{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,10,2]],"date-time":"2026-10-02T03:45:17Z","timestamp":1790912717473,"version":"4.1.0"},"reference-count":105,"publisher":"Wiley","issue":"10","license":[{"start":{"date-parts":[[2026,5,26]],"date-time":"2026-05-26T00:00:00Z","timestamp":1779753600000},"content-version":"vor","delay-in-days":0,"URL":"http:\/\/creativecommons.org\/licenses\/by\/4.0\/"},{"start":{"date-parts":[[2026,5,26]],"date-time":"2026-05-26T00:00:00Z","timestamp":1779753600000},"content-version":"tdm","delay-in-days":0,"URL":"http:\/\/doi.wiley.com\/10.1002\/tdm_license_1.1"}],"funder":[{"DOI":"10.13039\/501100001348","name":"Agency for Science, Technology and Research","doi-asserted-by":"publisher","award":["C233312016"],"award-info":[{"award-number":["C233312016"]}],"id":[{"id":"10.13039\/501100001348","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":["onlinelibrary.wiley.com"],"crossmark-restriction":true},"short-container-title":["Nanophotonics"],"published-print":{"date-parts":[[2026,5,27]]},"abstract":"<jats:title>ABSTRACT<\/jats:title>\n                  <jats:p>Deep\u2010ultraviolet flat optics (DUVFO) is rapidly emerging as a foundational platform for next\u2010generation photonic technologies. Operating in the 200\u2013300\u2010nm regime, DUVFO unlocks capabilities inaccessible to conventional refractive optics, enabling compact beam shaping, high\u2010NA (HNA) focusing, and efficient nonlinear interactions within ultrathin form factors. This review provides a comprehensive overview of the materials, device concepts, and system\u2010level innovations driving the shift from bulky, absorption\u2010limited DUV optics toward scalable, chip\u2010compatible flat\u2010optical architectures. We highlight the critical role of wide\u2010bandgap semiconductors and low\u2010loss metal oxides in overcoming intrinsic transparency and stability challenges; examine the evolution of linear and nonlinear DUV devices, from HNA metalenses and integrated spectroscopic modules to frequency conversion metasurfaces and chip\u2010scale light sources; and discuss their emerging impact in lithography, bioimaging, metrology, and nanofabrication. Finally, we outline the key bottlenecks in dispersion engineering, optical characterization, and wafer\u2010scale manufacturing, emphasizing the interdisciplinary advances required to transition DUVFO from laboratory demonstrations to manufacturable, high\u2010performance photonic platforms.<\/jats:p>","DOI":"10.1002\/nap2.70136","type":"journal-article","created":{"date-parts":[[2026,5,26]],"date-time":"2026-05-26T10:14:04Z","timestamp":1779790444000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":5,"title":["Recent Developments in Deep\u2010Ultraviolet Flat Optics"],"prefix":"10.1002","volume":"15","author":[{"ORCID":"https:\/\/orcid.org\/0000-0002-9065-7414","authenticated-orcid":false,"given":"Omar A. 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