{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2022,4,6]],"date-time":"2022-04-06T00:47:48Z","timestamp":1649206068361},"reference-count":20,"publisher":"Springer Science and Business Media LLC","issue":"2","license":[{"start":{"date-parts":[[2007,4,1]],"date-time":"2007-04-01T00:00:00Z","timestamp":1175385600000},"content-version":"tdm","delay-in-days":0,"URL":"http:\/\/www.springer.com\/tdm"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Int J Automat Comput"],"published-print":{"date-parts":[[2007,4]]},"DOI":"10.1007\/s11633-007-0208-z","type":"journal-article","created":{"date-parts":[[2007,7,6]],"date-time":"2007-07-06T12:57:05Z","timestamp":1183726625000},"page":"208-216","source":"Crossref","is-referenced-by-count":3,"title":["A new pre-alignment approach based on Four-Quadrant-Photo-Detector for IC mask"],"prefix":"10.1007","volume":"4","author":[{"given":"Yun","family":"Liu","sequence":"first","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"De","family":"Xu","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Min","family":"Tan","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"297","reference":[{"issue":"5","key":"208_CR1","first-page":"455","volume":"9","author":"G. Liu","year":"2001","unstructured":"G. Liu, Y. C. Tian. Synchrotron Radiation Lithography and MEMS Techniques at NSRL. Optics and Precision Engineering, vol. 9, no. 5, pp. 455\u2013457, 2001.","journal-title":"Optics and Precision Engineering"},{"issue":"6","key":"208_CR2","doi-asserted-by":"crossref","first-page":"2612","DOI":"10.1116\/1.1408957","volume":"19","author":"S. Hector","year":"2001","unstructured":"S. Hector, P. Mangat. Review of Progress in Extreme Ultraviolet Lithography Masks. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, pp. 2612\u20132616, 2001.","journal-title":"Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures"},{"issue":"8","key":"208_CR3","doi-asserted-by":"crossref","first-page":"362","DOI":"10.1115\/1.2899804","volume":"114","author":"J. Ni","year":"1992","unstructured":"J. Ni, P. S. Huang, S. M. Wu. A Multi-degree-of-freedom Measurement System for CMM Geometric Errors. ASME Journal of Engineering for Industry, vol. 114, no. 8, pp. 362\u2013369, 1992.","journal-title":"ASME Journal of Engineering for Industry"},{"key":"208_CR4","doi-asserted-by":"crossref","first-page":"231","DOI":"10.1117\/12.953150","volume":"1088","author":"E. D. Castel","year":"1989","unstructured":"E. D. Castel, N. Shcemma. Effect of Alignment Mask Design and Processing Factors on Overlay Accuracy. Proceedings of SPIE, vol. 1088, pp. 231\u2013237, 1989.","journal-title":"Proceedings of SPIE"},{"key":"208_CR5","doi-asserted-by":"crossref","first-page":"203","DOI":"10.1117\/12.20189","volume":"1264","author":"C. M. Yuan","year":"1990","unstructured":"C. M. Yuan, A. J. Strojwas. Modeling of Optical Alignment and Metrology Schemes Used in Integrated Circuit Manufacturing. Proceedings of SPIE, vol. 1264, pp. 203\u2013218, 1990.","journal-title":"Proceedings of SPIE"},{"key":"208_CR6","doi-asserted-by":"crossref","first-page":"478","DOI":"10.1117\/12.475683","volume":"4692","author":"D. C. Cole","year":"2002","unstructured":"D. C. Cole, S. Y. Beak, X. Zhang. Evolution and Integration of Optimal IC Design: Performance and Manufacturing Issue. Proceedings of SPIE on design, Process Integration, and Characterization for Microelectronics, vol. 4692, pp. 478\u2013488, 2002.","journal-title":"Proceedings of SPIE on design, Process Integration, and Characterization for Microelectronics"},{"issue":"1","key":"208_CR7","doi-asserted-by":"crossref","first-page":"43","DOI":"10.1023\/A:1023982907874","volume":"37","author":"G. Yang","year":"2003","unstructured":"G. Yang, J. A. Gaines, B. J. Nelson. A Supervisory Wafer-level 3D Microassembly System for Hybrid MEMS Fabrication. Journal of Intelligent and Robotic Systems, vol. 37, no. 1, pp. 43\u201368, 2003.","journal-title":"Journal of Intelligent and Robotic Systems"},{"issue":"4","key":"208_CR8","doi-asserted-by":"crossref","first-page":"723","DOI":"10.1109\/T-ED.1979.19483","volume":"26","author":"G. Bouwhuis","year":"1979","unstructured":"G. Bouwhuis, S. Wittekoek. Automatic Alignment System for Optical Projection Printing. IEEE Transactions on Electron Devices, vol. 26, no. 4, pp. 723\u2013728, 1979.","journal-title":"IEEE Transactions on Electron Devices"},{"issue":"2","key":"208_CR9","doi-asserted-by":"crossref","first-page":"99","DOI":"10.1109\/66.79722","volume":"4","author":"C. M. Yuan","year":"1991","unstructured":"C. M. Yuan, A. J. Strojwas. Modeling Optical Equipment for Wafer Alignment and Line-width Measurement. IEEE Transactions on Semiconductor Manufacturing, vol. 4, no. 2, pp. 99\u2013110, 1991.","journal-title":"IEEE Transactions on Semiconductor Manufacturing"},{"key":"208_CR10","doi-asserted-by":"crossref","first-page":"186","DOI":"10.1109\/SENSOR.1995.717131","volume-title":"Proceedings of the 8th International Conference on Solid-State Sensors and Actuators","author":"G. Ensell","year":"1995","unstructured":"G. Ensell. Alignment of Mask Patterns to Crystal Orientation. In Proceedings of the 8th International Conference on Solid-State Sensors and Actuators, Stockholm, Sweden, pp. 186\u2013189, 1995."