{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,7,4]],"date-time":"2026-07-04T08:17:07Z","timestamp":1783153027541,"version":"3.54.6"},"reference-count":15,"publisher":"Elsevier BV","license":[{"start":{"date-parts":[[2026,7,1]],"date-time":"2026-07-01T00:00:00Z","timestamp":1782864000000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/www.elsevier.com\/tdm\/userlicense\/1.0\/"},{"start":{"date-parts":[[2026,7,1]],"date-time":"2026-07-01T00:00:00Z","timestamp":1782864000000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/www.elsevier.com\/legal\/tdmrep-license"},{"start":{"date-parts":[[2026,7,1]],"date-time":"2026-07-01T00:00:00Z","timestamp":1782864000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-017"},{"start":{"date-parts":[[2026,7,1]],"date-time":"2026-07-01T00:00:00Z","timestamp":1782864000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"},{"start":{"date-parts":[[2026,7,1]],"date-time":"2026-07-01T00:00:00Z","timestamp":1782864000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-012"},{"start":{"date-parts":[[2026,7,1]],"date-time":"2026-07-01T00:00:00Z","timestamp":1782864000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2026,7,1]],"date-time":"2026-07-01T00:00:00Z","timestamp":1782864000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-004"}],"funder":[{"DOI":"10.13039\/501100002367","name":"Chinese Academy of Sciences","doi-asserted-by":"publisher","award":["PTYQ2024BJ0004"],"award-info":[{"award-number":["PTYQ2024BJ0004"]}],"id":[{"id":"10.13039\/501100002367","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100001809","name":"National Natural Science Foundation of China","doi-asserted-by":"publisher","award":["62571511"],"award-info":[{"award-number":["62571511"]}],"id":[{"id":"10.13039\/501100001809","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":["elsevier.com","sciencedirect.com"],"crossmark-restriction":true},"short-container-title":["Ultramicroscopy"],"published-print":{"date-parts":[[2026,7]]},"DOI":"10.1016\/j.ultramic.2026.114375","type":"journal-article","created":{"date-parts":[[2026,4,25]],"date-time":"2026-04-25T15:06:10Z","timestamp":1777129570000},"page":"114375","update-policy":"https:\/\/doi.org\/10.1016\/elsevier_cm_policy","source":"Crossref","is-referenced-by-count":0,"special_numbering":"C","title":["Minimizing off-axis aberrations in multi-beam electron optical systems: An analytical approach"],"prefix":"10.1016","volume":"284","author":[{"given":"Weixia","family":"Zhao","sequence":"first","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Lingchao","family":"Bai","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-6799-3586","authenticated-orcid":false,"given":"Lixin","family":"Zhang","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Junbiao","family":"Liu","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Bohua","family":"Yin","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Li","family":"Han","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"78","reference":[{"key":"10.1016\/j.ultramic.2026.114375_bib0001","doi-asserted-by":"crossref","first-page":"12","DOI":"10.1017\/S1551929515000012","article-title":"Multiple-beam scanning electron microscopy","volume":"23","author":"Eberle","year":"2015","journal-title":"Micros Today"},{"key":"10.1016\/j.ultramic.2026.114375_bib0002","doi-asserted-by":"crossref","first-page":"49","DOI":"10.1515\/mim-2024-0005","article-title":"FAST-EM array tomography: a workflow for multibeam volume electron microscopy","volume":"1","author":"Kievits","year":"2024","journal-title":"Methods Microsc."},{"key":"10.1016\/j.ultramic.2026.114375_bib0003","unstructured":"E.L. Ma, W. Ren, X. Luo, S. Zhao, X. Hu, X. Liu, C. Kuan, K. Chou, M. Maassen, W. Yin, A. Chen, N. Sen, M. Ebert, L. Liu, F. Wang, O.D. Patterson, O. Adan, J.C. Robinson, Multi-beam Inspection (MBI) development progress and applications, in: Proc Spie, 2020."},{"key":"10.1016\/j.ultramic.2026.114375_bib0004","doi-asserted-by":"crossref","DOI":"10.35848\/1347-4065\/acb65d","article-title":"Recent progress and future of electron multi-beam mask writer","volume":"62","author":"Yasuda","year":"2023","journal-title":"Jpn. J. Appl. Phys."},{"key":"10.1016\/j.ultramic.2026.114375_bib0005","doi-asserted-by":"crossref","unstructured":"B.S. Kasprowicz, P.D. Buck, C. Klein, E. Platzgummer, MBMW-101: world's 1st high-throughput multi-beam mask writer, in: SPIE Photomask Technology, San Jose, California, United States, 2016, pp. 998505-998501-998507.","DOI":"10.1117\/12.2243638"},{"key":"10.1016\/j.ultramic.2026.114375_bib0006","doi-asserted-by":"crossref","first-page":"380","DOI":"10.1116\/1.2647279","article-title":"Inspection of all beams in multielectron beam system","volume":"25","author":"Tanimoto","year":"2007","journal-title":"J. Vac. Sci. Technol. B: Microelectron. Nanom. Struct. Process. Meas. Phenom."