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A series of new polymers is synthesized from poly(ethylene\u2010<jats:italic>alt<\/jats:italic>\u2010maleic anhydride) and four alcohol derivatives with and without 2\u2010pyrrolidone and succinimide moieties. All polymers, including polyvinylpyrrolidone, are found to be thermally stable up to 195\u00a0\u00b0C or higher, and characterized regarding their molecular orbital energy levels, bandgap, and resistive digital memory behaviors. Excitingly, the polymers bearing either 2\u2010pyrrolidone or succinimide moiety demonstrate p\u2010type digital memory behaviors with high ON\/OFF current ratios and long reliabilities. Nonvolatile digital memory performance is achieved over the film thickness range of 10\u201380\u00a0nm, whereas volatile digital memory is demonstrated over a much narrower range of film thickness. All digital memory performances can be originated from the 2\u2010pyrrolidone and succinimide moieties possessing high affinity and stabilization power to charges via charge traps and transformations based on a hopping conduction process. Hence, these new polymers are suitable for the production of high\u2010performance p\u2010type nonvolatile and volatile digital memory devices. Moreover, 2\u2010pyrrolidone and succinimide can be used as new and economical electroactive building blocks for the development of advanced digital memory materials.<\/jats:p>","DOI":"10.1002\/marc.202100186","type":"journal-article","created":{"date-parts":[[2021,5,14]],"date-time":"2021-05-14T07:52:26Z","timestamp":1620978746000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":4,"title":["Newly Found Digital Memory Characteristics of Pyrrolidone\u2010 and Succinimide\u2010Based Polymers"],"prefix":"10.1002","volume":"42","author":[{"given":"Wonyeong","family":"Ryu","sequence":"first","affiliation":[{"name":"Division of Advanced Materials Science and Department of Chemistry Pohang University of Science and Technology  Pohang 37673 Republic of Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Li","family":"Xiang","sequence":"additional","affiliation":[{"name":"Division of Advanced Materials Science and Department of Chemistry Pohang University of Science and Technology  Pohang 37673 Republic of Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Kyeong Sik","family":"Jin","sequence":"additional","affiliation":[{"name":"PLS\u2010II Beamline Division Pohang Accelerator Laboratory  Pohang 37673 Republic of Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hyun\u2010Joong","family":"Kim","sequence":"additional","affiliation":[{"name":"Ceko Corporation Surface Technology Institute  519 Dunchon\u2010daero, Jungwon\u2010gu Seongnam 13216 Republic of Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hong\u2010Chul","family":"Kim","sequence":"additional","affiliation":[{"name":"Ceko Corporation Surface Technology Institute  519 Dunchon\u2010daero, Jungwon\u2010gu Seongnam 13216 Republic of Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Moonhor","family":"Ree","sequence":"additional","affiliation":[{"name":"Ceko Corporation Surface Technology Institute  519 Dunchon\u2010daero, Jungwon\u2010gu Seongnam 13216 Republic of Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"311","published-online":{"date-parts":[[2021,5,14]]},"reference":[{"key":"e_1_2_8_1_1","volume-title":"Ullmann's Encyclopedia of Industrial Chemistry","author":"Harreus A. 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