{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,15]],"date-time":"2025-11-15T17:07:46Z","timestamp":1763226466825,"version":"3.37.3"},"reference-count":36,"publisher":"Springer Science and Business Media LLC","issue":"12","license":[{"start":{"date-parts":[[2017,3,30]],"date-time":"2017-03-30T00:00:00Z","timestamp":1490832000000},"content-version":"tdm","delay-in-days":0,"URL":"http:\/\/www.springer.com\/tdm"}],"content-domain":{"domain":["link.springer.com"],"crossmark-restriction":false},"short-container-title":["Neural Comput & Applic"],"published-print":{"date-parts":[[2018,12]]},"DOI":"10.1007\/s00521-017-2954-3","type":"journal-article","created":{"date-parts":[[2017,3,30]],"date-time":"2017-03-30T19:10:21Z","timestamp":1490901021000},"page":"3721-3731","update-policy":"https:\/\/doi.org\/10.1007\/springer_crossmark_policy","source":"Crossref","is-referenced-by-count":11,"title":["Numerical investigation of heat and mass transfer flow under the influence of silicon carbide by means of plasma-enhanced chemical vapor deposition vertical reactor"],"prefix":"10.1007","volume":"30","author":[{"given":"Kamel Milani","family":"Shirvan","sequence":"first","affiliation":[]},{"ORCID":"https:\/\/orcid.org\/0000-0002-7805-8259","authenticated-orcid":false,"given":"Rahmat","family":"Ellahi","sequence":"additional","affiliation":[]},{"given":"Tahereh Fanaie","family":"Sheikholeslami","sequence":"additional","affiliation":[]},{"given":"Amin","family":"Behzadmehr","sequence":"additional","affiliation":[]}],"member":"297","published-online":{"date-parts":[[2017,3,30]]},"reference":[{"key":"2954_CR1","doi-asserted-by":"crossref","unstructured":"Tong L, Mehregany M, Tang WC (1993) Amorphous silicon carbide films by plasma-enhanced chemical vapor deposition. In: Proceedings IEEE micro electro mechanical systems. Fort Lauderdale, FL, pp 242\u2013247","DOI":"10.1109\/MEMSYS.1993.296915"},{"key":"2954_CR2","volume-title":"Characterization & optimization of low stress PECVD silicon nitride for production GaAs manufacturing","author":"KD Mackenzie","year":"2004","unstructured":"Mackenzie KD, Reelfs B, DeVre MW, Westerman R, Johnson DJ (2004) Characterization & optimization of low stress PECVD silicon nitride for production GaAs manufacturing. Unaxis USA Inc., St. Petersburg, FL"},{"key":"2954_CR3","first-page":"864","volume":"45","author":"WS Choi","year":"2004","unstructured":"Choi WS, Hong B, Jeon Y, Kim K, Yi J (2004) Synthesis and characterization of diamond-like carbon protective ar coating. Korean Phys Soc 45:864\u2013867","journal-title":"Korean Phys Soc"},{"key":"2954_CR4","doi-asserted-by":"crossref","first-page":"344","DOI":"10.1016\/j.vacuum.2011.07.061","volume":"86","author":"J Ding","year":"2011","unstructured":"Ding J, Zhao Y, Yuan N, Shubo M, Wang C, Ye F, Kan B (2011) Effect of electrode architecture and process parameters on distribution of SiH3 in a PECVD system. Vacuum 86:344\u2013349","journal-title":"Vacuum"},{"key":"2954_CR5","doi-asserted-by":"crossref","first-page":"202","DOI":"10.1016\/j.jiec.2008.09.013","volume":"15","author":"YM Jeong","year":"2009","unstructured":"Jeong YM, Lee JK, Jun HW, Kim GR, Choe Y (2009) Preparation of super-hydrophilic amorphous titanium dioxide thin film via PECVD process and