{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,9,29]],"date-time":"2026-09-29T09:11:47Z","timestamp":1790673107879,"version":"4.1.0"},"reference-count":21,"publisher":"Elsevier BV","issue":"1","license":[{"start":{"date-parts":[[2019,3,1]],"date-time":"2019-03-01T00:00:00Z","timestamp":1551398400000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/www.elsevier.com\/tdm\/userlicense\/1.0\/"},{"start":{"date-parts":[[2018,8,14]],"date-time":"2018-08-14T00:00:00Z","timestamp":1534204800000},"content-version":"vor","delay-in-days":0,"URL":"http:\/\/creativecommons.org\/licenses\/by-nc-nd\/4.0\/"}],"funder":[{"name":"National Research Foundation of KoreaNational Research Foundation of Korea (NRF)","award":["2011-0002926"],"award-info":[{"award-number":["2011-0002926"]}]},{"name":"BK21 Plus project","award":["5280-20140100"],"award-info":[{"award-number":["5280-20140100"]}]}],"content-domain":{"domain":["elsevier.com","sciencedirect.com"],"crossmark-restriction":true},"short-container-title":["Safety and Health at Work"],"published-print":{"date-parts":[[2019,3]]},"DOI":"10.1016\/j.shaw.2018.08.001","type":"journal-article","created":{"date-parts":[[2018,8,18]],"date-time":"2018-08-18T12:30:15Z","timestamp":1534595415000},"page":"114-121","update-policy":"https:\/\/doi.org\/10.1016\/elsevier_cm_policy","source":"Crossref","is-referenced-by-count":26,"title":["Evaluation of Hazardous Chemicals with Material Safety Data Sheet and By-products of a Photoresist Used in the Semiconductor-Manufacturing Industry"],"prefix":"10.1016","volume":"10","author":[{"given":"Miyeon","family":"Jang","sequence":"first","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Chungsik","family":"Yoon","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-4829-5587","authenticated-orcid":false,"given":"Jihoon","family":"Park","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Ohhun","family":"Kwon","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"78","reference":[{"key":"10.1016\/j.shaw.2018.08.001_bib1","doi-asserted-by":"crossref","first-page":"269","DOI":"10.1109\/13.85086","article-title":"Chemical hazards in the semiconductor industry","volume":"34","author":"Chelton","year":"1991","journal-title":"IEEE Trans Educ"},{"key":"10.1016\/j.shaw.2018.08.001_bib2","doi-asserted-by":"crossref","first-page":"1075","DOI":"10.1097\/JOM.0b013e3181f6ee1d","article-title":"Exposure assessment among US workers employed in semiconductor wafer fabrication","volume":"52","author":"Marano","year":"2010","journal-title":"J\u00a0Occup Environ Med"},{"key":"10.1016\/j.shaw.2018.08.001_bib3","doi-asserted-by":"crossref","first-page":"12","DOI":"10.5668\/JEHS.2011.37.1.012","article-title":"Retrospective exposure assessment of wafer fabrication workers in the semiconductor industry","volume":"37","author":"Park","year":"2011","journal-title":"J\u00a0Korean Environ Health Sci"},{"key":"10.1016\/j.shaw.2018.08.001_bib4","series-title":"Semiconductor manufacturing technology","author":"Quirk","year":"2001"},{"key":"10.1016\/j.shaw.2018.08.001_bib5","doi-asserted-by":"crossref","first-page":"203","DOI":"10.1002\/ajim.4700110209","article-title":"Semiconductor manufacturing: an introduction to processes and hazards","volume":"11","author":"Wald","year":"1987","journal-title":"Am J Ind Med"},{"key":"10.1016\/j.shaw.2018.08.001_bib6","doi-asserted-by":"crossref","first-page":"681","DOI":"10.1002\/ajim.4700280605","article-title":"Patterns of chemical use and exposure control in the semiconductor health study","volume":"28","author":"Hallock","year":"1995","journal-title":"Am J Ind Med"},{"issue":"3","key":"10.1016\/j.shaw.2018.08.001_bib7","first-page":"333","article-title":"Review on potential risk factors in wafer fabrication process of semiconductor industry","volume":"23","author":"Park","year":"2011","journal-title":"J\u00a0Kor Occup Environ Med"},{"key":"10.1016\/j.shaw.2018.08.001_bib8","unstructured":"Goodner MD. UV-activated dielectric layer. Intel Corporation, assignee. United States Patent US7358597, 2008."},{"key":"10.1016\/j.shaw.2018.08.001_bib9","doi-asserted-by":"crossref","first-page":"210","DOI":"10.5491\/SHAW.2011.2.3.210","article-title":"Exposure to volatile organic compounds and possibility of exposure to by-product volatile organic compounds in photolithography processes in semiconductor manufacturing factories","volume":"2","author":"Park","year":"2011","journal-title":"Saf Health Work"},{"key":"10.1016\/j.shaw.2018.08.001_bib10","doi-asserted-by":"crossref","first-page":"461","DOI":"10.3346\/jkms.2012.27.5.461","article-title":"Much concern but little research on semiconductor occupational health issues","volume":"27","author":"Yoon","year":"2012","journal-title":"J\u00a0Kor Med