{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,10,26]],"date-time":"2025-10-26T13:50:31Z","timestamp":1761486631355},"reference-count":32,"publisher":"Elsevier BV","issue":"5","license":[{"start":{"date-parts":[[2000,5,1]],"date-time":"2000-05-01T00:00:00Z","timestamp":957139200000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/www.elsevier.com\/tdm\/userlicense\/1.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Automatica"],"published-print":{"date-parts":[[2000,5]]},"DOI":"10.1016\/s0005-1098(99)00197-1","type":"journal-article","created":{"date-parts":[[2002,7,26]],"date-time":"2002-07-26T01:51:06Z","timestamp":1027648266000},"page":"705-715","source":"Crossref","is-referenced-by-count":24,"title":["Selection of measurement locations for the control of rapid thermal processor"],"prefix":"10.1016","volume":"36","author":[{"given":"Chi-Jay","family":"Huang","sequence":"first","affiliation":[]},{"given":"Cheng-Ching","family":"Yu","sequence":"additional","affiliation":[]},{"given":"Shih-Haur","family":"Shen","sequence":"additional","affiliation":[]}],"member":"78","reference":[{"key":"10.1016\/S0005-1098(99)00197-1_BIB1","doi-asserted-by":"crossref","first-page":"180","DOI":"10.1109\/66.149811","article-title":"Rapid thermal processing uniformity using multivariable control of a circularly symmetric 3 zone lamp","volume":"5","author":"Apte","year":"1992","journal-title":"IEEE Transactions on Semiconductor Manufacturing"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB2","doi-asserted-by":"crossref","first-page":"1","DOI":"10.1016\/0098-1354(94)E0038-O","article-title":"Modeling and control of microelectronics materials processing","volume":"19","author":"Badgwell","year":"1995","journal-title":"Computers in Chemical Engineering"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB3","doi-asserted-by":"crossref","first-page":"2377","DOI":"10.1080\/00207729108910802","article-title":"Long-range predictive control of a rapid thermal processor","volume":"22","author":"Bordeneuve","year":"1991","journal-title":"Internatioanl Journal of System Science"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB4","doi-asserted-by":"crossref","first-page":"1309","DOI":"10.1016\/0009-2509(90)87123-A","article-title":"The relative gain for non-square multivariable system","volume":"45","author":"Chang","year":"1990","journal-title":"Chemical Engineering Science"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB5","doi-asserted-by":"crossref","first-page":"233","DOI":"10.1109\/66.238171","article-title":"Model identification in rapid thermal processing system","volume":"6","author":"Cho","year":"1993","journal-title":"IEEE Transactions on Semiconductor Manufacturing"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB6","doi-asserted-by":"crossref","first-page":"34","DOI":"10.1109\/66.286831","article-title":"A contribution to optimal lamp design in rapid thermal processing","volume":"7","author":"Cho","year":"1994","journal-title":"IEEE Transactions on Semiconductor Manufacturing"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB7","unstructured":"Crowley, J.L., DeBolski, T.J., Kermani, A., & Lassing, S.E. (1988). US Patent, 4755654."},{"key":"10.1016\/S0005-1098(99)00197-1_BIB8","doi-asserted-by":"crossref","first-page":"201","DOI":"10.1109\/16.108231","article-title":"Temperature control in a rapid thermal processor","volume":"39","author":"Dilhac","year":"1992","journal-title":"IEEE Transactions on Electronic Devices"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB9","doi-asserted-by":"crossref","first-page":"432","DOI":"10.1109\/66.475185","article-title":"Thermal modeling of a wafer in a rapid thermal processor","volume":"8","author":"Dilhac","year":"1995","journal-title":"IEEE Transactions on Semiconductor Manufacturing"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB10","doi-asserted-by":"crossref","first-page":"45","DOI":"10.1002\/acs.4480070105","article-title":"Partial state model reference adaptive control of a rapid thermal processor","volume":"7","author":"Djebara","year":"1993","journal-title":"International Journal of Adaptive Control Signal Process"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB11","unstructured":"Downs, J.J., & Moore, C. (1981). Steady state gain analysis for azeotropic distillation. Proceeding of the JACC, Charlottesville, VA."},{"key":"10.1016\/S0005-1098(99)00197-1_BIB12","doi-asserted-by":"crossref","first-page":"339","DOI":"10.1016\/S0959-1524(98)00015-8","article-title":"Nonlinear inferential control for process applications","volume":"8","author":"Doyle III","year":"1998","journal-title":"Journal of Process Control"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB13","unstructured":"Edgar, T.F., & Breedijk, T. (1994). Overview of process control issues in rapid thermal processing. Proceedings of RTP\u201994, Monterrey, CA (p. 267)."},{"key":"10.1016\/S0005-1098(99)00197-1_BIB14","doi-asserted-by":"crossref","first-page":"3","DOI":"10.1016\/0959-1524(92)80012-M","article-title":"Adaptive control of a rapid thermal processor using two long-range predictive methods","volume":"2","author":"Guibe","year":"1992","journal-title":"Journal of Process Control"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB15","doi-asserted-by":"crossref","first-page":"9","DOI":"10.1109\/66.75858","article-title":"A model for rapid thermal processing: Achieving uniformity through lamp control","volume":"4","author":"Gyurcsik","year":"1991","journal-title":"IEEE Transactions on Semiconductor Manufacturing"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB16","doi-asserted-by":"crossref","first-page":"485","DOI":"10.1002\/aic.690240313","article-title":"Inferential control of process: Part I. Steady-state analysis and design","volume":"24","author":"Joseph","year":"1978","journal-title":"A.I.Ch.E. Journal"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB17","unstructured":"Lawson, C.L., & Hanson, R. J. (1974). Solving least squares problems. Englewood Cliff, NJ: Prentice-Hall."