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While understanding the underlying mechanism of interplaying of ferroic properties is important, tailoring their properties to make them potential candidates for magnetoelectric devices is challenging. Here, the antiferromagnetic Neel ordering temperature above 200 K is realized in successfully stabilized epitaxial films of (Lu,Sc)FeO\n                    <jats:sub>3<\/jats:sub>\n                    multiferroic oxide. The first\u2010principles calculations show the shrinkage of in\u2010plane lattice constants of the unit cells of the films on different substrates which corroborates well the enhancement of the Neel ordering temperature (\n                    <jats:italic>T<\/jats:italic>\n                    <jats:sub>N<\/jats:sub>\n                    ). The profound effect of lattice strain\/stress at the interface due to differences of in\u2010plane lattice constants on out of plane magnetic properties and on spin reorientation temperature in the antiferromagnetic region is further elucidated in the epitaxial films with and without buffer layer of Mn\u2010doped LuFeO\n                    <jats:sub>3<\/jats:sub>\n                    . Writing and reading ferroelectric domains reveal the ferroelectric response of the films at room temperature. Detailed electron microscopy shows the presence of lattice defects in atomic scale. First\u2010principles calculations show that orbital rehybridization of rare\u2010earth ions and oxygen is one of the main driving force of ferroelectricity along\n                    <jats:italic>c<\/jats:italic>\n                    \u2010axis in thin films of hexagonal ferrites.\n                  <\/jats:p>","DOI":"10.1002\/smll.202005700","type":"journal-article","created":{"date-parts":[[2021,2,23]],"date-time":"2021-02-23T04:34:44Z","timestamp":1614054884000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":9,"title":["Interplay of Magnetic Properties and Doping in Epitaxial Films of h\u2010REFeO\n                    <sub>3<\/sub>\n                    Multiferroic Oxides"],"prefix":"10.1002","volume":"17","author":[{"given":"Ali","family":"Baghizadeh","sequence":"first","affiliation":[{"name":"Department of Materials and Ceramics Engineering CICECO \u2013 Aveiro Institute of Materials University of Aveiro  Aveiro 3810\u2010193 Portugal"},{"name":"Scientific Center for Optical and Electron Microscopy (ScopeM) ETH Zurich  Zurich 8093 Switzerland"}]},{"given":"Pegah Mirzadeh","family":"Vaghefi","sequence":"additional","affiliation":[{"name":"EMPA Swiss Federal Laboratories for Materials Science and Technology  Dubendorf 8600 Switzerland"}]},{"given":"Xing","family":"Huang","sequence":"additional","affiliation":[{"name":"Scientific Center for Optical and Electron Microscopy (ScopeM) ETH Zurich  Zurich 8093 Switzerland"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-5622-7760","authenticated-orcid":false,"given":"Jerome","family":"Borme","sequence":"additional","affiliation":[{"name":"International Iberian Nanotechnology Laboratory (INL)  Braga 4715\u2010330 Portugal"}]},{"given":"Bernardo","family":"Almeida","sequence":"additional","affiliation":[{"name":"Center and Department of Physics University of Minho Campus de Gualtar  Braga 4710\u2010057 Portugal"}]},{"given":"Andrei N.","family":"Salak","sequence":"additional","affiliation":[{"name":"Department of Materials and Ceramics Engineering CICECO \u2013 Aveiro Institute of Materials University of Aveiro  Aveiro 3810\u2010193 Portugal"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-9996-7953","authenticated-orcid":false,"given":"Marc\u2010Georg","family":"Willinger","sequence":"additional","affiliation":[{"name":"Scientific Center for Optical and Electron Microscopy (ScopeM) ETH Zurich  Zurich 8093 Switzerland"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-3359-7133","authenticated-orcid":false,"given":"Vitor B.","family":"Amaral","sequence":"additional","affiliation":[{"name":"Department of Physics and CICECO \u2013 Aveiro Institute of Materials University of Aveiro  Aveiro 3810\u2010193 Portugal"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-5243-4420","authenticated-orcid":false,"given":"Joaquim M.","family":"Vieira","sequence":"additional","affiliation":[{"name":"Department of Materials and Ceramics Engineering CICECO \u2013 Aveiro Institute of Materials University of Aveiro  Aveiro 3810\u2010193 Portugal"}]}],"member":"311","published-online":{"date-parts":[[2021,2,23]]},"reference":[{"key":"e_1_2_8_1_1","doi-asserted-by":"publisher","DOI":"10.1038\/natrevmats.2016.46"},{"key":"e_1_2_8_2_1","doi-asserted-by":"publisher","DOI":"10.1038\/s41563-018-0275-2"},{"key":"e_1_2_8_3_1","doi-asserted-by":"publisher","DOI":"10.1103\/PhysRevB.95.134443"},{"key":"e_1_2_8_4_1","volume":"7","author":"Meier Q. 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