{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,9,21]],"date-time":"2025-09-21T17:58:24Z","timestamp":1758477504164},"reference-count":27,"publisher":"Elsevier BV","issue":"3-4","license":[{"start":{"date-parts":[[2002,1,1]],"date-time":"2002-01-01T00:00:00Z","timestamp":1009843200000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/www.elsevier.com\/tdm\/userlicense\/1.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Vacuum"],"published-print":{"date-parts":[[2002,1]]},"DOI":"10.1016\/s0042-207x(01)00339-6","type":"journal-article","created":{"date-parts":[[2002,10,15]],"date-time":"2002-10-15T10:10:16Z","timestamp":1034676616000},"page":"219-226","source":"Crossref","is-referenced-by-count":1,"title":["Silicon nanostructure thin film materials"],"prefix":"10.1016","volume":"64","author":[{"given":"R.","family":"Martins","sequence":"first","affiliation":[]},{"given":"H.","family":"\u00c1guas","sequence":"additional","affiliation":[]},{"given":"V.","family":"Silva","sequence":"additional","affiliation":[]},{"given":"I.","family":"Ferreira","sequence":"additional","affiliation":[]},{"given":"A.","family":"Cabrita","sequence":"additional","affiliation":[]},{"given":"E.","family":"Fortunato","sequence":"additional","affiliation":[]}],"member":"78","reference":[{"key":"10.1016\/S0042-207X(01)00339-6_BIB1","series-title":"Amorphous silicon based devices","first-page":"1","author":"Bruno","year":"1995"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB2","doi-asserted-by":"crossref","unstructured":"Martins R, Ferreira I, Fortunato E. In: Murch GE, Neber-Aeschbacher H, W\u00f6hlbier FH, editors. Hydrogenated amorphous silicon. Solid state phenomena, vols. 44\u201346. Scitec Publications Ltd, 1995. p. 299\u2013342.","DOI":"10.4028\/www.scientific.net\/SSP.44-46.299"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB3","first-page":"1","volume":"58","author":"Layeillon","year":"1995","journal-title":"Chem Eng J"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB4","doi-asserted-by":"crossref","first-page":"2060","DOI":"10.1063\/1.366016","volume":"82","author":"Nienhus","year":"1997","journal-title":"J Appl Phys"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB5","doi-asserted-by":"crossref","first-page":"31","DOI":"10.1016\/S0022-3093(99)00714-0","volume":"266\u2013269","author":"Roca","year":"2000","journal-title":"J of Non-Cryst Sol"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB6","doi-asserted-by":"crossref","unstructured":"Kroesen GMW. In: Williams PF, editor. Plasma processing of semiconductors, Applied Science, vol. 336. Dordrecht: Academic Publishers, 1997. p. 515\u201328.","DOI":"10.1007\/978-94-011-5884-8_25"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB7","doi-asserted-by":"crossref","first-page":"278","DOI":"10.1088\/0963-0252\/3\/3\/007","volume":"3","author":"Hollenstein","year":"1994","journal-title":"Plasma Source Sci Technol"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB8","doi-asserted-by":"crossref","first-page":"2069","DOI":"10.1063\/1.363118","volume":"80","author":"Courteille","year":"1996","journal-title":"J Appl Phys"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB9","first-page":"125","volume":"vol. 336","author":"Perrin","year":"1997"},{"issue":"10\/11","key":"10.1016\/S0042-207X(01)00339-6_BIB10","doi-asserted-by":"crossref","first-page":"1107","DOI":"10.1016\/0042-207X(94)90036-1","volume":"45","author":"Martins","year":"1994","journal-title":"Vacuum"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB11","doi-asserted-by":"crossref","first-page":"31","DOI":"10.1016\/S0042-207X(99)00157-8","volume":"56","author":"\u00c1guas","year":"2000","journal-title":"Vacuum"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB12","unstructured":"Roca I, Cabarrocas P. In: Searle T, editor. Properties of amorphous silicon films and its alloys. EMIS data reviews series No. 19, INSPEC, London, 1998. p. 3."