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Here, we present electro\u2010optical results achieved for post\u2010deposition annealing of Al\u2013Zn\u2013O (AZO), AZO:H, Ga\u2013Zn\u2013O:H (GZO:H), and Zn\u2013O:H (ZNO:H) thin films deposited by RF sputtering at room temperature. These studies comprise results of thermal annealing at atmospheric pressure, vacuum, forming gas, H<jats:sub>2<\/jats:sub>and Ar atmospheres, and H<jats:sub>2<\/jats:sub>and Ar plasmas, which lead to significant enhancement of their electro\u2010optical properties, which are correlated to morphological and structural improvements. The post\u2010deposition annealing leads to an enhancement in resistivity above 40% for AZO, AZO:H, and GZO:H, reaching<jats:italic>\u03c1<\/jats:italic>\u2009\u2248\u20092.6\u20133.5\u2009\u00d7\u200910<jats:sup>\u22124<\/jats:sup>\u2009\u03a9cm, while ZnO:H showed a lower improvement of 13%. The averaged optical transmittance in the visible region is about 89% for the investigated TCOs. Such results match the properties of state\u2010of\u2010art ITO (<jats:italic>\u03c1<\/jats:italic>\u2009\u2248\u200910<jats:sup>\u22124<\/jats:sup>\u2009\u03a9cm and transmittance in VIS range of 90%) employing much more earth\u2010abundant materials.<\/jats:p><\/jats:sec>","DOI":"10.1002\/pssa.201532891","type":"journal-article","created":{"date-parts":[[2016,8,9]],"date-time":"2016-08-09T12:55:29Z","timestamp":1470747329000},"page":"2317-2328","source":"Crossref","is-referenced-by-count":34,"title":["Influence of post\u2010deposition annealing on electrical and optical properties of ZnO\u2010based TCOs deposited at room temperature"],"prefix":"10.1002","volume":"213","author":[{"given":"Andriy","family":"Lyubchyk","sequence":"first","affiliation":[{"name":"i3N\/CENIMAT, Faculty of Science and Technology, Department of Materials Science, Universidade NOVA de Lisboa and CEMOP\/UNINOVA Campus de Caparica 2829\u2010516 Caparica Portugal"}]},{"given":"Ant\u00f3nio","family":"Vicente","sequence":"additional","affiliation":[{"name":"i3N\/CENIMAT, Faculty of Science and Technology, Department of Materials Science, Universidade NOVA de Lisboa and CEMOP\/UNINOVA Campus de Caparica 2829\u2010516 Caparica Portugal"}]},{"given":"Pedro U.","family":"Alves","sequence":"additional","affiliation":[{"name":"i3N\/CENIMAT, Faculty of Science and Technology, Department of Materials Science, Universidade NOVA de Lisboa and CEMOP\/UNINOVA Campus de Caparica 2829\u2010516 Caparica Portugal"}]},{"given":"Bruno","family":"Catela","sequence":"additional","affiliation":[{"name":"i3N\/CENIMAT, Faculty of Science and Technology, Department of Materials Science, Universidade NOVA de Lisboa and CEMOP\/UNINOVA Campus de Caparica 2829\u2010516 Caparica Portugal"}]},{"given":"Bertrand","family":"Soule","sequence":"additional","affiliation":[{"name":"i3N\/CENIMAT, Faculty of Science and Technology, Department of Materials Science, Universidade NOVA de Lisboa and CEMOP\/UNINOVA Campus de Caparica 2829\u2010516 Caparica Portugal"}]},{"given":"Tiago","family":"Mateus","sequence":"additional","affiliation":[{"name":"i3N\/CENIMAT, Faculty of Science and Technology, Department of Materials Science, Universidade NOVA de Lisboa and CEMOP\/UNINOVA Campus de Caparica 2829\u2010516 Caparica Portugal"}]},{"given":"Manuel J.","family":"Mendes","sequence":"additional","affiliation":[{"name":"i3N\/CENIMAT, Faculty of Science and Technology, Department of Materials Science, Universidade NOVA de Lisboa and CEMOP\/UNINOVA Campus de Caparica 2829\u2010516 Caparica Portugal"}]},{"given":"Hugo","family":"\u00c1guas","sequence":"additional","affiliation":[{"name":"i3N\/CENIMAT, Faculty of Science and Technology, Department of Materials Science, Universidade NOVA de Lisboa and CEMOP\/UNINOVA Campus de Caparica 2829\u2010516 Caparica Portugal"}]},{"given":"Elvira","family":"Fortunato","sequence":"additional","affiliation":[{"name":"i3N\/CENIMAT, Faculty of Science and Technology, Department of Materials Science, Universidade NOVA de Lisboa and CEMOP\/UNINOVA Campus de Caparica 2829\u2010516 Caparica Portugal"}]},{"given":"Rodrigo","family":"Martins","sequence":"additional","affiliation":[{"name":"i3N\/CENIMAT, Faculty of Science and Technology, Department of Materials Science, Universidade NOVA de Lisboa and CEMOP\/UNINOVA Campus de Caparica 2829\u2010516 Caparica Portugal"}]}],"member":"311","published-online":{"date-parts":[[2016,8,9]]},"reference":[{"key":"e_1_2_6_2_1","unstructured":"Transparent Conductive Coatings: Technologies and Global Markets Report Code: AVM105A (2014)."},{"key":"e_1_2_6_3_1","doi-asserted-by":"publisher","DOI":"10.1016\/S0040-6090(98)01393-5"},{"key":"e_1_2_6_4_1","unstructured":"Global and China ITO Sputtering Targets Industry Report 2013\u20132016 http:\/\/www.researchmoz.us\/global-and-china-ito-sputtering-targets-industry-report-2013-2016-report.html"},{"key":"e_1_2_6_5_1","doi-asserted-by":"crossref","unstructured":"I.Hamberg C. 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