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This study examines the possibility of integrating topological insulators (TIs), specifically Bi<jats:sub>2<\/jats:sub>Te<jats:sub>3<\/jats:sub> thin films (13\u2013191\u00a0nm), into flexible spintronic applications through scalable magneto\u2010sputtering techniques, and investigates how structural organization influences electrical and topological properties through post\u2010thermal annealing. Films annealed above 250\u00a0\u00b0C display improved polycrystalline structure, larger crystallites, fewer local defects, and higher a room\u2010temperature Seebeck coefficient (<jats:italic>S<\/jats:italic>) and resistivity (<jats:italic>\u03c1<\/jats:italic>), suggesting decreased bulk electronic contributions. 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