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However, this is still a great challenge, and it is unclear how to build N-graphene with desired nitrogen configurations. There is a lack of experimental evidence to explain the influence and mechanism of structural defects for nitrogen incorporation into graphene compared to the derived DFT theories. Herein, this gap is bridged through a systematic study of different nitrogen-containing gaseous plasma post-treatments on graphene nanowalls (CNWs) to produce N-CNWs with incorporated and substituted nitrogen. The structural and morphological analyses describe a remarkable difference in the plasma\u2013surface interaction, nitrogen concentration and nitrogen incorporation mechanism in CNWs by using different nitrogen-containing plasma. Electrical conductivity measurements revealed that the conductivity of the N-graphene is strongly influenced by the position and concentration of C\u2013N bonding configurations. These findings open up a new pathway for the synthesis of N-graphene using plasma post-treatment to control the concentration and configuration of incorporated nitrogen for application-specific properties.<\/jats:p>","DOI":"10.1007\/s40820-020-0395-5","type":"journal-article","created":{"date-parts":[[2020,2,17]],"date-time":"2020-02-17T04:34:41Z","timestamp":1581914081000},"update-policy":"https:\/\/doi.org\/10.1007\/springer_crossmark_policy","source":"Crossref","is-referenced-by-count":97,"title":["N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence"],"prefix":"10.1007","volume":"12","author":[{"given":"Neelakandan","family":"M. 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