Sci"},{"key":"10.1016\/j.shaw.2018.08.001_bib11","doi-asserted-by":"crossref","first-page":"32","DOI":"10.1016\/j.aca.2014.04.052","article-title":"Experimental validation of an effective carbon number-based approach for the gas chromatography\u2013mass spectrometry quantification of \u2018compounds lacking authentic standards or surrogates\u2019","volume":"830","author":"Kim","year":"2014","journal-title":"Anal Chim Acta"},{"key":"10.1016\/j.shaw.2018.08.001_bib12","doi-asserted-by":"crossref","first-page":"409","DOI":"10.1080\/104732200301368","article-title":"The verification of hazardous ingredients disclosures in selected material safety data sheets","volume":"15","author":"Welsh","year":"2000","journal-title":"Appl Occup Environ Hyg"},{"key":"10.1016\/j.shaw.2018.08.001_bib13","doi-asserted-by":"crossref","first-page":"35","DOI":"10.1067\/mai.2002.124891","article-title":"Material safety data sheets: are they reliable in identifying human hazards?","volume":"110","author":"Bernstein","year":"2002","journal-title":"J\u00a0Allergy Clin Immunol"},{"key":"10.1016\/j.shaw.2018.08.001_bib14","series-title":"Microchip fabrication: a practical guide to semiconductor processing","author":"Zant","year":"2000"},{"key":"10.1016\/j.shaw.2018.08.001_bib15","doi-asserted-by":"crossref","first-page":"29","DOI":"10.1016\/j.toxlet.2003.12.077","article-title":"The INSERM expert review on glycol ethers: findings and recommendations","volume":"156","author":"Multigner","year":"2005","journal-title":"Toxicol Lett"},{"key":"10.1016\/j.shaw.2018.08.001_bib16","doi-asserted-by":"crossref","first-page":"708","DOI":"10.1136\/oem.2007.035824","article-title":"Occupation and male infertility: glycol ethers and other exposure","volume":"65","author":"Cherry","year":"2008","journal-title":"Occup Environ Med"},{"key":"10.1016\/j.shaw.2018.08.001_bib17","first-page":"355","article-title":"Exposures to glycol ethers in the semiconductor industry","volume":"2","author":"Hammond","year":"1996","journal-title":"Ann Occup Hyg"},{"issue":"3","key":"10.1016\/j.shaw.2018.08.001_bib18","first-page":"287","article-title":"A\u00a0study of MSDS reliability evaluation in chemicals including formaldehyde","volume":"23","author":"Hong","year":"2014","journal-title":"J\u00a0Kor Soc Occup Environ Hyg"},{"issue":"4","key":"10.1016\/j.shaw.2018.08.001_bib19","first-page":"370","article-title":"MSDSs reliability evaluation in workplaces manufacturing aromatic hydrocarbon","volume":"19","author":"Lee","year":"2009","journal-title":"J\u00a0Kor Soc Occup Environ Hyg"},{"issue":"3","key":"10.1016\/j.shaw.2018.08.001_bib20","first-page":"221","article-title":"A\u00a0study on the chemical composition and MSDS reliability of powder coatings","volume":"14","author":"Lee","year":"2004","journal-title":"J\u00a0Kor Soc Occup Environ Hyg"},{"issue":"3","key":"10.1016\/j.shaw.2018.08.001_bib21","first-page":"261","article-title":"A\u00a0study on the reliability of material safety data sheets (MSDS) for paint thinner","volume":"13","author":"Lee","year":"2003","journal-title":"J\u00a0Kor Soc Occup Environ Hyg"}],"container-title":["Safety and Health at Work"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S2093791117302366?httpAccept=text\/xml","content-type":"text\/xml","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S2093791117302366?httpAccept=text\/plain","content-type":"text\/plain","content-version":"vor","intended-application":"text-mining"}],"deposited":{"date-parts":[[2019,3,20]],"date-time":"2019-03-20T14:45:27Z","timestamp":1553093127000},"score":1,"resource":{"primary":{"URL":"https:\/\/linkinghub.elsevier.com\/retrieve\/pii\/S2093791117302366"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2019,3]]},"references-count":21,"journal-issue":{"issue":"1","published-print":{"date-parts":[[2019,3]]}},"alternative-id":["S2093791117302366"],"URL":"https:\/\/doi.org\/10.1016\/j.shaw.2018.08.001","relation":{},"ISSN":["2093-7911"],"issn-type":[{"value":"2093-7911","type":"print"}],"subject":[],"published":{"date-parts":[[2019,3]]},"assertion":[{"value":"Elsevier","name":"publisher","label":"This article is maintained by"},{"value":"Evaluation of Hazardous Chemicals with Material Safety Data Sheet and By-products of a Photoresist Used in the Semiconductor-Manufacturing Industry","name":"articletitle","label":"Article Title"},{"value":"Safety and Health at Work","name":"journaltitle","label":"Journal Title"},{"value":"https:\/\/doi.org\/10.1016\/j.shaw.2018.08.001","name":"articlelink","label":"CrossRef DOI link to publisher maintained version"},{"value":"article","name":"content_type","label":"Content Type"},{"value":"\u00a9 2018 Occupational Safety and Health Research Institute, Published by Elsevier Korea LLC.","name":"copyright","label":"Copyright"}]}}