{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,10,17]],"date-time":"2025-10-17T13:44:24Z","timestamp":1760708664190,"version":"3.40.4"},"reference-count":29,"publisher":"Springer Science and Business Media LLC","issue":"1","license":[{"start":{"date-parts":[[2014,1,31]],"date-time":"2014-01-31T00:00:00Z","timestamp":1391126400000},"content-version":"tdm","delay-in-days":0,"URL":"http:\/\/www.springer.com\/tdm"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Pattern Anal Applic"],"published-print":{"date-parts":[[2015,2]]},"DOI":"10.1007\/s10044-013-0363-5","type":"journal-article","created":{"date-parts":[[2014,1,30]],"date-time":"2014-01-30T05:04:54Z","timestamp":1391058294000},"page":"173-189","source":"Crossref","is-referenced-by-count":12,"title":["Improvement of virtual metrology performance by removing metrology noises in a training dataset"],"prefix":"10.1007","volume":"18","author":[{"given":"Dongil","family":"Kim","sequence":"first","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Pilsung","family":"Kang","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Seung-kyung","family":"Lee","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Seokho","family":"Kang","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Seungyong","family":"Doh","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Sungzoon","family":"Cho","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"297","published-online":{"date-parts":[[2014,1,31]]},"reference":[{"key":"363_CR1","doi-asserted-by":"crossref","first-page":"12554","DOI":"10.1016\/j.eswa.2009.05.053","volume":"36","author":"P Kang","year":"2009","unstructured":"Kang P, Lee H, Cho S, Kim D, Park J, Park C, Doh S (2009) A virtual metrology system for semiconductor manufacturing. Expert Syst Appl 36:12554\u201312561","journal-title":"Expert Syst Appl"},{"key":"363_CR2","doi-asserted-by":"crossref","first-page":"3","DOI":"10.1016\/0169-7439(95)80036-9","volume":"28","author":"T Kourti","year":"1995","unstructured":"Kourti T, MacGregor JF (1995) Process analysis, monitoring and diagnosis, using multivatiate projection methods. Chemom Intell Lab Syst 28:3\u201321","journal-title":"Chemom Intell Lab Syst"},{"key":"363_CR3","doi-asserted-by":"crossref","first-page":"480","DOI":"10.1002\/cem.800","volume":"17","author":"SJ Qin","year":"2003","unstructured":"Qin SJ (2003) Statistical process monitoring: basics and beyond. J Chemom 17:480\u2013502","journal-title":"J Chemom"},{"key":"363_CR4","doi-asserted-by":"crossref","first-page":"179","DOI":"10.1016\/j.jprocont.2005.06.002","volume":"16","author":"SJ Qin","year":"2006","unstructured":"Qin SJ, Cherry G, Good R, Wang J, Harrison CA (2006) Semiconductor manufacturing process control and monitoring: a fab-wide framework. J Process Control 16:179\u2013191","journal-title":"J Process Control"},{"key":"363_CR5","doi-asserted-by":"crossref","first-page":"1268","DOI":"10.1016\/j.conengprac.2006.11.003","volume":"15","author":"AJ Su","year":"2007","unstructured":"Su AJ, Jeng JC, Huang HP, Yu CC, Hung SY, Chao CK (2007) Control relevant issues in semiconductor manufacturing: overview with some new results. Control Eng Pract 15:1268\u20131279","journal-title":"Control Eng Pract"},{"key":"363_CR6","unstructured":"Cheng J, Cheng FT (2005) Application developmetn to virtual metrology in semiconductor industry. The 32nd annual conference of IEEE Industrial Electronics Society, USA, pp 124\u2013129"},{"key":"363_CR7","unstructured":"Chang YJ, Kang Y, Hsu CL, Chang CT, Chan TY (2006) Virtual metrology technique for semiconductor manufacturing. International joint conference on neural networks, Vancouver, pp 