{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,10,2]],"date-time":"2025-10-02T06:02:33Z","timestamp":1759384953889,"version":"3.32.0"},"reference-count":25,"publisher":"Springer Science and Business Media LLC","issue":"4","license":[{"start":{"date-parts":[[1988,12,1]],"date-time":"1988-12-01T00:00:00Z","timestamp":596937600000},"content-version":"tdm","delay-in-days":0,"URL":"http:\/\/www.springer.com\/tdm"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Machine Vis. Apps."],"published-print":{"date-parts":[[1988,12]]},"DOI":"10.1007\/bf01212360","type":"journal-article","created":{"date-parts":[[2005,2,25]],"date-time":"2005-02-25T13:05:02Z","timestamp":1109336702000},"page":"205-221","source":"Crossref","is-referenced-by-count":27,"title":["The P300: A system for automatic patterned wafer inspection"],"prefix":"10.1007","volume":"1","author":[{"given":"Byron E.","family":"Dom","sequence":"first","affiliation":[]},{"given":"Virginia H.","family":"Brecher","sequence":"additional","affiliation":[]},{"given":"Raymond","family":"Bonner","sequence":"additional","affiliation":[]},{"given":"John S.","family":"Batchelder","sequence":"additional","affiliation":[]},{"given":"Robert S.","family":"Jaffe","sequence":"additional","affiliation":[]}],"member":"297","reference":[{"key":"CR1","unstructured":"Awamura D. (December 1982) Automatic photomask and wafer fault inspection systems. JEE: 65?67"},{"key":"CR2","doi-asserted-by":"crossref","first-page":"130","DOI":"10.1117\/12.947757","volume":"538","author":"ML Baird","year":"1985","unstructured":"Baird ML (1985) Extending the limits of pattern inspection using machine vision. SPIE Optical Microlithography IV 538:130?135","journal-title":"SPIE Optical Microlithography IV"},{"key":"CR3","doi-asserted-by":"crossref","unstructured":"Blanz EW, Sanz JLC, Hinkle EB (1988) Image analysis methods for solder ball inspection in integrated circuit manufacturing. IEEE J. Robotics and Automation","DOI":"10.1109\/56.2076"},{"key":"CR4","unstructured":"Dom BE, Kirtley KB, Bonner R, Chastang JC (1987) C4 pad analysis system. Proceedings of SEMICON East: 116?121"},{"key":"CR5","volume-title":"Proceedings of the SPIE 1987 Symposium on Microlithography","author":"JR Dralla","year":"1987","unstructured":"Dralla JR, Hoff JC, Lee AH (March 1987) Automatic submicrometer defect detection during VLSI circuit production. Proceedings of the SPIE 1987 Symposium on Microlithography, Santa Clara, CA"},{"key":"CR6","unstructured":"Dralla JR, Lee AH (1987) Micropatterning process control through fully automatic inspection and measurement, Proceedings of SEMICON West"},{"key":"CR7","doi-asserted-by":"crossref","first-page":"326","DOI":"10.1016\/0146-664X(73)90011-7","volume":"2","author":"M Ejiri","year":"1973","unstructured":"Ejiri M et al. (1973) A process for detecting defects in complicated patterns. Computer Graphics and Image Proc (2):326?339","journal-title":"Computer Graphics and Image Proc"},{"key":"CR8","volume-title":"Integrated circuit fabrication technology","author":"DJ Elliot","year":"1982","unstructured":"Elliot DJ (1982) Integrated circuit fabrication technology. McGRaw-Hill, New York"},{"key":"CR9","first-page":"122","volume":"538","author":"PV Fraser","year":"1985","unstructured":"Fraser PV, Wallman BA (1985) Data base inspection of wafer resist patterns. SPIE Optical Microlithography 538:122?129","journal-title":"SPIE Optical Microlithography"},{"issue":"5","key":"CR10","doi-asserted-by":"crossref","first-page":"731","DOI":"10.1117\/12.7973567","volume":"24","author":"RL Fusek","year":"1985","unstructured":"Fusek RL et al. (1985) Holographic optical processing for submicrometer defect defect detection. Optical Engineering 24(5):731?734","journal-title":"Optical Engineering"},{"issue":"3","key":"CR11","doi-asserted-by":"crossref","first-page":"46","DOI":"10.1002\/ecjb.4420700305","volume":"7","author":"Y Hara","year":"1987","unstructured":"Hara Y (March 1987) Automating inspection of aluminum circuit patterns of LSI wafers. Electron. and Commun. in Japan, Part 2, 7(3):46?58 (February 1984)","journal-title":"Electron. and Commun. in Japan, Part 2"},{"key":"CR12","unstructured":"Harris KL, Sandland P, Singleton RM (April 1983) Wafer inspection automation: Current and future needs. Solid State