{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,10,30]],"date-time":"2025-10-30T06:45:08Z","timestamp":1761806708256},"reference-count":43,"publisher":"Elsevier BV","issue":"5","license":[{"start":{"date-parts":[[2002,4,1]],"date-time":"2002-04-01T00:00:00Z","timestamp":1017619200000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/www.elsevier.com\/tdm\/userlicense\/1.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Future Generation Computer Systems"],"published-print":{"date-parts":[[2002,4]]},"DOI":"10.1016\/s0167-739x(01)00061-9","type":"journal-article","created":{"date-parts":[[2002,7,25]],"date-time":"2002-07-25T07:38:44Z","timestamp":1027582724000},"page":"639-657","source":"Crossref","is-referenced-by-count":8,"title":["A cellular automaton methodology for the simulation of integrated circuit fabrication processes"],"prefix":"10.1016","volume":"18","author":[{"given":"G.Ch.","family":"Sirakoulis","sequence":"first","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"I.","family":"Karafyllidis","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"A.","family":"Thanailakis","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"78","reference":[{"key":"10.1016\/S0167-739X(01)00061-9_BIB1","unstructured":"J. von Neumann, Theory of Self-reproducing Automata, University of Illinois, Urbana, IL, 1966."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB2","doi-asserted-by":"crossref","first-page":"601","DOI":"10.1103\/RevModPhys.55.601","article-title":"Statistical mechanics of cellular automata","volume":"55","author":"Wolfram","year":"1983","journal-title":"Rev. Mod. Phys."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB3","doi-asserted-by":"crossref","first-page":"96","DOI":"10.1016\/0167-2789(84)90253-7","article-title":"Simulating physics with cellular automata","volume":"10","author":"Vichniac","year":"1984","journal-title":"Physica D"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB4","doi-asserted-by":"crossref","first-page":"117","DOI":"10.1016\/0167-2789(84)90254-9","article-title":"Cellular automata as an alternative to (rather than an approximation of) differential equations in modeling physics","volume":"10","author":"Toffoli","year":"1984","journal-title":"Physica D"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB5","doi-asserted-by":"crossref","first-page":"467","DOI":"10.1007\/BF02650179","article-title":"Simulating physics with computers","volume":"21","author":"Feynman","year":"1982","journal-title":"Int. J. Theoret. Phys."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB6","doi-asserted-by":"crossref","first-page":"87","DOI":"10.1016\/S0304-3800(96)01942-4","article-title":"A model for predicting forest fire spreading using cellular automata","volume":"99","author":"Karafyllidis","year":"1997","journal-title":"Ecol. Model."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB7","doi-asserted-by":"crossref","first-page":"259","DOI":"10.1016\/S0167-739X(99)00051-5","article-title":"An empirical method for modelling and simulating some complex macroscopic phenomena by cellular automata","volume":"16","author":"Di Gregorio","year":"1999","journal-title":"Future Generation Comput. Syst."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB8","doi-asserted-by":"crossref","first-page":"676","DOI":"10.1016\/S0378-4371(96)00310-X","article-title":"An improved cellular automaton model for traffic flow simulation","volume":"234","author":"Emmerich","year":"1997","journal-title":"Physica A"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB9","doi-asserted-by":"crossref","first-page":"535","DOI":"10.1088\/0965-0393\/4\/6\/001","article-title":"Simulation of electrical tree growth in solid dielectrics containing voids of arbitrary shape","volume":"4","author":"Danikas","year":"1996","journal-title":"Model. Simul. Mater. Sci. Eng."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB10","doi-asserted-by":"crossref","first-page":"259","DOI":"10.1016\/S0167-739X(99)00052-7","article-title":"Cellular automata models of biochemical phenomena","volume":"16","author":"Kier","year":"1999","journal-title":"Future Generation Comput. Syst."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB11","doi-asserted-by":"crossref","first-page":"689","DOI":"10.1016\/0031-3203(95)00109-3","article-title":"A cellular automaton for the determination of the mean velocity of moving objects and its VLSI implementation","volume":"29","author":"Karafyllidis","year":"1996","journal-title":"Pattern Recognition"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB12","unstructured":"P.P. Chaudhuri, D.R. Chaudhuri, S. Nandi, S. Chattopadhyay, Additive Cellular Automata: Theory and Applications, IEEE Press, New York, 1997."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB13","doi-asserted-by":"crossref","first-page":"1003","DOI":"10.1109\/12.537123","article-title":"CAA decoder for cellular automata based error correcting code","volume":"45","author":"Sasidhar","year":"1996","journal-title":"IEEE Trans. Comput."