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Owing to the intramolecular stabilization, BDMPZ is a thermally stable, volatile, nonpyrophoric solid compound, however, it possesses a high reactivity due to the presence of Zn\u2010C and Zn\u2010N bonds in this complex. Employing this precursor, a new oxygen plasma enhanced (PE)ALD process in the deposition temperature range of 60 and 160 \u00b0C is developed. The resulting ZnO thin films are uniform, smooth, stoichiometric, and highly transparent. The deposition on polyethylene terephthalate (PET) at 60 \u00b0C results in dense and compact ZnO layers for a thickness as low as 7.5 nm with encouraging oxygen transmission rates (OTR) compared to the bare PET substrates. As a representative application of the ZnO layers, the gas sensing properties are investigated. A high response toward NO<jats:sub>2<\/jats:sub> is observed without cross\u2010sensitivities against NH<jats:sub>3<\/jats:sub> and CO. Thus, the new PEALD process employing BDMPZ has the potential to be a safe substitute to the commonly used DEZ processes.<\/jats:p>","DOI":"10.1002\/smll.201907506","type":"journal-article","created":{"date-parts":[[2020,4,29]],"date-time":"2020-04-29T05:50:12Z","timestamp":1588139412000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":31,"title":["From Precursor Chemistry to Gas Sensors: Plasma\u2010Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications"],"prefix":"10.1002","volume":"16","author":[{"ORCID":"https:\/\/orcid.org\/0000-0001-8949-0736","authenticated-orcid":false,"given":"Lukas","family":"Mai","sequence":"first","affiliation":[{"name":"Inorganic Materials Chemistry Ruhr University Bochum  Universit\u00e4tsstr. 150 Bochum 44801 Germany"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-9908-7414","authenticated-orcid":false,"given":"Felix","family":"Mitschker","sequence":"additional","affiliation":[{"name":"Institute of Electrical Engineering and Plasma Technology Ruhr University Bochum  Universit\u00e4tsstr. 150 Bochum 44801 Germany"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-0933-9556","authenticated-orcid":false,"given":"Claudia","family":"Bock","sequence":"additional","affiliation":[{"name":"Microsystems Technology Ruhr University Bochum  Universit\u00e4tsstr. 150 Bochum 44801 Germany"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Alessia","family":"Niesen","sequence":"additional","affiliation":[{"name":"Forschung und Entwicklung, GB Sensorik paragon GmbH &amp; 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