{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,1,8]],"date-time":"2026-01-08T05:52:11Z","timestamp":1767851531210,"version":"3.49.0"},"reference-count":48,"publisher":"Wiley","issue":"9","license":[{"start":{"date-parts":[[2025,8,6]],"date-time":"2025-08-06T00:00:00Z","timestamp":1754438400000},"content-version":"vor","delay-in-days":0,"URL":"http:\/\/onlinelibrary.wiley.com\/termsAndConditions#vor"}],"content-domain":{"domain":["chemistry-europe.onlinelibrary.wiley.com"],"crossmark-restriction":true},"short-container-title":["ChemPlusChem"],"published-print":{"date-parts":[[2025,9]]},"abstract":"<jats:p>The production of efficient catalysts is mandatory to attain superior catalytic performance. Once the catalyst deposition mechanism is clear, one can define the optimal physical and chemical conditions of the deposition process, such as electrolyte composition, reduction potential, current operation mode, the result chemical composition of the catalyst, its structure, and morphology. Here, the electrodeposition mechanism of tin catalysts in dimethyformamide of a thiolated tin complex under potential control for CO<jats:sub>2<\/jats:sub> reduction to formate is investigated. First, a new synthesis route is presented for a tin thiolate precursor, Bis(1,2\u2010ethanedihiolate)Sn(IV). Second, a potential\u2010controlled deposition process of tin from dimethylformamide solutions of this precursor is discussed, with the intention of deposition of tin catalysts on acid\u2010sensitive substrates, such as carbon\u2010composed gas\u2010diffusion\u2010layers. Scan\u2010rate cyclic\u2010voltammetry, scan rate mass\u2010potential, and chronoamperometry measurements expose irregular current\u2010potential and mass change phenomena along electrodeposition, which reflect a complicated potential\u2010dependent mechanism composed of redox and chemical reactions. Disproportionation and comproportionation reactions of tin are indicated by the holistic picture of the potential and time\u2010dependent mass measurements and complementary structure and morphology analysis, suggested as playing an important role in the deposition mechanism of tin. The complex mechanism is untied and the deposition conditions are defined accordingly, in order to deposit tin catalysts with high faradaic efficiency (FE<jats:sub>formate\u2009<\/jats:sub>=\u2009\u2248100% with Sn\u2010coated Cu coupons). In practice, tin is electrodeposited potentiostatically from the thiolated tin complex\u2010DMF solution on carbon\u2010based gas\u2010diffusion\u2010layer electrodes. Chronoamperometry measurements of electrochemical reduction of CO<jats:sub>2<\/jats:sub> to formate in the gas\u2010diffusion\u2010electrode cell configuration presented FE<jats:sub>formate<\/jats:sub>\u2009&gt;\u200992% and over 170 mA\u2009cm<jats:sup>\u22122<\/jats:sup> along 1 h continuous CO<jats:sub>2<\/jats:sub> gas flow reduction.<\/jats:p>","DOI":"10.1002\/cplu.202500208","type":"journal-article","created":{"date-parts":[[2025,6,29]],"date-time":"2025-06-29T22:03:53Z","timestamp":1751234633000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":1,"title":["Deposition of Tin Catalysts from Thiolated Precursor Organic Solutions for CO<sub>2<\/sub> Reduction to Formate: A Potential\u2010Dependent Mechanism Study"],"prefix":"10.1002","volume":"90","author":[{"ORCID":"https:\/\/orcid.org\/0000-0001-9886-3426","authenticated-orcid":false,"given":"Yaron S.","family":"Cohen","sequence":"first","affiliation":[{"name":"Department