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB14","doi-asserted-by":"crossref","first-page":"259","DOI":"10.1016\/S0167-739X(99)00053-9","article-title":"Generating high-quality random numbers in parallel by cellular automata","volume":"16","author":"Tomassini","year":"1999","journal-title":"Future Generation Comput. Syst."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB15","doi-asserted-by":"crossref","first-page":"1818","DOI":"10.1063\/1.356375","article-title":"Logical devices implemented using quantum cellular automata","volume":"75","author":"Tougaw","year":"1994","journal-title":"J. Appl. Phys."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB16","doi-asserted-by":"crossref","first-page":"289","DOI":"10.1126\/science.284.5412.289","article-title":"Digital logic gate using quantum-dot cellular automata","volume":"284","author":"Amlani","year":"1999","journal-title":"Science"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB17","doi-asserted-by":"crossref","first-page":"2621","DOI":"10.1143\/JJAP.36.2621","article-title":"Cellular-automata circuits using single-electron tunnelling junctions","volume":"36","author":"Wu","year":"1997","journal-title":"Jpn. J. Appl. Phys."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB18","doi-asserted-by":"crossref","first-page":"259","DOI":"10.1016\/S0167-739X(99)00048-5","article-title":"P-CAM: a framework for parallel complex systems simulations","volume":"16","author":"Schoneveld","year":"1999","journal-title":"Future Generation Comput. Syst."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB19","doi-asserted-by":"crossref","first-page":"195","DOI":"10.1016\/0167-2789(84)90261-6","article-title":"CAM: a high-performance cellular automaton machine","volume":"10","author":"Toffoli","year":"1984","journal-title":"Physica D"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB20","doi-asserted-by":"crossref","unstructured":"B. Chopard, M. Droz, Cellular Automata Modeling of Physical Systems, Cambridge University Press, Cambridge, 1998.","DOI":"10.1017\/CBO9780511549755"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB21","doi-asserted-by":"crossref","first-page":"347","DOI":"10.1016\/S0304-3975(98)00330-2","article-title":"Discrete parabolas and circles on 2D cellular automata","volume":"218","author":"Delorme","year":"1999","journal-title":"Theoret. Comput. Sci."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB22","doi-asserted-by":"crossref","first-page":"629","DOI":"10.1088\/0965-0393\/3\/5\/004","article-title":"Simulation of the two-dimensional photoresist etching process in integrated circuit fabrication using cellular automata","volume":"3","author":"Karafyllidis","year":"1995","journal-title":"Model. Simul. Mater. Sci. Eng."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB23","doi-asserted-by":"crossref","first-page":"456","DOI":"10.1109\/T-ED.1975.18161","article-title":"Modeling projection printing of positive photoresists","volume":"ED-22","author":"Dill","year":"1975","journal-title":"IEEE Trans. Electron Devices"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB24","doi-asserted-by":"crossref","first-page":"219","DOI":"10.1109\/43.259945","article-title":"Models and algorithms for three-dimensional topography simulation with SAMPLE-3D","volume":"13","author":"Scheckler","year":"1994","journal-title":"IEEE Trans. Comput. Aided Des. Integrated Circuits Syst."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB25","doi-asserted-by":"crossref","first-page":"214","DOI":"10.1088\/0268-1242\/11\/2\/012","article-title":"Simulation of the image reversal submicron process in integrated circuit fabrication","volume":"11","author":"Karafyllidis","year":"1996","journal-title":"Semiconductor Sci. Technol."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB26","doi-asserted-by":"crossref","first-page":"155","DOI":"10.1016\/S0167-9317(96)00077-9","article-title":"Simulation of the negative chemical amplification deep-ultraviolet process in integrated circuit fabrication","volume":"34","author":"Karafyllidis","year":"1997","journal-title":"Microelectron. Eng."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB27","doi-asserted-by":"crossref","first-page":"2616","DOI":"10.1116\/1.589695","article-title":"Developer temperature effect on negative deep ultraviolet resists: characterization, modeling, and simulation","volume":"15","author":"Hagouel","year":"1997","journal-title":"J. Vac. Sci. Technol. B"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB28","doi-asserted-by":"crossref","first-page":"351","DOI":"10.1016\/S0167-9317(98)00081-1","article-title":"Dependence of developed negative resist profiles on exposure energy dose: experiment, modeling, and simulation","volume":"41\/42","author":"Hagouel","year":"1998","journal-title":"Microelectron. Eng."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB29","doi-asserted-by":"crossref","first-page":"71","DOI":"10.1016\/S0167-9317(98)00283-4","article-title":"Negative resist profiles of close-spaced parallel and isolated lines: experiment, modeling and simulation","volume":"45","author":"Karafyllidis","year":"1999","journal-title":"Microelectron. Eng."