5289\u20135293"},{"key":"363_CR8","unstructured":"Chen P, Wu S, Lin J, Ko F, Lo H, Wang J, Yu W, Liang MS (2005) Virtual metrology: a solution for wafer to wafer advanced process control. IEEE international symposium on semiconductor manufacturing, USA, pp 155\u2013157"},{"key":"363_CR9","unstructured":"Besnard J, Toprac A (2006) Wafer-to-wafer virtual metrology applied to run-to-run control. In: Proceedings of the 3rd ISMI symposium on manufacturing effectiveness, USA"},{"issue":"3","key":"363_CR10","doi-asserted-by":"crossref","first-page":"2508","DOI":"10.1016\/j.eswa.2010.08.040","volume":"38","author":"P Kang","year":"2011","unstructured":"Kang P, Kim D, Lee H, Doh S, Cho S (2011) Virtual metrology for run-to-run control in semiconductor manufacturing. Expert Syst Appl 38(3):2508\u20132522","journal-title":"Expert Syst Appl"},{"issue":"4","key":"363_CR11","doi-asserted-by":"crossref","first-page":"4075","DOI":"10.1016\/j.eswa.2011.09.088","volume":"39","author":"D Kim","year":"2012","unstructured":"Kim D, Kang P, Cho S, Lee H, Doh S (2012) Machine learning-based novelty detection for faulty wafer detection in semiconductor manufacturing. Expert Syst Appl 39(4):4075\u20134083","journal-title":"Expert Syst Appl"},{"issue":"3","key":"363_CR12","doi-asserted-by":"crossref","first-page":"426","DOI":"10.1109\/TSM.2008.2001219","volume":"21","author":"YC Su","year":"2008","unstructured":"Su YC, Lin TH, Cheng FT, Wu WM (2008) Accuracy and real-time considerations for implementing various virtual metrology algorithms. IEEE Trans Semicond Manuf 21(3):426\u2013434","journal-title":"IEEE Trans Semicond Manuf"},{"issue":"1","key":"363_CR13","doi-asserted-by":"crossref","first-page":"204","DOI":"10.1109\/TSM.2008.2011185","volume":"22","author":"TH Lin","year":"2009","unstructured":"Lin TH, Cheng FT, Wu WM, Kao CA, Ye AJ, Chang FC (2009) NN-based key-variable selection method for enhancing virtual metrology accuracy. IEEE Trans Semicond Manuf 22(1):204\u2013211","journal-title":"IEEE Trans Semicond Manuf"},{"key":"363_CR14","volume-title":"Outlier detection: a survey","author":"V Chandola","year":"2007","unstructured":"Chandola V, Banerjee A, Kumar V (2007) Outlier detection: a survey. Technical Report of University of Minnesota, USA"},{"key":"363_CR15","doi-asserted-by":"crossref","DOI":"10.1002\/0471725382","volume-title":"Robust regression and outlier detection","author":"PJ Rousseeuw","year":"1987","unstructured":"Rousseeuw PJ, Leroy AM (1987) Robust regression and outlier detection. Wiley, New York"},{"issue":"4","key":"363_CR16","doi-asserted-by":"crossref","first-page":"419","DOI":"10.1109\/TSM.2009.2031750","volume":"22","author":"D Zeng","year":"2009","unstructured":"Zeng D, Spanos CJ (2009) Virtual metrology modeling for plasma etch operations. IEEE Trans Semicond Manuf 22(4):419\u2013431","journal-title":"IEEE Trans Semicond Manuf"},{"key":"363_CR17","doi-asserted-by":"crossref","unstructured":"He Z, Deng S, Xu X (2002) Outlier detection integrating semantic knowledge. In: Proceedings of the third international conference on advances in web-age information management, Springer, London, pp 126\u2013131","DOI":"10.1007\/3-540-45703-8_12"},{"key":"363_CR18","doi-asserted-by":"crossref","DOI":"10.7551\/mitpress\/3927.001.0001","volume-title":"An introduction to genetic algorithms","author":"M Mitchell","year":"1996","unstructured":"Mitchell M (1996) An introduction to genetic algorithms, MIT Press, Cambridge"},{"issue":"2","key":"363_CR19","doi-asserted-by":"crossref","first-page":"44","DOI":"10.1109\/5254.671091","volume":"13","author":"J Yang","year":"1998","unstructured":"Yang J, Honavar V (1998) Feature