{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,6,4]],"date-time":"2025-06-04T04:16:39Z","timestamp":1749010599451,"version":"3.41.0"},"publisher-location":"Dordrecht","reference-count":37,"publisher":"Springer Netherlands","isbn-type":[{"type":"print","value":"9789401775106"},{"type":"electronic","value":"9789401775120"}],"license":[{"start":{"date-parts":[[2016,1,1]],"date-time":"2016-01-01T00:00:00Z","timestamp":1451606400000},"content-version":"unspecified","delay-in-days":0,"URL":"http:\/\/www.springer.com\/tdm"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2016]]},"DOI":"10.1007\/978-94-017-7512-0_2","type":"book-chapter","created":{"date-parts":[[2016,5,26]],"date-time":"2016-05-26T16:17:40Z","timestamp":1464279460000},"page":"29-62","source":"Crossref","is-referenced-by-count":8,"title":["Reliability of 3D NAND Flash Memories"],"prefix":"10.1007","author":[{"given":"A.","family":"Grossi","sequence":"first","affiliation":[]},{"given":"C.","family":"Zambelli","sequence":"additional","affiliation":[]},{"given":"P.","family":"Olivo","sequence":"additional","affiliation":[]}],"member":"297","published-online":{"date-parts":[[2016,5,27]]},"reference":[{"doi-asserted-by":"crossref","unstructured":"R. Micheloni et al., Inside NAND Flash Memories (Springer, 2010)","key":"2_CR1","DOI":"10.1007\/978-90-481-9431-5"},{"doi-asserted-by":"crossref","unstructured":"C. Lee et al., Multi-level NAND flash memory with 63\u00a0nm-node TANOS (Si-Oxide-SiN-Al2O3-TaN) cell structure, in VLSI Symposium Technical Digest (2006), pp. 21\u201322","key":"2_CR2","DOI":"10.1109\/VLSIT.2006.1705197"},{"unstructured":"G. Van Den Bosch, Physics and reliability of 2D and 3D SONOS devices, in IEEE International Memory Workshop (IMW), Tutorial, 18\u201321 May 2014","key":"2_CR3"},{"doi-asserted-by":"crossref","unstructured":"A. Grossi et al., Bit error rate analysis in charge trapping memories for SSD applications, in IEEE International Reliability Physics Symposium (IRPS), June 2014, pp. MY.7.1\u2013MY.7.5","key":"2_CR4","DOI":"10.1109\/IRPS.2014.6861161"},{"doi-asserted-by":"crossref","unstructured":"Y. Cai et al., Threshold voltage distribution in MLC NAND flash memory: characterization, analysis, and modeling, in Design, Automation Test in Europe Conference Exhibition (DATE), Mar 2013, pp. 1285\u20131290","key":"2_CR5","DOI":"10.7873\/DATE.2013.266"},{"key":"2_CR6","doi-asserted-by":"crossref","first-page":"3707","DOI":"10.1109\/TED.2011.2165722","volume":"58","author":"A Chimenton","year":"2011","unstructured":"A. Chimenton et al., A statistical model of erratic behaviors in NAND flash memory arrays. IEEE Trans. Electron Devices 58, 3707\u20133711 (2011)","journal-title":"IEEE Trans. Electron Devices"},{"doi-asserted-by":"crossref","unstructured":"T. Ong et al., Erratic erase in ETOX TM flash memory array, in Proceedings of VLSI Symposium Technical, pp. 83\u201384 (1993)","key":"2_CR7","DOI":"10.1109\/VLSIT.1993.760256"},{"doi-asserted-by":"crossref","unstructured":"C. Dunn et al., Flash EPROM disturb mechanisms, in Proceedings of IEEE International Reliability Physics Symposium (IRPS), Apr 1994, pp. 299\u2013308","key":"2_CR8","DOI":"10.1109\/RELPHY.1994.307820"},{"doi-asserted-by":"crossref","unstructured":"C. Zambelli et al., Analysis of edge wordline disturb in multimegabit charge trapping flash NAND arrays, in IEEE International Reliability Physics Symposium (IRPS), 10\u201314 Apr 2011, pp. MY.4.1\u2013MY.4.5","key":"2_CR9","DOI":"10.1109\/IRPS.2011.5784587"},{"unstructured":"J. Lee, C. Lee, M. Lee, H. Kim, K. Park, W. Lee, A new programming disturbance phenomenon in NAND flash memory by source\/drain hot electrons generated by GIDL current, in Proceedings of the NVSM Workshop (2006), pp. 31\u201333","key":"2_CR10"},{"unstructured":"A. Arreghini et al., Experimental extraction of the charge centroid and of the charge type in the P\/E operations of the SONOS memory cells, in IEDM 2006 Technical Digest (2006), pp. 499\u2013502","key":"2_CR11"},{"doi-asserted-by":"crossref","unstructured":"L. Vandelli