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB30","doi-asserted-by":"crossref","first-page":"2972","DOI":"10.1116\/1.588586","article-title":"Negative resist corner rounding, envelope volume modeling","volume":"14","author":"Hagouel","year":"1996","journal-title":"J. Vac. Sci. Technol. B"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB31","doi-asserted-by":"crossref","first-page":"603","DOI":"10.1088\/0268-1242\/13\/6\/011","article-title":"Negative resist profiles in 248 nm photolithography: experiment, modelling and simulation","volume":"13","author":"Karafyllidis","year":"1998","journal-title":"Semiconductor Sci. Technol."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB32","unstructured":"L. Thompson, C. Willson, M. Bowden, Introduction to Microlithography, American Chemical Society, Washington, DC, 1994."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB33","doi-asserted-by":"crossref","first-page":"4137","DOI":"10.1143\/JJAP.31.4137","article-title":"Dependence of defects in optical lithography","volume":"31","author":"Ham","year":"1992","journal-title":"J. Appl. Phys."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB34","doi-asserted-by":"crossref","first-page":"421","DOI":"10.1088\/0957-4484\/10\/4\/311","article-title":"Study of lithography profiles developed on non-planar Si surfaces","volume":"10","author":"Sirakoulis","year":"1999","journal-title":"Nanotechnology"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB35","unstructured":"S.M. Sze (Ed.), VLSI Technology, McGraw-Hill, Singapore, 1988."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB36","doi-asserted-by":"crossref","unstructured":"S.C. Sun, H.Y. Chang, Oxidation simulation and growth kinetics of thin SiO2 in pure N2O, in: Simulation of Semiconductor Devices and Processes, Springer, Berlin, 1993, pp. 169\u2013172.","DOI":"10.1007\/978-3-7091-6657-4_41"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB37","doi-asserted-by":"crossref","first-page":"1223","DOI":"10.1109\/43.466338","article-title":"Grid adoption near moving boundaries in two dimensions for IC process simulation","volume":"14","author":"Law","year":"1995","journal-title":"IEEE Trans. Comput. Aided Des."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB38","doi-asserted-by":"crossref","first-page":"631","DOI":"10.1088\/0965-0393\/7\/4\/311","article-title":"A new simulator for the oxidation process in integrated fabrication based on cellular automata","volume":"7","author":"Sirakoulis","year":"1999","journal-title":"Model. Simul. Mater. Sci. Eng."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB39","doi-asserted-by":"crossref","first-page":"35","DOI":"10.1109\/66.484281","article-title":"Heterogeneous process simulation tool integration","volume":"9","author":"Sahul","year":"1996","journal-title":"IEEE Trans. Semiconductor Manuf."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB40","doi-asserted-by":"crossref","first-page":"2982","DOI":"10.1149\/1.2096387","article-title":"Deposition profile simulation using the direct simulation Monte Carlo method","volume":"136","author":"Ikegawa","year":"1989","journal-title":"J. Electrochem. Soc."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB41","doi-asserted-by":"crossref","first-page":"386","DOI":"10.1109\/43.602475","article-title":"A high-speed 2D topography simulator based on a pixel model","volume":"16","author":"Tazawa","year":"1997","journal-title":"IEEE Trans. Comput. Aided Des. Integrated Circuits Syst."},{"key":"10.1016\/S0167-739X(01)00061-9_BIB42","doi-asserted-by":"crossref","first-page":"1375","DOI":"10.1109\/16.622591","article-title":"Robust, stable and accurate boundary movement for physical etching and deposition simulation","volume":"44","author":"Hsiau","year":"1997","journal-title":"IEEE Trans. Electron Device"},{"key":"10.1016\/S0167-739X(01)00061-9_BIB43","doi-asserted-by":"crossref","first-page":"199","DOI":"10.1088\/0965-0393\/6\/3\/001","article-title":"Simulation of deposition-topography granular distortion for TCAD","volume":"6","author":"Karafyllidis","year":"1998","journal-title":"Model. Simul. Mater. Sci. Eng."}],"container-title":["Future Generation Computer Systems"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0167739X01000619?httpAccept=text\/xml","content-type":"text\/xml","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0167739X01000619?httpAccept=text\/plain","content-type":"text\/plain","content-version":"vor","intended-application":"text-mining"}],"deposited":{"date-parts":[[2019,5,1]],"date-time":"2019-05-01T11:21:34Z","timestamp":1556709694000},"score":1,"resource":{"primary":{"URL":"https:\/\/linkinghub.elsevier.com\/retrieve\/pii\/S0167739X01000619"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2002,4]]},"references-count":43,"journal-issue":{"issue":"5","published-print":{"date-parts":[[2002,4]]}},"alternative-id":["S0167739X01000619"],"URL":"https:\/\/doi.org\/10.1016\/s0167-739x(01)00061-9","relation":{},"ISSN":["0167-739X"],"issn-type":[{"value":"0167-739X","type":"print"}],"subject":[],"published":{"date-parts":[[2002,4]]}}}