},{"key":"10.1016\/S0005-1098(99)00197-1_BIB18","doi-asserted-by":"crossref","first-page":"105","DOI":"10.1109\/66.4383","article-title":"Thermal and stress analysis of semiconductor wafer in a rapid thermal processing oven","volume":"1","author":"Lord","year":"1988","journal-title":"IEEE Transactions on Semiconductor Manufacturing"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB19","doi-asserted-by":"crossref","unstructured":"Luyben, W. L. (1992). Practical distillation control. New York: Van Nostrand Reinhold.","DOI":"10.1007\/978-1-4757-0277-4"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB20","doi-asserted-by":"crossref","first-page":"1641","DOI":"10.1002\/aic.690391008","article-title":"Output estimation using multiple secondary measurements: High-purity distillation","volume":"39","author":"Mejdell","year":"1993","journal-title":"A.I.Ch.E. Journal"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB21","doi-asserted-by":"crossref","first-page":"2035","DOI":"10.1149\/1.1836945","article-title":"A Systematic approach to simulating rapid thermal processing systems","volume":"143","author":"Merchant","year":"1996","journal-title":"Journal of the Electrochemical Society"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB22","doi-asserted-by":"crossref","first-page":"33","DOI":"10.1080\/00207729508929022","article-title":"A pole placement adaptive control of a rapid thermal processor","volume":"26","author":"Morales","year":"1995","journal-title":"International Journal of System Science"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB23","unstructured":"Morari, M., & Zafiriou, E. (1989). Robust Process Control. Englewood Cliff, NJ: Prentice-Hall."},{"key":"10.1016\/S0005-1098(99)00197-1_BIB24","doi-asserted-by":"crossref","first-page":"205","DOI":"10.1109\/16.108233","article-title":"Optimization of wafer temperature uniformity in rapid thermal processing system","volume":"39","author":"Norman","year":"1992","journal-title":"IEEE Transactions on Electronic Devices"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB25","unstructured":"Roozeboom, F. (1992). Manufacturing equipment issues in rapid thermal processing. New York: Academic Press."},{"key":"10.1016\/S0005-1098(99)00197-1_BIB26","first-page":"12","article-title":"Rapid thermal processing system: A review with emphasis on temperature control","volume":"8","author":"Roozeboom","year":"1990","journal-title":"Journal of Vaccum Sicence Technology B"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB27","doi-asserted-by":"crossref","first-page":"317","DOI":"10.1007\/BF00324195","article-title":"Low-order modeling and dynamic characterization of rapid thermal processing","volume":"54","author":"Schaper","year":"1992","journal-title":"Applied Physics A"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB28","doi-asserted-by":"crossref","first-page":"3200","DOI":"10.1149\/1.2059302","article-title":"Modeling, identification, and control of rapid thermal processing systems","volume":"141","author":"Schaper","year":"1994","journal-title":"Journal of Electrochemical Society"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB29","doi-asserted-by":"crossref","first-page":"3085","DOI":"10.1016\/0009-2509(92)87008-E","article-title":"Indirect feedforward control: Multivariable systems","volume":"47","author":"Shen","year":"1992","journal-title":"Chemical Engineering Science"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB30","doi-asserted-by":"crossref","first-page":"75","DOI":"10.1109\/16.108214","article-title":"Temperature uniformity in RTP furnaces","volume":"39","author":"Sorrell","year":"1992","journal-title":"IEEE Transactions on Electronic Devices"},{"key":"10.1016\/S0005-1098(99)00197-1_BIB31","unstructured":"Skogestad, S., & Postlethwaite, I. (1996). Multivariable feedback control: Analysis and design. Chichester: Wiley."},{"key":"10.1016\/S0005-1098(99)00197-1_BIB32","doi-asserted-by":"crossref","first-page":"497","DOI":"10.1016\/S0959-1524(98)00017-1","article-title":"On the use of observability measures for sensor locations in tubular reactor","volume":"8","author":"Waldraff","year":"1998","journal-title":"Journal of Process Control"}],"container-title":["Automatica"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0005109899001971?httpAccept=text\/xml","content-type":"text\/xml","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0005109899001971?httpAccept=text\/plain","content-type":"text\/plain","content-version":"vor","intended-application":"text-mining"}],"deposited":{"date-parts":[[2020,2,5]],"date-time":"2020-02-05T00:18:37Z","timestamp":1580861917000},"score":1,"resource":{"primary":{"URL":"https:\/\/linkinghub.elsevier.com\/retrieve\/pii\/S0005109899001971"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2000,5]]},"references-count":32,"journal-issue":{"issue":"5","published-print":{"date-parts":[[2000,5]]}},"alternative-id":["S0005109899001971"],"URL":"https:\/\/doi.org\/10.1016\/s0005-1098(99)00197-1","relation":{},"ISSN":["0005-1098"],"issn-type":[{"value":"0005-1098","type":"print"}],"subject":[],"published":{"date-parts":[[2000,5]]}}}