{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,7,16]],"date-time":"2026-07-16T16:40:17Z","timestamp":1784220017072,"version":"3.55.0"},"reference-count":18,"publisher":"Elsevier BV","license":[{"start":{"date-parts":[[2015,8,1]],"date-time":"2015-08-01T00:00:00Z","timestamp":1438387200000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/www.elsevier.com\/tdm\/userlicense\/1.0\/"}],"funder":[{"name":"Government funds"},{"name":"Degree & Research Center Program of the Korea Research Council of Fundamental Science and Technology"}],"content-domain":{"domain":["elsevier.com","sciencedirect.com"],"crossmark-restriction":true},"short-container-title":["Journal of Hazardous Materials"],"published-print":{"date-parts":[[2015,8]]},"DOI":"10.1016\/j.jhazmat.2015.03.016","type":"journal-article","created":{"date-parts":[[2015,4,1]],"date-time":"2015-04-01T18:35:27Z","timestamp":1427913327000},"page":"41-46","update-policy":"https:\/\/doi.org\/10.1016\/elsevier_cm_policy","source":"Crossref","is-referenced-by-count":42,"special_numbering":"C","title":["Abatement of fluorinated compounds using a 2.45GHz microwave plasma torch with a reverse vortex plasma reactor"],"prefix":"10.1016","volume":"294","author":[{"given":"J.H.","family":"Kim","sequence":"first","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"C.H.","family":"Cho","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"D.H.","family":"Shin","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Y.C.","family":"Hong","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Y.W.","family":"Shin","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"78","reference":[{"key":"10.1016\/j.jhazmat.2015.03.016_bib0005","doi-asserted-by":"crossref","first-page":"106","DOI":"10.1016\/j.ijggc.2013.04.003","volume":"17","author":"Cheng","year":"2013","journal-title":"Int. J. Greenhouse Gas Control"},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0010","doi-asserted-by":"crossref","first-page":"4101","DOI":"10.1021\/ie051227b","volume":"45","author":"Chang","year":"2006","journal-title":"Ind. Eng. Chem. Res."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0015","doi-asserted-by":"crossref","first-page":"109","DOI":"10.1016\/j.cattod.2003.11.016","volume":"89","author":"Chang","year":"2004","journal-title":"Catal. Today"},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0020","unstructured":"L. Beu, P.T. Brown. Proceedings of the IEEE\/CPMT International Electronic Manufacturing Technology Symposium, 1998, 277."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0025","doi-asserted-by":"crossref","first-page":"1367","DOI":"10.1021\/es010698w","volume":"36","author":"Lee","year":"2002","journal-title":"Environ. Sci. Technol."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0030","doi-asserted-by":"crossref","first-page":"3437","DOI":"10.3938\/jkps.59.3437","volume":"59","author":"Kim","year":"2011","journal-title":"J. Korean Phys. Soc."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0035","doi-asserted-by":"crossref","first-page":"1234","DOI":"10.1016\/S1001-0742(11)60935-2","volume":"24","author":"Sanjeeva Gandhi","year":"2012","journal-title":"J. Environ. Sci."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0040","doi-asserted-by":"crossref","first-page":"114,504","DOI":"10.1063\/1.2397044","volume":"13","author":"Shin","year":"2006","journal-title":"Phys. Plasmas"},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0045","doi-asserted-by":"crossref","first-page":"33,508","DOI":"10.1063\/1.2182240","volume":"13","author":"Hong","year":"2006","journal-title":"Phys. Plasmas"},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0050","doi-asserted-by":"crossref","first-page":"201,502","DOI":"10.1063\/1.2205008","volume":"88","author":"Hong","year":"2006","journal-title":"Appl. Phys. Lett."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0055","doi-asserted-by":"crossref","first-page":"238","DOI":"10.3938\/jkps.64.238","volume":"64","author":"Kim","year":"2014","journal-title":"J. Korean Phys. Soc."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0060","doi-asserted-by":"crossref","first-page":"1982","DOI":"10.1109\/TPS.2014.2327981","volume":"64","author":"Hong","year":"2014","journal-title":"IEEE Trans. Plasma Sci."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0065","first-page":"1","volume":"42","author":"Baulch","year":"2014","journal-title":"J. Phys. Chem. Ref. Data. Suppl."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0070","doi-asserted-by":"crossref","first-page":"1596","DOI":"10.1063\/1.334477","volume":"57","author":"Greenbug","year":"1985","journal-title":"J. Appl. Phys."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0075","doi-asserted-by":"crossref","first-page":"366","DOI":"10.1016\/0009-2614(77)85283-4","volume":"46","author":"Ultee","year":"1997","journal-title":"Chem. Phys. Lett."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0080","doi-asserted-by":"crossref","first-page":"281","DOI":"10.1007\/BF01020407","volume":"8","author":"Ryan","year":"1988","journal-title":"Plasma Chem. Plasma Process."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0085","doi-asserted-by":"crossref","first-page":"129","DOI":"10.1002\/kin.550190205","volume":"19","author":"Herron","year":"1987","journal-title":"Int. J. Chem. Kinet."},{"key":"10.1016\/j.jhazmat.2015.03.016_bib0090","doi-asserted-by":"crossref","first-page":"247","DOI":"10.1007\/BF00575131","volume":"6","author":"Plumb","year":"1986","journal-title":"Plasma Chem. Plasma Process."}],"container-title":["Journal of Hazardous Materials"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0304389415002046?httpAccept=text\/xml","content-type":"text\/xml","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0304389415002046?httpAccept=text\/plain","content-type":"text\/plain","content-version":"vor","intended-application":"text-mining"}],"deposited":{"date-parts":[[2018,9,23]],"date-time":"2018-09-23T21:25:59Z","timestamp":1537737959000},"score":1,"resource":{"primary":{"URL":"https:\/\/linkinghub.elsevier.com\/retrieve\/pii\/S0304389415002046"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2015,8]]},"references-count":18,"alternative-id":["S0304389415002046"],"URL":"https:\/\/doi.org\/10.1016\/j.jhazmat.2015.03.016","relation":{},"ISSN":["0304-3894"],"issn-type":[{"value":"0304-3894","type":"print"}],"subject":[],"published":{"date-parts":[[2015,8]]},"assertion":[{"value":"Elsevier","name":"publisher","label":"This article is maintained by"},{"value":"Abatement of fluorinated compounds using a 2.45GHz microwave plasma torch with a reverse vortex plasma reactor","name":"articletitle","label":"Article Title"},{"value":"Journal of Hazardous Materials","name":"journaltitle","label":"Journal Title"},{"value":"https:\/\/doi.org\/10.1016\/j.jhazmat.2015.03.016","name":"articlelink","label":"CrossRef DOI link to publisher maintained version"},{"value":"article","name":"content_type","label":"Content Type"},{"value":"Copyright \u00a9 2015 Elsevier B.V. All rights reserved.","name":"copyright","label":"Copyright"}]}}