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By optimizing the DMCO concentration, and HABI content, high\u2010quality lithographic patterns are achieved with high film retention at low exposure doses. The branched structure exhibits superior photosensitivity and solubility after exposure compared to previous crosslinked systems. This work provides HABI\u2010based branched polyurethane, which acts as one of the potential candidates for UV\u2010positive photoresists.\n                  <\/jats:p>","DOI":"10.1002\/marc.202401081","type":"journal-article","created":{"date-parts":[[2025,1,22]],"date-time":"2025-01-22T01:01:03Z","timestamp":1737507663000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":0,"title":["Photoswitchable Branched Polyurethanes\u00a0Based on Hexaarylbiimidazole for Photolithography"],"prefix":"10.1002","volume":"46","author":[{"given":"Ying\u2010Yi","family":"Ren","sequence":"first","affiliation":[{"name":"Wuhan National Laboratory for Optoelectronics School of Optical and Electronic Information Huazhong University of Science and Technology  Wuhan Hubei 430074 China"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Peng\u2010Fei","family":"Luo","sequence":"additional","affiliation":[{"name":"Wuhan National Laboratory for Optoelectronics School of Optical and Electronic Information Huazhong University of Science and Technology  Wuhan Hubei 430074 China"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jun\u2010Dan","family":"Huang","sequence":"additional","affiliation":[{"name":"Wuhan National Laboratory for Optoelectronics School of Optical and Electronic Information Huazhong University of Science and Technology  Wuhan Hubei 430074 China"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hong\u2010Qiang","family":"Li","sequence":"additional","affiliation":[{"name":"Wuhan National Laboratory for Optoelectronics School of Optical and Electronic Information Huazhong University of Science and Technology  Wuhan Hubei 430074 China"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Mei","family":"Wu","sequence":"additional","affiliation":[{"name":"Wuhan National Laboratory for Optoelectronics School of Optical and Electronic Information Huazhong University of Science and Technology  Wuhan Hubei 430074 China"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Chong","family":"Li","sequence":"additional","affiliation":[{"name":"Wuhan National Laboratory for Optoelectronics School of Optical and Electronic Information Huazhong University of Science and Technology  Wuhan Hubei 430074 China"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Shi\u2010Li","family":"Xiang","sequence":"additional","affiliation":[{"name":"JFS Laboratory  Wuhan 430206 China"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-8886-4166","authenticated-orcid":false,"given":"Ming\u2010Qiang","family":"Zhu","sequence":"additional","affiliation":[{"name":"Wuhan National Laboratory for Optoelectronics School of Optical and Electronic Information Huazhong University of Science and Technology  Wuhan Hubei 430074 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