{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,7,31]],"date-time":"2026-07-31T11:13:03Z","timestamp":1785496383708,"version":"3.56.0"},"reference-count":19,"publisher":"Springer Science and Business Media LLC","issue":"2","license":[{"start":{"date-parts":[[2008,2,1]],"date-time":"2008-02-01T00:00:00Z","timestamp":1201824000000},"content-version":"tdm","delay-in-days":0,"URL":"http:\/\/www.springer.com\/tdm"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Sci. China Ser. F-Inf. Sci."],"published-print":{"date-parts":[[2008,2]]},"DOI":"10.1007\/s11432-008-0006-4","type":"journal-article","created":{"date-parts":[[2008,1,17]],"date-time":"2008-01-17T15:26:57Z","timestamp":1200583617000},"page":"213-224","source":"Crossref","is-referenced-by-count":11,"title":["Application of optical proximity correction technology"],"prefix":"10.1007","volume":"51","author":[{"given":"YiCi","family":"Cai","sequence":"first","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Qiang","family":"Zhou","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"XianLong","family":"Hong","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Rui","family":"Shi","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yang","family":"Wang","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"297","reference":[{"key":"6_CR1","unstructured":"The International Technology Roadmap for Semiconductors (ITRS), http:\/\/public.itrs.net\/ , 2004updat."},{"key":"6_CR2","first-page":"112","volume-title":"Proceeding of the International Symposium on Physical Design","author":"A. B. Kahng","year":"1999","unstructured":"Kahng A B, Pati Y C. Sub-wavelength optical lithography: Challenges and impact on physical design. In: Proceeding of the International Symposium on Physical Design. New York: ACM Press, 1999. 112\u2013119"},{"key":"6_CR3","unstructured":"Cong J. Challenges and opportunities for design innovations in nanometer technologies. SRC Design Sciences Concept Paper. 1997"},{"key":"6_CR4","first-page":"790","volume":"3051","author":"J. F. Chen","year":"1997","unstructured":"Chen J F, Laidig T L, Wampler K E, et al. Practical method for full-chip optical proximity correction. SPIE, 1997, 3051: 790\u2013803","journal-title":"SPIE"},{"key":"6_CR5","first-page":"774","volume":"3051","author":"D. Dolainsky","year":"1997","unstructured":"Dolainsky D, Maurer W. Application of a simple resist model to fast optical proximity correction. SPIE, 1997, 3051: 774\u2013780","journal-title":"SPIE"},{"issue":"2","key":"6_CR6","doi-asserted-by":"crossref","first-page":"175","DOI":"10.1109\/43.828546","volume":"19","author":"P. Berman","year":"2000","unstructured":"Berman P, Kahng A B, Vidhani D, et al. Optimal phase conflict removal for layout of dark field alternating phase shifting masks. IEEE Trans Computer-aided Design of Integrated Circuits and Systems, 2000, 19(2): 175\u2013187","journal-title":"IEEE Trans Computer-aided Design of Integrated Circuits and Systems"},{"issue":"2","key":"6_CR7","doi-asserted-by":"crossref","first-page":"138","DOI":"10.1109\/66.136275","volume":"5","author":"Y. Liu","year":"1992","unstructured":"Liu Y, Zakhor A. Binary and phase shifting mask design for optical lithography. IEEE Trans Semicond Manufact, 1992, 5(2): 138\u2013152","journal-title":"IEEE Trans Semicond Manufact"},{"issue":"2","key":"6_CR8","doi-asserted-by":"crossref","first-page":"170","DOI":"10.1109\/66.492811","volume":"9","author":"Y. Liu","year":"1996","unstructured":"Liu Y, Zakhor A, Zuniga M A. Computer-aided phase shift mask design with reduced complexity. IEEE Trans Semicond Manufact, 1996, 9(2): 170\u2013181","journal-title":"IEEE Trans Semicond Manufact"},{"key":"6_CR9","doi-asserted-by":"crossref","first-page":"6584","DOI":"10.1143\/JJAP.34.6584","volume":"34","author":"A. Moniwa","year":"1995","unstructured":"Moniwa A, Terasawa T, Nakajo K, et al. Heuristic method for phase-conflict minimization in automatic phase-shift mask design. Jpn J Appl Phys, 1995, 34: 6584\u20136589","journal-title":"Jpn J Appl Phys"},{"key":"6_CR10","first-page":"278","volume":"2197","author":"O. W. Otto","year":"1994","unstructured":"Otto O