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Monolayer transition metal dichalcogenides (TMDCs) are promising active layers for such systems but suffer from intrinsically limited light absorption. Moreover, strategies for enhancing light absorption in monolayer TMDCs without compromising their electronic quality remain limited, as direct deposition can introduce defects and interfacial disorder. Here, we report deposition-free vdW lamination of an anti-reflective MgF2 nanomembrane onto monolayer MoS2. Uniform MgF2 nanomembranes are formed on an amorphous carbon monolayer (ACM) template and cleanly released at the MgF2\/ACM interface, enabling integration without compromising the integrity of monolayer MoS2 while enhancing its photoresponse. Applied to mixed-dimensional 3D\/2D\/3D stacked MgF2\/MoS2\/Si photodetectors, this approach enables broadband visible-to-near-infrared detection with a maximum responsivity of 51.36 A\/W and a measured-noise-based detectivity of 2.27 \u00d7 1012 Jones, demonstrating compatibility with vertically stacked 3DHI platforms and effective photoresponse enhancement.<\/jats:p>","DOI":"10.1021\/acs.nanolett.6c02513","type":"journal-article","created":{"date-parts":[[2026,8,31]],"date-time":"2026-08-31T21:22:13Z","timestamp":1788211333000},"page":"11721-11730","source":"Crossref","is-referenced-by-count":0,"title":["Deposition-Free\nAnti-Reflective Nanomembrane Lamination\nfor Ultrathin Photodetectors"],"prefix":"10.1021","volume":"26","author":[{"given":"Hyung Jun","family":"Kwun","sequence":"first","affiliation":[{"name":"Sungkyunkwan University , , ,","place":["Suwon, Republic of Korea, 16419"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Soheil","family":"Ghods","sequence":"additional","affiliation":[{"name":"Sungkyunkwan University , , ,","place":["Suwon, Republic of Korea, 16419"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Ho-Chan","family":"Jang","sequence":"additional","affiliation":[{"name":"Sungkyunkwan University , , ,","place":["Suwon, Republic of Korea, 16419"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jungwoo","family":"Bong","sequence":"additional","affiliation":[{"name":"Sungkyunkwan University , , ,","place":["Suwon, Republic of Korea, 16419"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Dae Woong","family":"Seok","sequence":"additional","affiliation":[{"name":"Sungkyunkwan University , , ,","place":["Suwon, Republic of Korea, 16419"]},{"name":"Nano-convergence Manufacturing Research Division, Korea Institute of Machinery and Materials (KIMM) , , ,","place":["Daejeon, Republic of Korea, 34103"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Seung-Il","family":"Kim","sequence":"additional","affiliation":[{"name":"Washington University in St. Louis , , , ,","place":["St. Louis, Missouri, United States, 63130"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jun-Hui","family":"Choi","sequence":"additional","affiliation":[{"name":"Sungkyunkwan University , , ,","place":["Suwon, Republic of Korea, 16419"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Sang-Hwa","family":"Hyun","sequence":"additional","affiliation":[{"name":"Sungkyunkwan University , , ,","place":["Suwon, Republic of Korea, 16419"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Mukkath Joseph","family":"Josline","sequence":"additional","affiliation":[{"name":"Sungkyunkwan University , , ,","place":["Suwon, Republic of Korea, 16419"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-9590-1623","authenticated-orcid":true,"given":"Hyeong Gi","family":"Park","sequence":"additional","affiliation":[{"name":"Daewon University College , , 316 Daehak-ro , , ,","place":["Jecheon-si, Republic of Korea, 27135"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Sang Hoon","family":"Lee","sequence":"additional","affiliation":[{"name":"Jeonbuk National University , , ,","place":["Jeonju, Republic of Korea, 54896"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-0855-5233","authenticated-orcid":true,"given":"Woonhyuk","family":"Baek","sequence":"additional","affiliation":[{"name":"Jeonbuk National University , , ,","place":["Jeonju, Republic of Korea, 54896"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-3019-0584","authenticated-orcid":true,"given":"Sukang","family":"Bae","sequence":"additional","affiliation":[{"name":"Korea Institute of Science and Technology (KIST) , , ,","place":["Jeollabuk-do, Republic of Korea, 55324"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-1518-7635","authenticated-orcid":true,"given":"Sang-Hoon","family":"Bae","sequence":"additional","affiliation":[{"name":"Washington University in St. Louis , , , ,","place":["St. Louis, Missouri, United