et al., Role of holes and electrons during erase of TANOS memories: evidences for dipole formation and its impact on reliability, in IEEE International Reliability Physics Symposium (IRPS), 2\u20136 May 2010, pp. 731\u2013737","key":"2_CR12","DOI":"10.1109\/IRPS.2010.5488743"},{"doi-asserted-by":"crossref","unstructured":"A. Arreghini et al., Characterization and modeling of long term retention in SONOS non volatile memories, in Solid State Device Research Conference, 37th European ESSDERC, 11\u201313 Sept 2007, pp. 406\u2013409","key":"2_CR13","DOI":"10.1109\/ESSDERC.2007.4430964"},{"doi-asserted-by":"crossref","unstructured":"C.-P. Chen et al., Study of fast initial charge loss and it\u2019s impact on the programmed states VT distribution of charge-trapping NAND flash, in IEEE International Electron Devices Meeting (IEDM) (2010), pp. 5.6.1\u20135.6.4","key":"2_CR14","DOI":"10.1109\/IEDM.2010.5703304"},{"doi-asserted-by":"crossref","unstructured":"J.K. Park et al., Origin of transient Vth shift after erase and its impact on 2D\/3D structure charge trap flash memory cell operations, in IEEE International Electron Devices Meeting (IEDM), 10\u201313 Dec 2012, pp. 2.4.1\u20132.4.4","key":"2_CR15","DOI":"10.1109\/IEDM.2012.6478964"},{"doi-asserted-by":"crossref","unstructured":"H. Park et al., Charge loss in TANOS devices caused by Vt sensing measurements during retention, in IEEE International Memory Workshop (IMW), 16\u201319 May 2010, pp. 1\u20132","key":"2_CR16","DOI":"10.1109\/IMW.2010.5488409"},{"doi-asserted-by":"crossref","unstructured":"H. Tanaka et al., Bit cost scalable technology with punch and plug process for ultra high density flash memory, in IEEE Symposium on VLSI Technology, 12\u201314 June 2007, pp. 14\u201315","key":"2_CR17","DOI":"10.1109\/VLSIT.2007.4339708"},{"unstructured":"J. Jang et al., Vertical cell array using TCAT (terabit cell array transistor) technology for ultra high density NAND flash memory, in IEEE Symposium on VLSI Technology, 16\u201318 June 2009, pp. 192\u2013193","key":"2_CR18"},{"doi-asserted-by":"crossref","unstructured":"S.J. Whang et al., Novel 3-dimensional dual control-gate with surrounding floating-gate (DC-SF) NAND flash cell for 1\u00a0Tb file storage application, in IEEE International Electron Devices Meeting (IEDM), 6\u20138 Dec 2010, pp. 29.7.1\u201329.7.4","key":"2_CR19","DOI":"10.1109\/IEDM.2010.5703447"},{"unstructured":"W. Kim et al., Multi-layered vertical gate NAND flash overcoming stacking limit for terabit density storage, in IEEE Symposium on VLSI Technology, 16\u201318 June 2009, pp. 188\u2013189","key":"2_CR20"},{"doi-asserted-by":"crossref","unstructured":"A. Goda et al., Scaling directions for 2D and 3D NAND cells, in IEEE International Electron Devices Meeting (IEDM), 10\u201313 Dec 2012, pp. 2.1.1\u20132.1.4","key":"2_CR21","DOI":"10.1109\/IEDM.2012.6478961"},{"unstructured":"H.T. Lue et al., 3D vertical gate NAND device and architecture, in IEEE International Memory Workshop (IMW), Tutorial, 18\u201321 May 2014","key":"2_CR22"},{"unstructured":"Y. Fukuzumi et al., Optimal integration and characteristics of vertical array devices for ultra-high density, bit-cost scalable flash memory, in IEDM Technical Digest (2007), pp. 449\u2013452","key":"2_CR23"},{"doi-asserted-by":"crossref","unstructured":"Y. Kim et al., Coding scheme for 3D vertical flash memory, in IEEE International Conference on Communications (ICC), 8\u201312 June 2015","key":"2_CR24","DOI":"10.1109\/ICC.2015.7248332"},{"doi-asserted-by":"crossref","unstructured":"E. Nowak et al., In-depth analysis of 3D silicon nanowire SONOS memory characteristics by TCAD simulations, in IEEE International Memory Workshop (IMW), 16\u201319 May 2010, pp. 1\u20134","key":"2_CR25","DOI":"10.1109\/IMW.2010.5488387"},{"unstructured":"H.