its application to dehumidifying heat exchangers. Ind Eng Chem 15:202\u2013206","journal-title":"Ind Eng Chem"},{"key":"2954_CR6","doi-asserted-by":"crossref","first-page":"385","DOI":"10.1016\/j.solmat.2007.09.013","volume":"92","author":"A Chowdhury","year":"2008","unstructured":"Chowdhury A, Mukhopadhyay S, Ray S (2008) Effect of gas flow rates on PECVD-deposited nanocrystalline silicon thin film and solar cell properties. Solar Energy Mater Solar Cells 92:385\u2013392","journal-title":"Solar Energy Mater Solar Cells"},{"key":"2954_CR7","doi-asserted-by":"crossref","first-page":"1113","DOI":"10.3938\/jkps.51.1113","volume":"51","author":"JS Baek","year":"2007","unstructured":"Baek JS, Kim YJ (2007) Characteristics of thermal-flow fields in a PECVD reactor with various operating conditions. Korean Phys Soc 51:1113\u20131118","journal-title":"Korean Phys Soc"},{"key":"2954_CR8","doi-asserted-by":"crossref","first-page":"2032","DOI":"10.4028\/www.scientific.net\/AMR.189-193.2032","volume":"189","author":"ZJ Wang","year":"2011","unstructured":"Wang ZJ, Feng X, Shang XF (2011) The simulation of polycrystalline silicon thin film deposition in PECVD system. Adv Mater Res 189:2032\u20132036","journal-title":"Adv Mater Res"},{"key":"2954_CR9","doi-asserted-by":"crossref","first-page":"297","DOI":"10.1149\/04901.0297ecst","volume":"49","author":"FB Colomboa","year":"2012","unstructured":"Colomboa FB, Carre\u00f1o MNP (2012) Simulation of PECVD SiO2 deposition using a cellular automata approach. ECS Trans 49:297\u2013304","journal-title":"ECS Trans"},{"issue":"1","key":"2954_CR10","doi-asserted-by":"crossref","first-page":"73","DOI":"10.1016\/S0020-7225(97)00019-0","volume":"36","author":"M Marin","year":"1998","unstructured":"Marin M, Marinescu C (1998) Thermoelasticity of initially stressed bodies, asymptotic equipartition of energies. Int J Eng Sci 36(1):73\u201386","journal-title":"Int J Eng Sci"},{"issue":"5","key":"2954_CR11","doi-asserted-by":"crossref","first-page":"507","DOI":"10.1177\/107754639800400501","volume":"4","author":"M Marin","year":"1998","unstructured":"Marin M, Lupu M (1998) On harmonic vibrations in thermoelasticity of micropolar bodies. J Vib Control 4(5):507\u2013518","journal-title":"J Vib Control"},{"issue":"5","key":"2954_CR12","doi-asserted-by":"crossref","first-page":"3446","DOI":"10.1016\/j.nonrwa.2009.12.005","volume":"11","author":"M Marin","year":"2010","unstructured":"Marin M (2010) A domain of influence theorem for microstretch elastic materials. Nonlinear Anal RWA 11(5):3446\u20133452","journal-title":"Nonlinear Anal RWA"},{"key":"2954_CR13","doi-asserted-by":"crossref","first-page":"20","DOI":"10.1016\/j.cplett.2016.08.043","volume":"661","author":"N Sher Akbar","year":"2016","unstructured":"Sher Akbar N, Tripathi D, Khan ZH, Anwar B\u00e9g O (2016) A numerical study of magnetohydrodynamic transport of nanofluids over a vertical stretching sheet with exponential temperature-dependent viscosity and buoyancy effects. Chem Phys Lett 661:20\u201330","journal-title":"Chem Phys Lett"},{"issue":"06","key":"2954_CR14","doi-asserted-by":"crossref","first-page":"1650088","DOI":"10.1142\/S0219519416500883","volume":"16","author":"N Sher Akbar","year":"2016","unstructured":"Sher Akbar N, Tripathi D, Anwar