Subset Selection Using a Genetic Algorithm. IEEE Intell Syst 13(2):44\u201349","journal-title":"IEEE Intell Syst"},{"key":"363_CR20","unstructured":"Tax DMJ (2001) One-class classification. Ph.D. Dissertation, Delft University of Technology, Netherland"},{"key":"363_CR21","volume-title":"Outliers in statistical data","author":"V Barnett","year":"1994","unstructured":"Barnett V, Lewis T (1994) Outliers in statistical data. Wiley, New York"},{"key":"363_CR22","doi-asserted-by":"crossref","DOI":"10.1093\/oso\/9780198538493.001.0001","volume-title":"Neural networks for pattern recognition","author":"CM Bishop","year":"1995","unstructured":"Bishop CM (1995) Neural networks for pattern recognition. Oxford University Press, New York"},{"key":"363_CR23","doi-asserted-by":"crossref","DOI":"10.1007\/978-1-4757-1904-8","volume-title":"Principal component analysis","author":"IT Jolliffe","year":"1986","unstructured":"Jolliffe IT (1986) Principal component analysis. Springer, New York"},{"key":"363_CR24","volume-title":"The element of statistical learning: data mining, inference, and prediction","author":"T Hastie","year":"2002","unstructured":"Hastie T, Tibshirani R, Friedman J (2002) The element of statistical learning: data mining, inference, and prediction. Springer, New York"},{"key":"363_CR25","doi-asserted-by":"crossref","unstructured":"Kohonen T (1995) Self-organizing maps. Springer series in information science, vol 30. Springer, Berlin","DOI":"10.1007\/978-3-642-97610-0"},{"issue":"11\u201313","key":"363_CR26","first-page":"1191","volume":"20","author":"DMJ Tax","year":"1999","unstructured":"Tax DMJ, Duin RPW (1999) Support vector domain description. Pattern Recognit Lett 20(11\u201313):1191\u20131199","journal-title":"Pattern Recognit Lett"},{"key":"363_CR27","doi-asserted-by":"crossref","unstructured":"Johnson RA, Wichern DW (1998) Applied multivariate statistical analysis. Prentice Hall, Englewood Cliffs, New Jersey","DOI":"10.2307\/2533879"},{"key":"363_CR28","unstructured":"Sch\u00f6lkopf B, Smola AJ (1998) A tutorial on support vector regression. NeuroCOLT2 technical report NC2-TR-1998-030"},{"issue":"10","key":"363_CR29","doi-asserted-by":"crossref","first-page":"8975","DOI":"10.1016\/j.eswa.2012.02.026","volume":"39","author":"D Kim","year":"2012","unstructured":"Kim D, Cho S (2012) Pattern selection for support vector regression-based response modeling. Expert Syst Appl 39(10):8975\u20138985","journal-title":"Expert Syst Appl"}],"container-title":["Pattern Analysis and Applications"],"original-title":[],"language":"en","link":[{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/s10044-013-0363-5.pdf","content-type":"application\/pdf","content-version":"vor","intended-application":"text-mining"},{"URL":"http:\/\/link.springer.com\/article\/10.1007\/s10044-013-0363-5\/fulltext.html","content-type":"text\/html","content-version":"vor","intended-application":"text-mining"},{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/s10044-013-0363-5","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,5,1]],"date-time":"2025-05-01T18:16:40Z","timestamp":1746123400000},"score":1,"resource":{"primary":{"URL":"http:\/\/link.springer.com\/10.1007\/s10044-013-0363-5"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2014,1,31]]},"references-count":29,"journal-issue":{"issue":"1","published-print":{"date-parts":[[2015,2]]}},"alternative-id":["363"],"URL":"https:\/\/doi.org\/10.1007\/s10044-013-0363-5","relation":{},"ISSN":["1433-7541","1433-755X"],"issn-type":[{"type":"print","value":"1433-7541"},{"type":"electronic","value":"1433-755X"}],"subject":[],"published":{"date-parts":[[2014,1,31]]}}}