of Chemistry Nuclear Research Centre\u2014Negev  P.O.B. 9001 Beer\u2010Sheva 84190 Israel"},{"name":"Department of Chemical Engineering Ben Gurion University of the Negev  Beer\u2010Sheva 8410501 Israel"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-9889-517X","authenticated-orcid":false,"given":"Sumesh","family":"Sadhujan","sequence":"additional","affiliation":[{"name":"Ben Gurion Solar Energy Centre Swiss Institute for Dryland Environmental and Energy Research Jacob Blaustein Institutes for Desert Research Ben\u2010Gurion University of the Negev  Midreshset Ben\u2010Gurion 8499000 Israel"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Sonal","family":"Rajput","sequence":"additional","affiliation":[{"name":"Department of Chemical Engineering Ben Gurion University of the Negev  Beer\u2010Sheva 8410501 Israel"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Yakov","family":"Shitrit","sequence":"additional","affiliation":[{"name":"Department of Chemistry Nuclear Research Centre\u2014Negev  P.O.B. 9001 Beer\u2010Sheva 84190 Israel"},{"name":"Department of Chemical Engineering Ben Gurion University of the Negev  Beer\u2010Sheva 8410501 Israel"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Olga","family":"Iliashevsky","sequence":"additional","affiliation":[{"name":"Department of Chemistry Ben Gurion University of the Negev  Beer\u2010Sheva 8410501 Israel"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"311","published-online":{"date-parts":[[2025,8,6]]},"reference":[{"key":"e_1_2_10_2_1","doi-asserted-by":"publisher","DOI":"10.1016\/B978-0-32-390644-9.00134-7"},{"key":"e_1_2_10_3_1","doi-asserted-by":"publisher","DOI":"10.1016\/B978-0-12-823018-3.00019-1"},{"key":"e_1_2_10_4_1","doi-asserted-by":"publisher","DOI":"10.1016\/B978-0-12-820340-8.00007-1"},{"key":"e_1_2_10_5_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.jmst.2020.09.042"},{"key":"e_1_2_10_6_1","doi-asserted-by":"publisher","DOI":"10.1007\/978-94-011-4938-9"},{"key":"e_1_2_10_7_1","doi-asserted-by":"publisher","DOI":"10.1002\/aenm.202301597"},{"key":"e_1_2_10_8_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.rser.2021.110952"},{"key":"e_1_2_10_9_1","doi-asserted-by":"publisher","DOI":"10.1002\/cssc.202301719"},{"key":"e_1_2_10_10_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.cej.2021.130901"},{"key":"e_1_2_10_11_1","doi-asserted-by":"publisher","DOI":"10.1039\/D4TA06805J"},{"key":"e_1_2_10_12_1","doi-asserted-by":"publisher","DOI":"10.1002\/celc.202200272"},{"key":"e_1_2_10_13_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.electacta.2024.145576"},{"key":"e_1_2_10_14_1","doi-asserted-by":"publisher","DOI":"10.1063\/5.0004194"},{"key":"e_1_2_10_15_1","doi-asserted-by":"publisher","DOI":"10.1002\/adfm.200700188"},{"key":"e_1_2_10_16_1","doi-asserted-by":"publisher","DOI":"10.1016\/S1452-3981(23)15460-5"},{"key":"e_1_2_10_17_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.electacta.2009.04.028"},{"key":"e_1_2_10_18_1","doi-asserted-by":"publisher","DOI":"10.1039\/D2MA00775D"},{"key":"e_1_2_10_19_1","doi-asserted-by":"publisher","DOI":"10.1007\/s10008-023-05380-6"},{"key":"e_1_2_10_20_1","doi-asserted-by":"publisher","DOI":"10.1016\/0304-386X(89)90023-6"},{"key":"e_1_2_10_21_1","doi-asserted-by":"publisher","DOI":"10.1007\/s11581-012-0819-4"},{"key":"e_1_2_10_22_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.apsusc.2012.11.130"},{"key":"e_1_2_10_23_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.electacta.2018.12.040"},{"key":"e_1_2_10_24_1","doi-asserted-by":"publisher","DOI":"10.1007\/s10854-007-9385-3"},{"key":"e_1_2_10_25_1","first-page":"248","volume-title":"Tin