":[{"name":"Department of Chemistry and Chemical Biology Harvard University  12 Oxford Street Cambridge MA 02138 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