{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,3,26]],"date-time":"2026-03-26T05:38:12Z","timestamp":1774503492380,"version":"3.50.1"},"reference-count":0,"publisher":"Elsevier BV","issue":"3-4","license":[{"start":{"date-parts":[[2002,1,1]],"date-time":"2002-01-01T00:00:00Z","timestamp":1009843200000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/www.elsevier.com\/tdm\/userlicense\/1.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2002,1]]},"DOI":"10.1016\/s0042-207x(01)00337-2","type":"journal-article","created":{"date-parts":[[2002,10,15]],"date-time":"2002-10-15T10:10:16Z","timestamp":1034676616000},"page":"211-218","source":"Crossref","is-referenced-by-count":42,"title":["Nanocrystalline structure and hardness of thin films"],"prefix":"10.1016","volume":"64","author":[{"given":"A","family":"Cavaleiro","sequence":"first","affiliation":[]}],"member":"78","container-title":["Vacuum"],"original-title":[],"link":[{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0042-207X(01)00337-2?httpAccept=text\/xml","content-type":"text\/xml","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0042-207X(01)00337-2?httpAccept=text\/plain","content-type":"text\/plain","content-version":"vor","intended-application":"text-mining"}],"deposited":{"date-parts":[[2019,5,3]],"date-time":"2019-05-03T02:54:14Z","timestamp":1556852054000},"score":1,"resource":{"primary":{"URL":"https:\/\/linkinghub.elsevier.com\/retrieve\/pii\/S0042207X01003372"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2002,1]]},"references-count":0,"journal-issue":{"issue":"3-4"},"alternative-id":["S0042-207X(01)00337-2"],"URL":"https:\/\/doi.org\/10.1016\/s0042-207x(01)00337-2","relation":{},"ISSN":["0042-207X"],"issn-type":[{"value":"0042-207X","type":"print"}],"subject":[],"published":{"date-parts":[[2002,1]]}}}