B\u00e9g O (2016) Modeling nanoparticle geometry effects on peristaltic pumping of medical magnetohydrodynamic nanofluids with heat transfer. J Mech Med Biol 16(06):1650088\u20131650108","journal-title":"J Mech Med Biol"},{"key":"2954_CR15","doi-asserted-by":"crossref","first-page":"21","DOI":"10.1016\/j.cmpb.2016.08.001","volume":"136","author":"N Sher Akbar","year":"2016","unstructured":"Sher Akbar N, Kazmi N, TripathiD Mir NA (2016) Study of heat transfer on physiological driven movement with CNT nanofluids and variable viscosity. Comput Methods Progr Biomed 136:21\u201329","journal-title":"Comput Methods Progr Biomed"},{"issue":"2","key":"2954_CR16","doi-asserted-by":"crossref","first-page":"453","DOI":"10.1016\/j.apt.2016.10.018","volume":"28","author":"N Sher Akbar","year":"2017","unstructured":"Sher Akbar N, Tripathi D, Anwar B\u00e9g O (2017) MHD convective heat transfer of nanofluids through a flexible tube with buoyancy: a study of nano-particle shape effects. Adv Powder Technol 28(2):453\u2013462","journal-title":"Adv Powder Technol"},{"issue":"9","key":"2954_CR17","doi-asserted-by":"crossref","first-page":"332","DOI":"10.1140\/epjp\/i2016-16332-y","volume":"131","author":"N Sher Akbar","year":"2017","unstructured":"Sher Akbar N, Bintul Huda A, Tripathi D (2017) Thermally developing MHD peristaltic transport of nanofluids with velocity and thermal slip effects. Eur Phys J Plus 131(9):332","journal-title":"Eur Phys J Plus"},{"key":"2954_CR18","volume-title":"Chemical vapor deposition processes, chapter 4","author":"CR Kleijin","year":"1995","unstructured":"Kleijin CR (1995) Chemical vapor deposition processes, chapter 4. Artech House, Boston"},{"issue":"1","key":"2954_CR19","doi-asserted-by":"crossref","first-page":"36","DOI":"10.1016\/S0022-3093(01)01175-9","volume":"299\u2013302","author":"A Pfl\u0171ger","year":"2002","unstructured":"Pfl\u0171ger A, Schr\u00f6der B (2002) Simulations of the gas flux distribution for different gas showers and filament geometries on the large-area deposition of amorphous silicon by hot-wire CVD. J Non Cryst Solids 299\u2013302(1):36\u201341","journal-title":"J Non Cryst Solids"},{"issue":"3","key":"2954_CR20","doi-asserted-by":"crossref","first-page":"603","DOI":"10.1016\/j.cej.2007.05.042","volume":"137","author":"Li HC ChengWT","year":"2008","unstructured":"ChengWT Li HC, Huang CN (2008) Simulation and optimization of silicon thermal CVD through CFD integrating Taguchi method. Chem Eng J 137(3):603\u2013613","journal-title":"Chem Eng J"},{"key":"2954_CR21","doi-asserted-by":"crossref","first-page":"622","DOI":"10.1016\/S0022-0248(00)00789-2","volume":"221","author":"RP Pawlowski","year":"2000","unstructured":"Pawlowski RP, Theodoropoulos C, Salinger AG, Mountziaris TJ, Moffat HK, Shadid JN, Thrush EJ (2000) Fundamental models of the metalorganic vapor-phase epitaxy of gallium nitride and their use in reactor design. J Cryst Growth 221:622\u2013628","journal-title":"J Cryst Growth"},{"key":"2954_CR22","unstructured":"Hamby ES, Demos AT, Kabamba PT, Khargonekar PP (1995) A control oriented modeling methodology for plasma enhanced chemical vapor deposition processes American Control Conference, USA"},{"key":"2954_CR23","doi-asserted-by":"crossref","first-page":"5823","DOI":"10.1143\/JJAP.37.5823","volume":"37","author":"CY