},{"key":"10.1016\/S0042-207X(01)00339-6_BIB13","doi-asserted-by":"crossref","first-page":"25","DOI":"10.1016\/S0042-207X(99)00158-X","volume":"56","author":"Martins","year":"2000","journal-title":"Vacuum"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB14","series-title":"Plasma deposition, treatment and etching of polymers","first-page":"1","author":"Morosoff","year":"1990"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB15","doi-asserted-by":"crossref","first-page":"1674","DOI":"10.1063\/1.112882","volume":"65","author":"Roca","year":"1994","journal-title":"Appl Phys Lett"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB16","doi-asserted-by":"crossref","unstructured":"\u00c1guas H, Martins R, Fortunato E. Vacuum 2002;64:387\u201392.","DOI":"10.1016\/S0042-207X(01)00343-8"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB17","unstructured":"Giorgis F, Giuliani F, Pirri CF, Tresso E, Coscia U. In: Searle T, editor. Properties of amorphous silicon and its alloys. IEE EMIS DATA review series, 1998. p. 168\u201379."},{"key":"10.1016\/S0042-207X(01)00339-6_BIB18","doi-asserted-by":"crossref","first-page":"2064","DOI":"10.1103\/PhysRevB.19.2064","volume":"19","author":"Lucovsky","year":"1979","journal-title":"Phys Rev B"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB19","doi-asserted-by":"crossref","first-page":"1769","DOI":"10.1063\/1.113003","volume":"65","author":"Yang","year":"1994","journal-title":"Appl Phys Lett"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB20","doi-asserted-by":"crossref","first-page":"1","DOI":"10.1016\/S0040-6090(98)01165-1","volume":"337","author":"Matsuda","year":"1999","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB21","doi-asserted-by":"crossref","first-page":"3","DOI":"10.1002\/ctpp.2150360102","volume":"36","author":"Perrin","year":"1996","journal-title":"Contrib Plasma Phys"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB22","doi-asserted-by":"crossref","first-page":"48","DOI":"10.1016\/S0022-3093(99)00723-1","volume":"266\u2013269","author":"Fontcuberta I Morral","year":"2000","journal-title":"J Non-Cryst Solids"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB23","first-page":"489","volume":"84","author":"Delrue","year":"1998","journal-title":"Phys Rev B"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB24","unstructured":"Martins R, \u00c1guas H, Ferreira I, Silva V, Cabrita A, Fortunato E. Thin Solid Films, 2000, in press."},{"key":"10.1016\/S0042-207X(01)00339-6_BIB25","doi-asserted-by":"crossref","first-page":"263","DOI":"10.1016\/S0022-3093(99)00833-9","volume":"266\u2013269","author":"Butt\u00e9","year":"2000","journal-title":"J Non-Cryst Solids"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB26","doi-asserted-by":"crossref","first-page":"203","DOI":"10.1016\/S0042-207X(98)00221-8","volume":"52","author":"Martins","year":"1999","journal-title":"Vacuum"},{"key":"10.1016\/S0042-207X(01)00339-6_BIB27","doi-asserted-by":"crossref","unstructured":"Ferreira I, Martins R, Cabrita A, Fortunato E, Vilarinho P. MRS spring meeting, Symp. A, 2000; vol. 609, in press.","DOI":"10.1557\/PROC-609-A22.4"}],"container-title":["Vacuum"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0042207X01003396?httpAccept=text\/xml","content-type":"text\/xml","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0042207X01003396?httpAccept=text\/plain","content-type":"text\/plain","content-version":"vor","intended-application":"text-mining"}],"deposited":{"date-parts":[[2020,1,7]],"date-time":"2020-01-07T21:04:45Z","timestamp":1578431085000},"score":1,"resource":{"primary":{"URL":"https:\/\/linkinghub.elsevier.com\/retrieve\/pii\/S0042207X01003396"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2002,1]]},"references-count":27,"journal-issue":{"issue":"3-4","published-print":{"date-parts":[[2002,1]]}},"alternative-id":["S0042207X01003396"],"URL":"https:\/\/doi.org\/10.1016\/s0042-207x(01)00339-6","relation":{},"ISSN":["0042-207X"],"issn-type":[{"value":"0042-207X","type":"print"}],"subject":[],"published":{"date-parts":[[2002,1]]}}}