W, Garofalo J G, Low K K. Automated optical proximity correction \u2014 a rules-based approach. SPIE, 1994, 2197: 278\u2013294","journal-title":"SPIE"},{"issue":"7","key":"6_CR11","first-page":"701","volume":"23","author":"R. Shi","year":"2002","unstructured":"Shi R, Cai Y C, Hong X L, et al. Important works about rules in rules-based optical proximity correction. Chin J Semicond, 2002, 23(7): 701\u2013706","journal-title":"Chin J Semicond"},{"key":"6_CR12","doi-asserted-by":"crossref","unstructured":"Shioiri S, Tanabe H. Fast optical proximity correction: Analytical method. SPIE, 2440: 261\u2013268","DOI":"10.1117\/12.209258"},{"key":"6_CR13","first-page":"206","volume-title":"Proceedings of the 4th International Conference on ASIC","author":"C. Q. Yang","year":"2001","unstructured":"Yang C Q, Hong X L, Wu W M, et al. An object-based approach to optical proximity correction. In: Proceedings of the 4th International Conference on ASIC. New York: Wiley-IEEE Press, 2001. 206\u2013209"},{"key":"6_CR14","first-page":"241","volume-title":"Proceedings of the International Symposium on Circuits and Systems","author":"Y. Wang","year":"2004","unstructured":"Wang Y, Cai Y C, Hong X L, et al. Algorithms for yield driven correction of layout. In: Proceedings of the International Symposium on Circuits and Systems. New York: Wiley-IEEE Press, 2004. 241\u2013244"},{"issue":"4","key":"6_CR15","doi-asserted-by":"crossref","first-page":"533","DOI":"10.1360\/04yf0115","volume":"48","author":"X. L. Yan","year":"2005","unstructured":"Yan X L, Shi Z, Chen Y, et al. Full-IC manufacturability check based on dense silicon imaging. Sci China Ser F-Inf Sci, 2005, 48(4): 533\u2013544","journal-title":"Sci China Ser F-Inf Sci"},{"key":"6_CR16","doi-asserted-by":"crossref","first-page":"263","DOI":"10.1098\/rspa.1951.0158","volume":"A208","author":"H. H. Hopkins","year":"1951","unstructured":"Hopkins H H. Concept of partial coherence in optics. Proc Royal Soc London, 1951, A208: 263\u2013277","journal-title":"Proc Royal Soc London"},{"key":"6_CR17","first-page":"83","volume-title":"Asia South Pacific Design Automation Conference","author":"X. L. Yan","year":"2005","unstructured":"Yan X L, Chen Y, Shi Z, et al. A new dissection method for model based frugal OPC. In: Asia South Pacific Design Automation Conference. New York: Wiley-IEEE Press, 2005. 83\u201386"},{"key":"6_CR18","first-page":"73","volume-title":"Design Automation Conference","author":"J. Yang","year":"2006","unstructured":"Yang J, Cohen E, Tabery C. An up-stream design auto-fix flow for manufacturability enhancement. In: Design Automation Conference. New York: Wiley-IEEE Press, 2006. 73\u201376"},{"key":"6_CR19","first-page":"785","volume-title":"Design Automation Conference","author":"P. Yu","year":"2006","unstructured":"Yu P, Shi S X, Pan D Z. Process variation aware OPC with variational lithography modeling. In: Design Automation Conference. New York: Wiley-IEEE Press, 2006. 785\u2013790"}],"container-title":["Science in China Series F: Information Sciences"],"original-title":[],"language":"en","link":[{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/s11432-008-0006-4.pdf","content-type":"application\/pdf","content-version":"vor","intended-application":"text-mining"},{"URL":"http:\/\/link.springer.com\/article\/10.1007\/s11432-008-0006-4\/fulltext.html","content-type":"text\/html","content-version":"vor","intended-application":"text-mining"},{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/s11432-008-0006-4","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,1,25]],"date-time":"2025-01-25T21:04:37Z","timestamp":1737839077000},"score":1,"resource":{"primary":{"URL":"http:\/\/link.springer.com\/10.1007\/s11432-008-0006-4"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2008,2]]},"references-count":19,"journal-issue":{"issue":"2","published-print":{"date-parts":[[2008,2]]}},"alternative-id":["6"],"URL":"https:\/\/doi.org\/10.1007\/s11432-008-0006-4","relation":{},"ISSN":["1009-2757","1862-2836"],"issn-type":[{"value":"1009-2757","type":"print"},{"value":"1862-2836","type":"electronic"}],"subject":[],"published":{"date-parts":[[2008,2]]}}}