Soong","year":"1998","unstructured":"Soong CY, Chyuan C, Tzong RY (1998) Thermo-flow structure and epitaxial uniformity in large-scale metalorganic chemical vapor deposition reactors with rotating susceptor and inlet flow control. Jpn J Appl Phys Part 1 37:5823\u20135834","journal-title":"Jpn J Appl Phys Part 1"},{"issue":"6","key":"2954_CR24","doi-asserted-by":"crossref","first-page":"1320","DOI":"10.1088\/1009-1963\/15\/6\/031","volume":"15","author":"W Zhi-Meng","year":"2006","unstructured":"Zhi-Meng W, Qing-Song L, Xin-Hua G, Ying Z, Jian S, Jian-Ping X (2006) Effect of substrate temperature and pressure on properties of microcrystalline silicon films. Chin Phys 15(6):1320\u20131324","journal-title":"Chin Phys"},{"issue":"5","key":"2954_CR25","first-page":"1920","volume":"55","author":"HS Cho","year":"2009","unstructured":"Cho HS, Choi DJ (2009) The study of dielectric constant change of a-SiC: H films deposited by remote PECVD with low deposition temperatures. Korean Phys Soc 55(5):1920\u20131924","journal-title":"Korean Phys Soc"},{"key":"2954_CR26","doi-asserted-by":"crossref","unstructured":"Pokhodnya K, Sandstrom J, Dai X, Boudjouk P, Schulz DL (2009) Comparative study of low-temperature PECVD of amorphous silicon using mono-, di-, trisilane and cyclohexasilane. In: 34th IEEE photovoltaic specialists conference (PVSC). Philadelphia, PA, pp 001758\u2013001760","DOI":"10.1109\/PVSC.2009.5411459"},{"key":"2954_CR27","doi-asserted-by":"crossref","first-page":"121","DOI":"10.1016\/j.dt.2013.10.004","volume":"9","author":"L Liu","year":"2013","unstructured":"Liu L, Liu W, Cao N, Cai C (2013) Study on the performance of PECVD silicon nitride thin films. Def Technol 9:121\u2013126","journal-title":"Def Technol"},{"issue":"1","key":"2954_CR28","doi-asserted-by":"crossref","first-page":"213","DOI":"10.1088\/1009-1963\/15\/1\/035","volume":"15","author":"L Qing-Song","year":"2006","unstructured":"Qing-Song L, Zhi-Meng W, Xin-HuaG Ying Z, Jian S, Jian-Ping X (2006) Effect of substrate temperature on the growth and properties of boron-doped microcrystalline silicon films. Chin Phys 15(1):213\u2013218","journal-title":"Chin Phys"},{"key":"2954_CR29","doi-asserted-by":"crossref","first-page":"390","DOI":"10.1016\/j.mssp.2015.10.005","volume":"41","author":"L Hamui","year":"2016","unstructured":"Hamui L, Monroy BM, Kim KH, L\u00f3pez-Su\u00e1rez A, Santoyo-Salazar J, L\u00f3pez-L\u00f3peze M, Cabarrocas PRI, Santana G (2016) Effect of deposition temperature on polymorphous silicon thin films by PECVD: role of hydrogen. Mater Sci Semicond Process 41:390\u2013397","journal-title":"Mater Sci Semicond Process"},{"key":"2954_CR30","doi-asserted-by":"crossref","first-page":"453","DOI":"10.1016\/j.msea.2006.07.015","volume":"435\u2013436","author":"H Huang","year":"2006","unstructured":"Huang H, Winchester KJ, Suvorova A, Lawn BR, Liu Y, Hu XZ, Dell JM, Faraone L (2006) Effect of deposition conditions on mechanical properties of low-temperature PECVD silicon nitride films. Mater Sci Eng A 435\u2013436:453\u2013459","journal-title":"Mater Sci Eng A"},{"issue":"2","key":"2954_CR31","doi-asserted-by":"crossref","first-page":"307","DOI":"10.1023\/B:PCPP.0000013203.66666.34","volume":"24","author":"B