Technology"},{"key":"CR13","unstructured":"Harris KL, Sandland P, Singleton RM (February 1984) Automatic inspection of wafer patterns with applications in stepping, projection and direct-write lithography. Solid State Technology: 159?179"},{"key":"CR14","unstructured":"Iscoff R (November 1982) Wafer defect detection systems. Semiconductor International 39?52"},{"key":"CR15","unstructured":"Kayaalp AE, Jain R (March 1985) A knowledge based automatic on-line wafer (IC) inspection system. VISION85 Proceedings 5-117-5-130"},{"key":"CR16","doi-asserted-by":"crossref","first-page":"128","DOI":"10.1117\/12.933620","volume":"336","author":"T Konishi","year":"1982","unstructured":"Konishi T, Misono M, Kato T (1982) New technique for inspecting charge-coupled device (CCD) wafers for defects. SPIE Robot Vision 336:128?132","journal-title":"SPIE Robot Vision"},{"key":"CR17","doi-asserted-by":"crossref","first-page":"145","DOI":"10.1080\/02786828608959085","volume":"5","author":"P Lilienfeld","year":"1986","unstructured":"Lilienfeld P (1986) Optical detection of participate contamination on surfaces: A review. Aerosol Sci & Tech 5:145?165","journal-title":"Aerosol Sci & Tech"},{"key":"CR18","doi-asserted-by":"crossref","unstructured":"Lin LH et al. A holographic photomask defect inspection system. SPIE Optical Microlithography 538:110?116","DOI":"10.1117\/12.947754"},{"key":"CR19","unstructured":"Lyman J (March 5, 1987) Moving wafer inspection into the fast lane. Electronics: 74?76"},{"issue":"l","key":"CR20","doi-asserted-by":"crossref","first-page":"73","DOI":"10.1147\/rd.291.0073","volume":"29","author":"JR Mandeville","year":"1985","unstructured":"Mandeville JR (January 1985) Novel method for analysis of printed circuit images. IBM J. Res. Develop., 29(l):73?86","journal-title":"IBM J. Res. Develop."},{"issue":"1","key":"CR21","first-page":"55","volume":"34","author":"Y Nakagawa","year":"1985","unstructured":"Nakagawa Y et al. (1985) Automatic visual inspection using digital image processing. Hitachi Review 34(1): 55?60","journal-title":"Hitachi Review"},{"key":"CR22","doi-asserted-by":"crossref","unstructured":"Nishihara HK, Crossley PA (1988) Measuring photographic overlay accuracy and critical dimensions by correlating binarized laplacian of gaussian convolutions. IEEE Trans PAMI 10(1)","DOI":"10.1109\/34.3864"},{"key":"CR23","doi-asserted-by":"crossref","first-page":"1465","DOI":"10.1364\/JOSAA.3.001465","volume":"3","author":"JLC Sanz","year":"1986","unstructured":"Sanz JLC, Jain AK (September 1986) Machine-vision techniques for inspection of printed wiring boards and thick-film circuits. J. Opt. Soc. Am. 3:1465?1482","journal-title":"J. Opt. Soc. Am."},{"key":"CR24","volume-title":"Mathematical morphology","author":"J Serra","year":"1982","unstructured":"Serra J (1982) Mathematical morphology. Academic Press, New York"},{"issue":"1","key":"CR25","doi-asserted-by":"crossref","first-page":"4","DOI":"10.1109\/34.3863","volume":"10","author":"H Yoda","year":"1988","unstructured":"Yoda H et al. (January 1988) An automatic wafer inspection machine using pipelined image processing techniques. IEEE Trans PAMI 10(1):4?16","journal-title":"IEEE Trans PAMI"}],"container-title":["Machine Vision and Applications"],"original-title":[],"language":"en","link":[{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/BF01212360.pdf","content-type":"application\/pdf","content-version":"vor","intended-application":"text-mining"},{"URL":"http:\/\/link.springer.com\/article\/10.1007\/BF01212360\/fulltext.html","content-type":"text\/html","content-version":"vor","intended-application":"text-mining"},{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/BF01212360","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2024,12,23]],"date-time":"2024-12-23T22:23:39Z","timestamp":1734992619000},"score":1,"resource":{"primary":{"URL":"http:\/\/link.springer.com\/10.1007\/BF01212360"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[1988,12]]},"references-count":25,"journal-issue":{"issue":"4","published-print":{"date-parts":[[1988,12]]}},"alternative-id":["BF01212360"],"URL":"https:\/\/doi.org\/10.1007\/bf01212360","relation":{},"ISSN":["0932-8092","1432-1769"],"issn-type":[{"type":"print","value":"0932-8092"},{"type":"electronic","value":"1432-1769"}],"subject":[],"published":{"date-parts":[[1988,12]]}}}