},{"key":"10.1016\/j.ultramic.2026.114375_bib0007","doi-asserted-by":"crossref","first-page":"3061","DOI":"10.1116\/1.1320798","article-title":"New concept for high-throughput multielectron beam direct write system","volume":"18","author":"Muraki","year":"2000","journal-title":"J. Vac. Sci. Technol. B: Microelectron. Nanom. Struct. Process. Meas. Phenom."},{"key":"10.1016\/j.ultramic.2026.114375_bib0008","doi-asserted-by":"crossref","DOI":"10.1016\/j.ultramic.2023.113735","article-title":"In multi electron beam systems, \"neighbours matter\"","volume":"249","author":"Mohammadi-Gheidari","year":"2023","journal-title":"Ultramicroscopy"},{"key":"10.1016\/j.ultramic.2026.114375_bib0009","doi-asserted-by":"crossref","first-page":"1251","DOI":"10.1116\/1.583490","article-title":"Reduced aberrations in an electron matrix lens through the use of offset apertures","volume":"4","author":"Kurihara","year":"1986","journal-title":"J. Vac. Sci. Technol. B: Microelectron. Process. Phenom."},{"key":"10.1016\/j.ultramic.2026.114375_bib0010","doi-asserted-by":"crossref","first-page":"655","DOI":"10.1116\/1.2897321","article-title":"Electron optics of microlenses with inclined beams","volume":"26","author":"Zhang","year":"2008","journal-title":"J. Vac. Sci. Technol. B"},{"key":"10.1016\/j.ultramic.2026.114375_bib0011","doi-asserted-by":"crossref","DOI":"10.1016\/j.ultramic.2024.114085","article-title":"Aberration calculation of microlens array using differential algebraic method","volume":"269","author":"Hu","year":"2025","journal-title":"Ultramicroscopy"},{"key":"10.1016\/j.ultramic.2026.114375_bib0012","doi-asserted-by":"crossref","first-page":"42","DOI":"10.1002\/sca.4950280107","article-title":"Aberration model of a multibeam scanning microscope for electron beam-induced deposition","volume":"28","author":"van Bruggen","year":"2006","journal-title":"Scanning"},{"key":"10.1016\/j.ultramic.2026.114375_bib0013","doi-asserted-by":"crossref","first-page":"60","DOI":"10.1016\/j.nima.2010.12.090","article-title":"Electron optics of multi-beam scanning electron microscope","volume":"645","author":"Mohammadi-Gheidari","year":"2011","journal-title":"Nucl. Instrum. Methods Phys. Res. A: Accel. Spectrom. Detect. Assoc. Equip."},{"key":"10.1016\/j.ultramic.2026.114375_bib0014","doi-asserted-by":"crossref","first-page":"2833","DOI":"10.1116\/1.2091087","article-title":"Development of a multi-electron-beam source for sub-10nm electron beam induced deposition","volume":"23","author":"van Bruggen","year":"2005","journal-title":"J. Vac. Sci. Technol. B: Microelectron. Nanom. Struct. Process. Meas. Phenom."},{"key":"10.1016\/j.ultramic.2026.114375_bib0015","unstructured":"E. Munro, Manual of Munro's electron beam software: OPTICS, in, 2020."}],"container-title":["Ultramicroscopy"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0304399126000677?httpAccept=text\/xml","content-type":"text\/xml","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0304399126000677?httpAccept=text\/plain","content-type":"text\/plain","content-version":"vor","intended-application":"text-mining"}],"deposited":{"date-parts":[[2026,7,4]],"date-time":"2026-07-04T07:35:17Z","timestamp":1783150517000},"score":1,"resource":{"primary":{"URL":"https:\/\/linkinghub.elsevier.com\/retrieve\/pii\/S0304399126000677"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2026,7]]},"references-count":15,"alternative-id":["S0304399126000677"],"URL":"https:\/\/doi.org\/10.1016\/j.ultramic.2026.114375","relation":{},"ISSN":["0304-3991"],"issn-type":[{"value":"0304-3991","type":"print"}],"subject":[],"published":{"date-parts":[[2026,7]]},"assertion":[{"value":"Elsevier","name":"publisher","label":"This article is maintained by"},{"value":"Minimizing off-axis aberrations in multi-beam electron optical systems: An analytical approach","name":"articletitle","label":"Article Title"},{"value":"Ultramicroscopy","name":"journaltitle","label":"Journal Title"},{"value":"https:\/\/doi.org\/10.1016\/j.ultramic.2026.114375","name":"articlelink","label":"CrossRef DOI link to publisher maintained version"},{"value":"article","name":"content_type","label":"Content Type"},{"value":"\u00a9 2026 Elsevier B.V. All rights are reserved, including those for text and data mining, AI training, and similar technologies.","name":"copyright","label":"Copyright"}],"article-number":"114375"}}