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However, their large\u2010grain, wafer\u2010scale synthesis using scalable vapor deposition methods is still an unsolved challenge. Here, a tailored physical vapor transport deposition (PVTD) method is developed, which enables centimeter\u2010scale, epitaxial growth of semiconducting 2D\u2010MM CrCl\n                    <jats:sub>3<\/jats:sub>\n                    at 500\u00b0C (on mica substrate). A controlled synthesis protocol, enabled via four process innovations, (i) low emissivity secondary heating source, (ii) very\u2010high carrier\u2010gas flow, (iii) dynamic precursor flux control, and (iv) oxygen\/moisture removal, suppresses redox etching and drives growth beyond the diffusion limit for wafer\u2010scale growth. Optical, stoichiometric, structural, and magnetic characterization confirm single\u2010crystalline, phase\u2010pure 2D\u2010MM CrCl\n                    <jats:sub>3<\/jats:sub>\n                    . Substrate temperature tunes thickness of films from few\u2010layers to tens of nanometers, while flow rate controls nucleation density and coverage. Further, we demonstrate selective\u2010area growth and large\u2010area transfer, validating potential wafer\u2010level device integration. Substrate\u2010dependent growth features are explained using density functional theory and state\u2010of\u2010the\u2010art machine learning interatomic potential\u2010based atomic\u2010scale simulations. This scalable, flexible vapor deposition approach offers a general route for synthesizing several (volatile and reactive) 2D\u2010MM and bridges the scalability gap from conventional wafer\u2010scale materials. The low\u2010temperature growth will enable the creation of hybrid functional heterostructures.\n                  <\/jats:p>","DOI":"10.1002\/adma.202514405","type":"journal-article","created":{"date-parts":[[2026,3,30]],"date-time":"2026-03-30T06:27:41Z","timestamp":1774852061000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":2,"title":["Tailored Vapor Deposition Unlocks Large\u2010Grain, Wafer\u2010Scale Epitaxial Growth of 2D Magnetic CrCl\n                    <sub>3<\/sub>"],"prefix":"10.1002","volume":"38","author":[{"ORCID":"https:\/\/orcid.org\/0009-0005-6733-6398","authenticated-orcid":false,"given":"Vivek","family":"Kumar","sequence":"first","affiliation":[{"name":"Department of Physics Indian Institute of Science  Bengaluru Karnataka India"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Abhishek","family":"Jangid","sequence":"additional","affiliation":[{"name":"Department of Physics Indian 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