{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,2,23]],"date-time":"2026-02-23T05:59:43Z","timestamp":1771826383843,"version":"3.50.1"},"reference-count":18,"publisher":"Elsevier BV","issue":"2","license":[{"start":{"date-parts":[[2000,2,1]],"date-time":"2000-02-01T00:00:00Z","timestamp":949363200000},"content-version":"tdm","delay-in-days":0,"URL":"https:\/\/www.elsevier.com\/tdm\/userlicense\/1.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Vacuum"],"published-print":{"date-parts":[[2000,2]]},"DOI":"10.1016\/s0042-207x(99)00199-2","type":"journal-article","created":{"date-parts":[[2002,7,25]],"date-time":"2002-07-25T21:18:48Z","timestamp":1027631928000},"page":"143-148","source":"Crossref","is-referenced-by-count":83,"title":["Characterisation of ZrO2 films prepared by rf reactive sputtering at different O2 concentrations in the sputtering gases"],"prefix":"10.1016","volume":"56","author":[{"given":"Pengtao","family":"Gao","sequence":"first","affiliation":[]},{"given":"L.J","family":"Meng","sequence":"additional","affiliation":[]},{"given":"M.P","family":"dos Santos","sequence":"additional","affiliation":[]},{"given":"V","family":"Teixeira","sequence":"additional","affiliation":[]},{"given":"M","family":"Andritschky","sequence":"additional","affiliation":[]}],"member":"78","reference":[{"key":"10.1016\/S0042-207X(99)00199-2_BIB1","doi-asserted-by":"crossref","first-page":"690","DOI":"10.1016\/0040-6090(90)90220-8","volume":"193\/194","author":"Ghanashy Krishna","year":"1990","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB2","doi-asserted-by":"crossref","first-page":"275","DOI":"10.1016\/0040-6090(90)90049-J","volume":"187","author":"Duparre","year":"1990","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB3","first-page":"946","volume":"323","author":"Bonlonz","year":"1998","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB4","doi-asserted-by":"crossref","first-page":"946","DOI":"10.1364\/AO.13.000946","volume":"13","author":"Colman","year":"1974","journal-title":"Appl Opt"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB5","doi-asserted-by":"crossref","first-page":"233","DOI":"10.1016\/0040-6090(87)90185-4","volume":"153","author":"Nouya Iwamoto","year":"1987","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB6","doi-asserted-by":"crossref","first-page":"248","DOI":"10.1016\/0040-6090(92)90132-U","volume":"207","author":"Krishna","year":"1992","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB7","doi-asserted-by":"crossref","first-page":"411","DOI":"10.1016\/S0257-8972(97)00661-0","volume":"100\/101","author":"Gottmann","year":"1998","journal-title":"Surf and Coat Technol"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB8","doi-asserted-by":"crossref","first-page":"1436","DOI":"10.1007\/BF00720215","volume":"8","author":"Biswas","year":"1989","journal-title":"J Materal Sci Lett"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB9","series-title":"Elements of X-ray Diffraction","author":"Cullity","year":"1978"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB10","series-title":"Residual stress","author":"Noyan","year":"1978"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB11","first-page":"213","volume":"25","author":"Teixeira","year":"1993","journal-title":"High Temperature\u2013High Pressures"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB12","doi-asserted-by":"crossref","first-page":"1047","DOI":"10.1016\/0042-207X(94)90019-1","volume":"45","author":"Andritschky","year":"1994","journal-title":"Vacuum"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB13","doi-asserted-by":"crossref","first-page":"1214","DOI":"10.1088\/0022-3735\/16\/12\/023","volume":"16","author":"Swanepoel","year":"1983","journal-title":"J Phys E"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB14","doi-asserted-by":"crossref","first-page":"125","DOI":"10.1016\/0040-6090(92)90617-K","volume":"217","author":"Lubig","year":"1992","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB15","doi-asserted-by":"crossref","first-page":"363","DOI":"10.1016\/S0040-6090(97)00579-8","volume":"308\/309","author":"Mehner","year":"1997","journal-title":"Thin Solid Films"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB16","doi-asserted-by":"crossref","first-page":"33","DOI":"10.1016\/0040-6090(94)06274-O","volume":"254","author":"Kim","year":"1995","journal-title":"Thin Solid Films"},{"issue":"3","key":"10.1016\/S0042-207X(99)00199-2_BIB17","doi-asserted-by":"crossref","first-page":"1235","DOI":"10.1116\/1.576261","volume":"A7","author":"Chee-Kin Kwok","year":"1989","journal-title":"J Vac Sci Technol"},{"key":"10.1016\/S0042-207X(99)00199-2_BIB18","doi-asserted-by":"crossref","first-page":"61","DOI":"10.1016\/0040-6090(70)90052-0","volume":"5","author":"Heitmann","year":"1970","journal-title":"Thin Solid Films"}],"container-title":["Vacuum"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0042207X99001992?httpAccept=text\/xml","content-type":"text\/xml","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/api.elsevier.com\/content\/article\/PII:S0042207X99001992?httpAccept=text\/plain","content-type":"text\/plain","content-version":"vor","intended-application":"text-mining"}],"deposited":{"date-parts":[[2019,4,15]],"date-time":"2019-04-15T18:26:37Z","timestamp":1555352797000},"score":1,"resource":{"primary":{"URL":"https:\/\/linkinghub.elsevier.com\/retrieve\/pii\/S0042207X99001992"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2000,2]]},"references-count":18,"journal-issue":{"issue":"2","published-print":{"date-parts":[[2000,2]]}},"alternative-id":["S0042207X99001992"],"URL":"https:\/\/doi.org\/10.1016\/s0042-207x(99)00199-2","relation":{},"ISSN":["0042-207X"],"issn-type":[{"value":"0042-207X","type":"print"}],"subject":[],"published":{"date-parts":[[2000,2]]}}}