{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,10,18]],"date-time":"2026-10-18T17:12:28Z","timestamp":1792343548959,"version":"4.4.0"},"reference-count":62,"publisher":"Wiley","issue":"8","license":[{"start":{"date-parts":[[2025,6,24]],"date-time":"2025-06-24T00:00:00Z","timestamp":1750723200000},"content-version":"vor","delay-in-days":0,"URL":"http:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Small Science"],"published-print":{"date-parts":[[2025,8]]},"abstract":"<jats:p>Ti<jats:sub>3<\/jats:sub>C<jats:sub>2<\/jats:sub>T<jats:sub><jats:italic>x<\/jats:italic><\/jats:sub> is a leading compound within the MXenes family and can find host in widespread applications. It is synthesized by selectively etching layers from the Ti<jats:sub>3<\/jats:sub>AlC<jats:sub>2<\/jats:sub> precursor, and this process typically introduces surface terminations, T<jats:sub><jats:italic>x<\/jats:italic><\/jats:sub>, such as \uf8ffOH, \uf8feO, or \uf8ffF. However, the aggressive chemical conditions required for its preparation, as well as exposure to air, humidity, and heat, can lead to impurity phases that potentially compromise its desirable properties. Herein, a two\u2010step oxidation process is revealed during heat treatment, where initial oxidation occurs between layers without altering the integrity of the Ti<jats:sub>3<\/jats:sub>C<jats:sub>2<\/jats:sub>\u2010layered structure, followed by the formation of anatase TiO<jats:sub>2<\/jats:sub> at elevated temperatures. The process is carefully monitored using <jats:italic>in\u2009situ<\/jats:italic> Raman spectroscopy and <jats:italic>in\u2009situ<\/jats:italic> microwave conductivity measurements, applied to Ti<jats:sub>3<\/jats:sub>C<jats:sub>2<\/jats:sub>T<jats:sub><jats:italic>x<\/jats:italic><\/jats:sub> prepared using various etching techniques involving concentrated hydrofluoric acid, LiF\u2009+\u2009HCl, and HF\u2009+\u2009HCl mixtures. The oxidation process is heavily influenced by the synthesis route and surface chemistry of Ti<jats:sub>3<\/jats:sub>C<jats:sub>2<\/jats:sub>T<jats:sub><jats:italic>x<\/jats:italic><\/jats:sub>, with fluoride and oxyfluoride groups playing a pivotal role in stabilizing the anatase phase. The absence of these groups, in contrast, can lead to the formation of rutile TiO<jats:sub>2<\/jats:sub>.<\/jats:p>","DOI":"10.1002\/smsc.202500209","type":"journal-article","created":{"date-parts":[[2025,6,25]],"date-time":"2025-06-25T01:12:02Z","timestamp":1750813922000},"source":"Crossref","is-referenced-by-count":19,"title":["Surface Chemistry\u2013Driven Oxidation Mechanisms in Ti<sub>3<\/sub>C<sub>2<\/sub>T<sub><i>x<\/i><\/sub> MXenes"],"prefix":"10.1002","volume":"5","author":[{"given":"Bradlee J.","family":"McIntosh","sequence":"first","affiliation":[{"name":"Stavropoulos Center for Complex Quantum Matter Department of Physics and Astronomy University of Notre Dame  Notre Dame IN 46556 USA"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-1472-0482","authenticated-orcid":false,"given":"Bence G.","family":"M\u00e1rkus","sequence":"additional","affiliation":[{"name":"Stavropoulos Center for Complex Quantum Matter Department of Physics 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