-T. Lue et al., Understanding STI edge fringing field effect on the scaling of charge-trapping (CT) NAND flash and modeling of incremental step pulse programming (ISPP), in IEDM Technical Digest (2009), pp. 839\u2013842","key":"2_CR26"},{"issue":"9","key":"2_CR27","doi-asserted-by":"crossref","first-page":"3116","DOI":"10.1109\/TED.2011.2159010","volume":"58","author":"SM Amoroso","year":"2011","unstructured":"S.M. Amoroso et al., Semi-analytical model for the transient operation of gate-all-around charge-trap memories. IEEE Trans. Electron Devices 58(9), 3116\u20133123 (2011)","journal-title":"IEEE Trans. Electron Devices"},{"doi-asserted-by":"crossref","unstructured":"X. Li et al., Investigation of charge loss mechanisms in 3D TANOS cylindrical junction-less charge trapping memory, in IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT), 28\u201331 Oct 2014, pp. 1\u20133","key":"2_CR28","DOI":"10.1109\/ICSICT.2014.7021373"},{"doi-asserted-by":"crossref","unstructured":"Z. Lun et al., Investigation of retention behavior for 3D charge trapping NAND flash memory by 2D self-consistent simulation, in International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 9\u201311 Sept 2014, pp. 141\u2013144","key":"2_CR29","DOI":"10.1109\/SISPAD.2014.6931583"},{"doi-asserted-by":"crossref","unstructured":"Y. Yanagihara et al., Control gate length, spacing and stacked layer number design for 3D-stackable NAND flash memory, in IEEE International Memory Workshop (IMW), 20\u201323 May 2012, pp. 1\u20134","key":"2_CR30","DOI":"10.1109\/IMW.2012.6213656"},{"unstructured":"E.-S. Choi et al., Device considerations for high density and highly reliable 3D NAND flash cell in near future, in IEEE International Electron Devices Meeting (IEDM), 10\u201313 Dec 2012, pp. 9.4.1\u20139.4.4","key":"2_CR31"},{"doi-asserted-by":"crossref","unstructured":"M.K. Seo et al., The 3-dimensional vertical FG NAND flash memory cell arrays with the novel electrical S\/D technique using the extended sidewall control gate (ESCG), in IEEE International Memory Workshop (IMW), May 2010, pp. 146\u2013149","key":"2_CR32","DOI":"10.1109\/IMW.2010.5488392"},{"issue":"4","key":"2_CR33","doi-asserted-by":"crossref","first-page":"1327","DOI":"10.1109\/TED.2013.2247606","volume":"60","author":"S Aritome","year":"2013","unstructured":"S. Aritome et al., Advanced DC-SF cell technology for 3-D NAND flash. IEEE Trans. Electron Devices 60(4), 1327\u20131333 (2013)","journal-title":"IEEE Trans. Electron Devices"},{"doi-asserted-by":"crossref","unstructured":"S.J. Whang et al., Novel 3-dimensional dual control-gate with surrounding floating-gate (DC-SF) NAND flash cell for 1Tb file storage application, in IEEE International Electron Devices Meeting (IEDM), 6\u20138 Dec 2010, pp. 29.7.1\u201329.7.4","key":"2_CR34","DOI":"10.1109\/IEDM.2010.5703447"},{"doi-asserted-by":"crossref","unstructured":"M.K. Seo et al., A novel 3-D vertical FG NAND flash memory cell arrays using the separated sidewall control gate (S-SCG) for highly reliable MLC operation, in IEEE International Memory Workshop (IMW), 22\u201325 May 2011, pp. 1\u20134","key":"2_CR35","DOI":"10.1109\/IMW.2011.5873208"},{"doi-asserted-by":"crossref","unstructured":"K. Parat et al., A floating gate based 3D NAND technology with CMOS under array in IEEE International Electron Devices Meeting (IEDM), 7\u20139 Dec 2015","key":"2_CR36","DOI":"10.1109\/IEDM.2015.7409618"},{"unstructured":"B. Prince, 3D vertical NAND flash revolutionary or evolutionary, in IEEE International Memory Workshop, Tutorial, 17\u201320 May 2015","key":"2_CR37"}],"container-title":["3D Flash Memories"],"original-title":[],"language":"en","link":[{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/978-94-017-7512-0_2","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,3]],"date-time":"2025-06-03T19:40:37Z","timestamp":1748979637000},"score":1,"resource":{"primary":{"URL":"http:\/\/link.springer.com\/10.1007\/978-94-017-7512-0_2"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2016]]},"ISBN":["9789401775106","9789401775120"],"references-count":37,"URL":"https:\/\/doi.org\/10.1007\/978-94-017-7512-0_2","relation":{},"subject":[],"published":{"date-parts":[[2016]]}}}