},{"issue":"7","key":"208_CR11","doi-asserted-by":"crossref","first-page":"496","DOI":"10.1109\/T-ED.1975.18168","volume":"22","author":"J. Melnqailis","year":"1975","unstructured":"J. Melnqailis, H. I. Smith, N. Efrernow. Instrumentation for Conformable Photomask Lithography. IEEE Transactions on Electron Devices, vol. 22, no. 7, pp. 496\u2013498, 1975.","journal-title":"IEEE Transactions on Electron Devices"},{"key":"208_CR12","doi-asserted-by":"crossref","first-page":"361","DOI":"10.1109\/IEMT.1992.639921","volume-title":"Proceedings of 13th IEEE\/CHMT International Electronics Manufacturing Technology Symposium","author":"P. S. Sung","year":"1992","unstructured":"P. S. Sung, F. J. Wu. Alignment Techniques for High Precision Pick and Place in Electronic Packaging. In Proceedings of 13th IEEE\/CHMT International Electronics Manufacturing Technology Symposium, Bulimore, MD, USA, pp. 361\u2013365, 1992."},{"key":"208_CR13","unstructured":"Hewlett Packard Co. Using Material Temperature Compensation to Improve Laser Interferometer Measurement Accuracy. Application Note 325-330, Hewlett Packard Co., 1993."},{"issue":"8","key":"208_CR14","first-page":"273","volume":"28","author":"S. Shimizu","year":"1994","unstructured":"S. Shimizu, H. S. Lee, N. Imai. Simultaneous Measuring Method of the Table Motion Error in 6 Degree of Freedom. International Journal of Japan Society for Precision Engineering, vol. 28, no. 8, pp. 273\u2013274, 1994.","journal-title":"International Journal of Japan Society for Precision Engineering"},{"issue":"4","key":"208_CR15","first-page":"157","volume":"30","author":"C. Yin","year":"1991","unstructured":"C. Yin, W. Z. Chen. Two-dimensional Automatic Straightness Measurement System Based on Optical Activity. Optical Engineering, vol. 30, no. 4, pp. 157\u2013159, 1991.","journal-title":"Optical Engineering"},{"key":"208_CR16","first-page":"14","volume-title":"Proceedings of International Measurement Confederation Technical Committee","author":"S. G. Ye","year":"1986","unstructured":"S. G. Ye, Y. Z. Fan. New Method to Improve the Alignment Precision. In Proceedings of International Measurement Confederation Technical Committee, Budapest, Hungary, pp. 14\u201316, 1986."},{"issue":"9\u201310","key":"208_CR17","doi-asserted-by":"crossref","first-page":"1121","DOI":"10.1007\/s00170-004-2079-6","volume":"26","author":"C. Y. Nian","year":"2005","unstructured":"C. Y. Nian, Y. S. Tarng. An Auto-alignment Vision System with Three-axis Motion Control System. The International Journal of Advanced Manufacturing Technology, vol. 26, no. 9\u201310, pp. 1121\u20131131, 2005.","journal-title":"The International Journal of Advanced Manufacturing Technology"},{"issue":"4","key":"208_CR18","doi-asserted-by":"crossref","first-page":"2073","DOI":"10.1016\/S0890-6955(00)00040-7","volume":"5","author":"K. C. Fan","year":"2000","unstructured":"K. C. Fan and Y. Zhao. A Laser Straightness Measurement System Using Optical Fiber and Modulation Techniques. International Journal of Tools and Machine, vol. 5, no. 4, pp. 2073\u20132081, 2000.","journal-title":"International Journal of Tools and Machine"},{"key":"208_CR19","first-page":"169","volume-title":"Applied Numerical Analysis","author":"C. F. Gerald","year":"1999","unstructured":"C. F. Gerald, P. O. Whealtley. Applied Numerical Analysis, Addison Wesley, USA, pp. 169\u2013183, 1999."},{"key":"208_CR20","first-page":"69","volume-title":"Theory and Applications of Numerical Analysis","author":"G. M. Phillips","year":"1973","unstructured":"G. M. Phillips, P. J. Taylor. Theory and Applications of Numerical Analysis, Academic Press, London, pp. 69\u201383, 1973."}],"container-title":["International Journal of Automation and Computing"],"original-title":[],"language":"en","link":[{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/s11633-007-0208-z.pdf","content-type":"application\/pdf","content-version":"vor","intended-application":"text-mining"},{"URL":"http:\/\/link.springer.com\/article\/10.1007\/s11633-007-0208-z\/fulltext.html","content-type":"text\/html","content-version":"vor","intended-application":"text-mining"},{"URL":"http:\/\/link.springer.com\/content\/pdf\/10.1007\/s11633-007-0208-z","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2020,4,24]],"date-time":"2020-04-24T03:08:25Z","timestamp":1587697705000},"score":1,"resource":{"primary":{"URL":"http:\/\/link.springer.com\/10.1007\/s11633-007-0208-z"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2007,4]]},"references-count":20,"journal-issue":{"issue":"2","published-print":{"date-parts":[[2007,4]]}},"alternative-id":["208"],"URL":"https:\/\/doi.org\/10.1007\/s11633-007-0208-z","relation":{},"ISSN":["1476-8186","1751-8520"],"issn-type":[{"value":"1476-8186","type":"print"},{"value":"1751-8520","type":"electronic"}],"subject":[],"published":{"date-parts":[[2007,4]]}}}