States, 63130"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-4939-1973","authenticated-orcid":true,"given":"Kwang-Seop","family":"Kim","sequence":"additional","affiliation":[{"name":"Nano-convergence Manufacturing Research Division, Korea Institute of Machinery and Materials (KIMM) , , ,","place":["Daejeon, Republic of Korea, 34103"]},{"name":"University of Science & Technology (UST) , , 217 Gajeong-ro , , ,","place":["Yuseong-gu, Daejeon, Republic of Korea, 34113"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Ji-Yun","family":"Moon","sequence":"additional","affiliation":[{"name":"Dongguk University , , ,","place":["Seoul, Republic of Korea, 04620"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-5117-8923","authenticated-orcid":true,"given":"Jae-Hyun","family":"Lee","sequence":"additional","affiliation":[{"name":"Sungkyunkwan University , , ,","place":["Suwon, Republic of Korea, 16419"]},{"name":"Sungkyunkwan University , , ,","place":["Suwon, Republic of Korea, 16419"]},{"name":"Institute for Functional Intelligent Materials, National University of Singapore , ,","place":["Singapore, Singapore, 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Lett."},{"issue":"10","key":"2026090911333099100_cit12","doi-asserted-by":"publisher","first-page":"1902145","DOI":"10.1002\/admi.201902145","article-title":"Effect\nof the Degree of the Gate-Dielectric Surface Roughness on the Performance\nof Bottom-Gate Organic Thin-Film Transistors","volume":"7","author":"Geiger","year":"2020","journal-title":"Advanced Materials Interfaces"},{"issue":"39","key":"2026090911333099100_cit13","doi-asserted-by":"publisher","first-page":"26911","DOI":"10.1021\/acsnano.4c08554","article-title":"Liquid\nMetal Oxide-Assisted Integration of High-k Dielectrics and Metal Contacts\nfor Two-Dimensional Electronics","volume":"18","author":"Venkatakrishnarao","year":"2024","journal-title":"ACS Nano"},{"issue":"11","key":"2026090911333099100_cit14","doi-asserted-by":"publisher","first-page":"10354","DOI":"10.1021\/nn404775u","article-title":"HfO2 on MoS2 by Atomic Layer\nDeposition: Adsorption Mechanisms and Thickness Scalability","volume":"7","author":"McDonnell","year":"2013","journal-title":"ACS Nano"},{"issue":"18","key":"2026090911333099100_cit15","doi-asserted-by":"publisher","first-page":"2207901","DOI":"10.1002\/adma.202207901","article-title":"Gate Dielectrics\nIntegration for 2D Electronics: Challenges, Advances, and Outlook","volume":"35","author":"Yang","year":"2023","journal-title":"Adv. Mater."},{"issue":"8","key":"2026090911333099100_cit16","doi-asserted-by":"publisher","first-page":"498","DOI":"10.1038\/s41578-023-00558-w","article-title":"Photonic van Der Waals Integration\nfrom 2D Materials to 3D Nanomembranes","volume":"8","author":"Meng","year":"2023","journal-title":"Nat.\nRev. Mater."},{"issue":"19","key":"2026090911333099100_cit17","doi-asserted-by":"publisher","first-page":"2826","DOI":"10.1021\/acs.accounts.4c00425","article-title":"Atomic Spalling\nof a van Der Waals\nNanomembrane","volume":"57","author":"Moon","year":"2024","journal-title":"Acc. Chem. Res."},{"issue":"5","key":"2026090911333099100_cit18","doi-asserted-by":"publisher","first-page":"2401551","DOI":"10.1002\/smtd.202401551","article-title":"Freestanding Wide-Bandgap\nSemiconductors Nanomembrane from 2D to 3D Materials and Their Applications","volume":"9","author":"Kim","year":"2025","journal-title":"Small Methods"},{"key":"2026090911333099100_cit19","doi-asserted-by":"publisher","DOI":"10.1002\/adma.202513080","article-title":"Crack-Free Transfer of Wafer-Scale Freestanding Single-Crystalline\nNanomembranes Enabled by Elastically Graded Polymer","volume":"38","author":"Moon","year":"2026","journal-title":"Adv. Mater."},{"issue":"1","key":"2026090911333099100_cit20","doi-asserted-by":"publisher","first-page":"2340","DOI":"10.1038\/s41467-023-37887-x","article-title":"Wafer-Scale\nHigh-\u03ba Dielectrics for Two-Dimensional Circuits via van Der\nWaals Integration","volume":"14","author":"Lu","year":"2023","journal-title":"Nat. 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Commun."},{"issue":"6","key":"2026090911333099100_cit37","doi-asserted-by":"publisher","first-page":"10587","DOI":"10.1021\/acsnano.1c03296","article-title":"Impact of\n2D-3D Heterointerface on Remote Epitaxial Interaction through Graphene","volume":"15","author":"Kim","year":"2021","journal-title":"ACS Nano"},{"issue":"1","key":"2026090911333099100_cit38","doi-asserted-by":"publisher","first-page":"40","DOI":"10.1038\/s43586-022-00122-w","article-title":"Remote Epitaxy","volume":"2","author":"Kim","year":"2022","journal-title":"Nat. Rev. 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