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The development of a process for rapid high\u2010resolution afterglow patterning of crystalline materials can improve both high\u2010speed fabrication of anti\u2010counterfeiting afterglow media and stable afterglow readout compared with those achieved with amorphous materials. Here, the high\u2010resolution afterglow patterning of crystalline materials via cooperative organic vapo\u2010 and photo\u2010stimulation is reported. A single crystal of (<jats:italic>S<\/jats:italic>)\u2010(\u2212)\u22122,2\u2019\u2010bis(diphenylphosphino)\u22125,5\u2019,6,6\u2019,7,7\u20198,8\u2019\u2010octahydro\u20101,1\u2019\u2010binaphthyl [(<jats:italic>S<\/jats:italic>)\u2010H<jats:sub>8<\/jats:sub>\u2010BINAP] doped with (<jats:italic>S<\/jats:italic>)\u2010(\u2212)\u22122,2\u2019\u2010bis(diphenylphosphino)\u22121,1\u2019\u2010binaphthyl [(<jats:italic>S<\/jats:italic>)\u2010BINAP] shows green afterglow RTP. Crystals of (<jats:italic>S<\/jats:italic>)\u2010BINAP\u2010doped (<jats:italic>S<\/jats:italic>)\u2010H<jats:sub>8<\/jats:sub>\u2010BINAP changed to an amorphous state with no afterglow capability on weak continuous photoirradiation under dichloromethane (DCM) vapor. Photoirradiation induced oxidation of the (<jats:italic>S<\/jats:italic>)\u2010H<jats:sub>8<\/jats:sub>\u2010BINAP host molecule in the crystal. The oxidized (<jats:italic>S<\/jats:italic>)\u2010H<jats:sub>8<\/jats:sub>\u2010BINAP forms on the crystal surface strongly interacted with DCM molecules, which induces melting of the (<jats:italic>S<\/jats:italic>)\u2010BINAP\u2010doped (<jats:italic>S<\/jats:italic>)\u2010H<jats:sub>8<\/jats:sub>\u2010BINAP crystal and trigger formation of an amorphous state without an afterglow capability. High\u2010resolution afterglow patterning of the crystalline film is rapidly achieved by using cooperative organic vapo\u2010 and photo\u2010stimulation. In addition to the benefit of rapid afterglow patterning, the formed afterglow images of the crystalline film can be repeatedly read out under ambient conditions without DCM vapor.<\/jats:p>","DOI":"10.1002\/smll.202308103","type":"journal-article","created":{"date-parts":[[2023,11,29]],"date-time":"2023-11-29T07:58:43Z","timestamp":1701244723000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":5,"title":["High\u2010Resolution Afterglow Patterning Using Cooperative Vapo\u2010 and Photo\u2010Stimulation"],"prefix":"10.1002","volume":"20","author":[{"given":"Kikuya","family":"Hayashi","sequence":"first","affiliation":[{"name":"Department of Engineering Science The University of Electro\u2010Communications  1\u20105\u20101 Chofugaoka, Chofu Tokyo 182\u20138585 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