{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,3,16]],"date-time":"2026-03-16T17:23:46Z","timestamp":1773681826913,"version":"3.50.1"},"reference-count":18,"publisher":"Elsevier BV","issue":"1-2","license":[{"start":{"date-parts":[[1999,1,1]],"date-time":"1999-01-01T00:00:00Z","timestamp":915148800000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/www.elsevier.com\/tdm\/userlicense\/1.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Thin Solid Films"],"published-print":{"date-parts":[[1999,1]]},"DOI":"10.1016\/s0040-6090(98)01393-5","type":"journal-article","created":{"date-parts":[[2002,7,26]],"date-time":"2002-07-26T00:50:19Z","timestamp":1027644619000},"page":"171-175","source":"Crossref","is-referenced-by-count":82,"title":["Performances exhibited by large area ITO layers produced by r.f. magnetron sputtering"],"prefix":"10.1016","volume":"337","author":[{"given":"I","family":"Ba\u0131\u0301a","sequence":"first","affiliation":[]},{"given":"M","family":"Quintela","sequence":"additional","affiliation":[]},{"given":"L","family":"Mendes","sequence":"additional","affiliation":[]},{"given":"P","family":"Nunes","sequence":"additional","affiliation":[]},{"given":"R","family":"Martins","sequence":"additional","affiliation":[]}],"member":"78","reference":[{"key":"10.1016\/S0040-6090(98)01393-5_BIB1","first-page":"17","volume":"29","author":"van Boort","year":"1968","journal-title":"Philips Technol. Revue"},{"key":"10.1016\/S0040-6090(98)01393-5_BIB2","doi-asserted-by":"crossref","first-page":"87","DOI":"10.1002\/pssa.2210290110","volume":"29","author":"Kostlin","year":"1975","journal-title":"Physica Status Solidi (a)"},{"key":"10.1016\/S0040-6090(98)01393-5_BIB3","unstructured":"C. Carvalho, Ph.D. Thesis, Faculdade de Ci\u00eancias e Tecnologia da Universidade Nova de Lisboa, 1995."},{"key":"10.1016\/S0040-6090(98)01393-5_BIB4","doi-asserted-by":"crossref","first-page":"69","DOI":"10.1002\/pssb.19660140104","volume":"14","author":"Groth","year":"1966","journal-title":"Physics Status Solidi"},{"key":"10.1016\/S0040-6090(98)01393-5_BIB5","doi-asserted-by":"crossref","first-page":"11","DOI":"10.1016\/0165-1633(86)90024-9","volume":"13","author":"Banerjee","year":"1985","journal-title":"Sol. Energy Mater."},{"key":"10.1016\/S0040-6090(98)01393-5_BIB6","doi-asserted-by":"crossref","first-page":"469","DOI":"10.1016\/0165-1633(85)90017-6","volume":"11","author":"Karlsson","year":"1985","journal-title":"Sol. Energy Mater."},{"key":"10.1016\/S0040-6090(98)01393-5_BIB7","unstructured":"G. Blandenet, Y. Lagarde, J. Spitz, Proc. 5th Int. Conf. on Chemical Vapour Deposition, Electrochemical Society, 1975, p. 170."},{"key":"10.1016\/S0040-6090(98)01393-5_BIB8","doi-asserted-by":"crossref","first-page":"99","DOI":"10.1116\/1.568633","volume":"12","author":"Molzen","year":"1975","journal-title":"J. Vac. Sci. Technol."},{"key":"10.1016\/S0040-6090(98)01393-5_BIB9","doi-asserted-by":"crossref","first-page":"469","DOI":"10.1016\/0040-6090(80)90533-7","volume":"72","author":"Smith","year":"1980","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0040-6090(98)01393-5_BIB10","doi-asserted-by":"crossref","unstructured":"E. Maruyama, S. Tsuda, S. Nakano, Solid State Phenomena 44\u201346, Wiley, New York, 1995, p. 863.","DOI":"10.4028\/www.scientific.net\/SSP.44-46.863"},{"key":"10.1016\/S0040-6090(98)01393-5_BIB11","doi-asserted-by":"crossref","first-page":"863","DOI":"10.1557\/PROC-467-863","volume":"467","author":"Powell","year":"1997","journal-title":"Mater. Res. Soc. Symp."},{"key":"10.1016\/S0040-6090(98)01393-5_BIB12","doi-asserted-by":"crossref","first-page":"757","DOI":"10.1557\/PROC-377-757","volume":"377","author":"Street","year":"1995","journal-title":"Mater. Res. Soc. Symp."},{"key":"10.1016\/S0040-6090(98)01393-5_BIB13","doi-asserted-by":"crossref","first-page":"347","DOI":"10.1557\/PROC-424-347","volume":"424","author":"Lan","year":"1997","journal-title":"Mater. Res. Soc. Symp."},{"key":"10.1016\/S0040-6090(98)01393-5_BIB14","unstructured":"N. Harada, JARECT Vol. 16, Amorphous Semiconductor Technologies & Devices (1984) 283."},{"key":"10.1016\/S0040-6090(98)01393-5_BIB15","doi-asserted-by":"crossref","first-page":"1","DOI":"10.1016\/0040-6090(93)90632-Y","volume":"236","author":"Davis","year":"1993","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0040-6090(98)01393-5_BIB16","doi-asserted-by":"crossref","first-page":"44","DOI":"10.1016\/0040-6090(94)90646-7","volume":"238","author":"Shigesato","year":"1994","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0040-6090(98)01393-5_BIB17","doi-asserted-by":"crossref","first-page":"201","DOI":"10.1016\/0040-6090(94)90800-1","volume":"247","author":"Wu","year":"1994","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0040-6090(98)01393-5_BIB18","unstructured":"R.F. Bunshah, Handbook of Deposition Technologies for Films and Coatings, Noyes Publications, 1994, p. 778."}],"container-title":["Thin Solid Films"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0040609098013935?httpAccept=text\/xml","content-type":"text\/xml","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0040609098013935?httpAccept=text\/plain","content-type":"text\/plain","content-version":"vor","intended-application":"text-mining"}],"deposited":{"date-parts":[[2019,4,16]],"date-time":"2019-04-16T11:53:42Z","timestamp":1555415622000},"score":1,"resource":{"primary":{"URL":"https:\/\/linkinghub.elsevier.com\/retrieve\/pii\/S0040609098013935"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[1999,1]]},"references-count":18,"journal-issue":{"issue":"1-2","published-print":{"date-parts":[[1999,1]]}},"alternative-id":["S0040609098013935"],"URL":"https:\/\/doi.org\/10.1016\/s0040-6090(98)01393-5","relation":{},"ISSN":["0040-6090"],"issn-type":[{"value":"0040-6090","type":"print"}],"subject":[],"published":{"date-parts":[[1999,1]]}}}