Phillips","year":"2004","unstructured":"Phillips B, Rodriguez RG, Lau LD, Steidley SD (2004) Effect of showerhead configuration on coherent Raman spectroscopically monitored pulsed radio frequency plasma enhanced chemical vapor. Plasma Chem Plasma Process 24(2):307\u2013323","journal-title":"Plasma Chem Plasma Process"},{"issue":"4","key":"2954_CR32","first-page":"489","volume":"25","author":"H Cheng","year":"2009","unstructured":"Cheng H, Wu A, Xia J, Shi N, Wen L (2009) Effects of Substrate temperature on the growth of polycrystalline Si films deposited with SiH4\u00a0+\u00a0Ar. J Mater Sci Technol 25(4):489\u2013491","journal-title":"J Mater Sci Technol"},{"key":"2954_CR33","doi-asserted-by":"crossref","first-page":"8","DOI":"10.1088\/0963-0252\/13\/1\/002","volume":"13","author":"M Moravej","year":"2004","unstructured":"Moravej M, Babayan SE, Nowling GR, Yang X, Hicks RF (2004) Plasma enhanced chemical vapour deposition of hydrogenated amorphous silicon at atmospheric pressure. Plasma Sources Sci Technol 13:8\u201314","journal-title":"Plasma Sources Sci Technol"},{"issue":"31","key":"2954_CR34","first-page":"151","volume":"597","author":"CH Lee","year":"2015","unstructured":"Lee CH, Wong WS, SazonovA Nathan A (2015) Study of deposition temperature on high crystallinity nanocrystalline silicon thin films with in-situ hydrogen plasma-passivated grains. Thin Solid Films 597(31):151\u2013157","journal-title":"Thin Solid Films"},{"key":"2954_CR35","doi-asserted-by":"crossref","unstructured":"Gu L, Yang H, Wen G, Li Y, (2011) Substrate temperature influence on properties of amorphous silicon-germanium thin films prepared by RF-PECVD. In: Symposium on Photonics and Optoelectronics (SOPO)","DOI":"10.1109\/SOPO.2011.5780661"},{"key":"2954_CR36","unstructured":"Sarmid S, Oeraman K, Ismail B, Sakrani S (2006) Effect of substrate temperature on the properties of diamond-like carbon deposited by PECVD in methane atmosphere. In: Proceedings of Annual Fundamental Scion Seminar 2006, AFSS 20061, 6\u20137 June 2006"}],"container-title":["Neural Computing and Applications"],"original-title":[],"language":"en","link":[{"URL":"http:\/\/link.springer.com\/article\/10.1007\/s00521-017-2954-3\/fulltext.html","content-type":"text\/html","content-version":"vor","intended-application":"text-mining"},{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/s00521-017-2954-3.pdf","content-type":"application\/pdf","content-version":"vor","intended-application":"text-mining"},{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/s00521-017-2954-3.pdf","content-type":"application\/pdf","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2018,11,27]],"date-time":"2018-11-27T05:40:13Z","timestamp":1543297213000},"score":1,"resource":{"primary":{"URL":"http:\/\/link.springer.com\/10.1007\/s00521-017-2954-3"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2017,3,30]]},"references-count":36,"journal-issue":{"issue":"12","published-print":{"date-parts":[[2018,12]]}},"alternative-id":["2954"],"URL":"https:\/\/doi.org\/10.1007\/s00521-017-2954-3","relation":{},"ISSN":["0941-0643","1433-3058"],"issn-type":[{"type":"print","value":"0941-0643"},{"type":"electronic","value":"1433-3058"}],"subject":[],"published":{"date-parts":[[2017,3,30]]}}}