{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,9,5]],"date-time":"2024-09-05T16:47:15Z","timestamp":1725554835404},"publisher-location":"Berlin, Heidelberg","reference-count":10,"publisher":"Springer Berlin Heidelberg","isbn-type":[{"type":"print","value":"9783540344827"},{"type":"electronic","value":"9783540344834"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2006]]},"DOI":"10.1007\/11760191_151","type":"book-chapter","created":{"date-parts":[[2006,5,11]],"date-time":"2006-05-11T14:00:36Z","timestamp":1147356036000},"page":"1036-1042","source":"Crossref","is-referenced-by-count":0,"title":["Recognition of Plasma-Induced X-Ray Photoelectron Spectroscopy Fault Pattern Using Wavelet and Neural Network"],"prefix":"10.1007","author":[{"given":"Byungwhan","family":"Kim","sequence":"first","affiliation":[]},{"given":"Sooyoun","family":"Kim","sequence":"additional","affiliation":[]},{"given":"Sang Jeen","family":"Hong","sequence":"additional","affiliation":[]}],"member":"297","reference":[{"key":"151_CR1","doi-asserted-by":"publisher","first-page":"124","DOI":"10.1002\/(SICI)1096-9918(199802)26:2<124::AID-SIA355>3.0.CO;2-B","volume":"26","author":"J.O. Stevenson","year":"1998","unstructured":"Stevenson, J.O., Ward, P.P., Smith, M.L., Markle, R.J.: A Plasma Process Monitor\/Control System. Surf. Interf. Anal.\u00a026, 124\u2013133 (1998)","journal-title":"Surf. Interf. Anal."},{"key":"151_CR2","doi-asserted-by":"publisher","first-page":"101","DOI":"10.1117\/12.186777","volume":"2336","author":"F. Bose","year":"1994","unstructured":"Bose, F., Patrick, R., Baltes, H.: Measurement of Discharge Impedance for Dry Etch Proc-ess Control. SPIE\u00a02336, 101\u2013110 (1994)","journal-title":"SPIE"},{"issue":"1","key":"151_CR3","doi-asserted-by":"publisher","first-page":"58","DOI":"10.1116\/1.582117","volume":"18","author":"B. Kim","year":"2000","unstructured":"Kim, B., Lee, C.: Monitoring Plasma Impedance Match Characteristics in a Multipole In-ductively Coupled Plasma for Process Control. J. Vac. Sci. Technol. A\u00a018(1), 58\u201362 (2000)","journal-title":"J. Vac. Sci. Technol. A"},{"issue":"4","key":"151_CR4","doi-asserted-by":"publisher","first-page":"598","DOI":"10.1109\/TSM.2003.818976","volume":"16","author":"S.J. Hong","year":"2003","unstructured":"Hong, S.J., May, G.S., Park, D.C.: Neural Network Modeling of Reactive Ion Etching Us-ing Optical Emission Spectroscopy Data. IEEE Trans. Semicond. Manufact.\u00a016(4), 598\u2013608 (2003)","journal-title":"IEEE Trans. Semicond. Manufact."},{"issue":"4","key":"151_CR5","doi-asserted-by":"publisher","first-page":"397","DOI":"10.1016\/j.mee.2004.07.070","volume":"75","author":"B. Kim","year":"2004","unstructured":"Kim, B., Kim, S.: Partial Diagnostic Data to Plasma Etch Modeling Using Neural Network. Microelectron. Eng.\u00a075(4), 397\u2013404 (2004)","journal-title":"Microelectron. Eng."},{"issue":"1","key":"151_CR6","doi-asserted-by":"publisher","first-page":"44","DOI":"10.1016\/j.mee.2005.05.007","volume":"82","author":"B. Kim","year":"2005","unstructured":"Kim, B., Kim, S.: Diagnosis of Plasma Processing Equipment Using Neural Metwork Recognition of Wavelet-Filtered Impedance Matching. Microelectron. Eng.\u00a082(1), 44\u201352 (2005)","journal-title":"Microelectron. Eng."},{"issue":"1","key":"151_CR7","doi-asserted-by":"publisher","first-page":"39","DOI":"10.1109\/3476.585143","volume":"20","author":"B. Kim","year":"1997","unstructured":"Kim, B., May, G.S.: Real-Time Diagnosis of Semiconductor Manufacturing Equipment Using a Hybrid Neural Network Expert System. IEEE Trans. Comp. Packag. Manufact. Technol.\u00a020(1), 39\u201347 (1997)","journal-title":"IEEE Trans. Comp. Packag. Manufact. Technol."},{"key":"151_CR8","doi-asserted-by":"crossref","DOI":"10.7551\/mitpress\/5236.001.0001","volume-title":"Parallel Distributed Processing","author":"D.E. Rummelhart","year":"1986","unstructured":"Rummelhart, D.E., McClelland, J.L.: Parallel Distributed Processing. MIT Press, Cam-bridge (1986)"},{"issue":"6","key":"151_CR9","doi-asserted-by":"publisher","first-page":"2455","DOI":"10.1116\/1.1629715","volume":"21","author":"B. Kim","year":"2003","unstructured":"Kim, B., Lee, S.Y., Lee, B.T.: Etching of 4-H SiC in a NF3\/CH4 Incudctively Coupled Plasma. J. Vac. Sci. Technol. B\u00a021(6), 2455\u20132460 (2003)","journal-title":"J. Vac. Sci. Technol. B"},{"issue":"1","key":"151_CR10","doi-asserted-by":"publisher","first-page":"39","DOI":"10.1016\/S0169-7439(01)00107-1","volume":"56","author":"B. Kim","year":"2001","unstructured":"Kim, B., Park, S.: An Optimal Neural Network Plasma Model: a Case Study. Chemometr. Intell. Lab. Syst.\u00a056(1), 39\u201350 (2001)","journal-title":"Chemometr. Intell. Lab. Syst."}],"container-title":["Lecture Notes in Computer Science","Advances in Neural Networks - ISNN 2006"],"original-title":[],"link":[{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/11760191_151.pdf","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2021,4,27]],"date-time":"2021-04-27T07:09:08Z","timestamp":1619507348000},"score":1,"resource":{"primary":{"URL":"http:\/\/link.springer.com\/10.1007\/11760191_151"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2006]]},"ISBN":["9783540344827","9783540344834"],"references-count":10,"URL":"https:\/\/doi.org\/10.1007\/11760191_151","relation":{},"ISSN":["0302-9743","1611-3349"],"issn-type":[{"type":"print","value":"0302-9743"},{"type":"electronic","value":"1611-3349"}],"subject":[],"published":{"date-parts":[[2006]]}}}