and Tin Alloy Plating Solutions BT\u2014Tin","author":"Price J. W.","year":"1978"},{"key":"e_1_2_10_26_1","doi-asserted-by":"publisher","DOI":"10.1039\/C8RA03183E"},{"key":"e_1_2_10_27_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.elecom.2007.02.006"},{"key":"e_1_2_10_28_1","doi-asserted-by":"publisher","DOI":"10.1149\/1945-7111\/ab8824"},{"key":"e_1_2_10_29_1","doi-asserted-by":"publisher","DOI":"10.3390\/coatings10121154"},{"key":"e_1_2_10_30_1","doi-asserted-by":"publisher","DOI":"10.1007\/s10008-015-2809-8"},{"key":"e_1_2_10_31_1","doi-asserted-by":"publisher","DOI":"10.1039\/C4TA03709J"},{"key":"e_1_2_10_32_1","doi-asserted-by":"publisher","DOI":"10.3390\/coatings9120798"},{"key":"e_1_2_10_33_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.surfcoat.2015.12.081"},{"key":"e_1_2_10_34_1","doi-asserted-by":"publisher","DOI":"10.1149\/1.1545458"},{"key":"e_1_2_10_35_1","doi-asserted-by":"publisher","DOI":"10.1023\/A:1003990327662"},{"key":"e_1_2_10_36_1","doi-asserted-by":"publisher","DOI":"10.1021\/acsanm.2c03408"},{"key":"e_1_2_10_37_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.electacta.2020.137662"},{"key":"e_1_2_10_38_1","doi-asserted-by":"publisher","DOI":"10.1021\/jp002526b"},{"key":"e_1_2_10_39_1","doi-asserted-by":"publisher","DOI":"10.1039\/D2CS00494A"},{"key":"e_1_2_10_40_1","doi-asserted-by":"publisher","DOI":"10.1016\/S0167-2738(01)00882-7"},{"key":"e_1_2_10_41_1","doi-asserted-by":"publisher","DOI":"10.1021\/acsmaterialslett.0c00571"},{"key":"e_1_2_10_42_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.jorganchem.2013.07.005"},{"key":"e_1_2_10_43_1","doi-asserted-by":"publisher","DOI":"10.1038\/s41560-019-0466-3"},{"key":"e_1_2_10_44_1","doi-asserted-by":"publisher","DOI":"10.1039\/D2TA01429G"},{"key":"e_1_2_10_45_1","doi-asserted-by":"publisher","DOI":"10.1021\/ic50033a005"},{"key":"e_1_2_10_46_1","doi-asserted-by":"publisher","DOI":"10.1021\/acs.inorgchem.6b00243"},{"key":"e_1_2_10_47_1","doi-asserted-by":"publisher","DOI":"10.1021\/ja9539756"},{"key":"e_1_2_10_48_1","doi-asserted-by":"publisher","DOI":"10.3390\/app10041405"},{"key":"e_1_2_10_49_1","doi-asserted-by":"publisher","DOI":"10.1021\/acsenergylett.3c01610"}],"container-title":["ChemPlusChem"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/chemistry-europe.onlinelibrary.wiley.com\/doi\/pdf\/10.1002\/cplu.202500208","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,9,15]],"date-time":"2025-09-15T12:15:29Z","timestamp":1757938529000},"score":1,"resource":{"primary":{"URL":"https:\/\/chemistry-europe.onlinelibrary.wiley.com\/doi\/10.1002\/cplu.202500208"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025,8,6]]},"references-count":48,"journal-issue":{"issue":"9","published-print":{"date-parts":[[2025,9]]}},"alternative-id":["10.1002\/cplu.202500208"],"URL":"https:\/\/doi.org\/10.1002\/cplu.202500208","archive":["Portico"],"relation":{},"ISSN":["2192-6506","2192-6506"],"issn-type":[{"value":"2192-6506","type":"print"},{"value":"2192-6506","type":"electronic"}],"subject":[],"published":{"date-parts":[[2025,8,6]]},"assertion":[{"value":"2025-03-19","order":0,"name":"received","label":"Received","group":{"name":"publication_history","label":"Publication History"}},{"value":"2025-08-06","order":3,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}],"article-number":"e202500208"}}