{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,10,20]],"date-time":"2026-10-20T12:57:14Z","timestamp":1792501034693,"version":"4.5.0"},"reference-count":48,"publisher":"American Chemical Society (ACS)","issue":"34","license":[{"start":{"date-parts":[[2026,8,18]],"date-time":"2026-08-18T00:00:00Z","timestamp":1787011200000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2026,8,18]],"date-time":"2026-08-18T00:00:00Z","timestamp":1787011200000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"},{"start":{"date-parts":[[2026,8,18]],"date-time":"2026-08-18T00:00:00Z","timestamp":1787011200000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-045"}],"funder":[{"DOI":"10.13039\/501100001809","name":"National Natural Science Foundation of China","doi-asserted-by":"publisher","award":["12372112"],"award-info":[{"award-number":["12372112"]}],"id":[{"id":"10.13039\/501100001809","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100002858","name":"China Postdoctoral Science Foundation","doi-asserted-by":"publisher","award":["BX20260136"],"award-info":[{"award-number":["BX20260136"]}],"id":[{"id":"10.13039\/501100002858","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100010877","name":"Science, Technology and Innovation Commission of Shenzhen Municipality","doi-asserted-by":"publisher","award":["JCYJ20200109150608043"],"award-info":[{"award-number":["JCYJ20200109150608043"]}],"id":[{"id":"10.13039\/501100010877","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100010877","name":"Science, Technology and Innovation Commission of Shenzhen Municipality","doi-asserted-by":"publisher","award":["KQTD20240729102211015"],"award-info":[{"award-number":["KQTD20240729102211015"]}],"id":[{"id":"10.13039\/501100010877","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100012166","name":"National Key Research and Development Program of China","doi-asserted-by":"publisher","award":["2023YFB4603601"],"award-info":[{"award-number":["2023YFB4603601"]}],"id":[{"id":"10.13039\/501100012166","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2026,9,2]]},"abstract":"<jats:title>Abstract<\/jats:title>\n                  <jats:p>Interfacial contaminants remain a major technical challenge for van der Waals (vdW) junctions, severely degrading device performance. Given the inherent difficulty of fabricating contaminant-free vdW interfaces, developing effective postfabrication cleaning technologies is crucial for restoring interfacial quality. Existing technologies include annealing, which results in incomplete removal, and AFM-tip squeezing, which is time-consuming and costly. Here, we invent a complete, rapid, and cost-effective electric-field-assisted cleaning method that simultaneously delivers high spatial and temporal efficiency. For a microscale graphite interface, this method removes over 95% of the contaminant coverage within just 20 ms, restoring the interfacial conductivity to its clean-state level without introducing defects. Compared with previous methods, our method achieves a comparable or higher level of contaminant removal while reducing the required time by at least 4 orders of magnitude. We further demonstrate its practical applicability using a microscale superlubric Schottky generator, which transitions from an insulative to a generating state after cleaning. Importantly, the interfacial cleanliness level achieved by our method satisfies U.S. cleanliness standards for aerospace, semiconductor manufacturing, and medical devices, suggesting its broad applicability across multiple industries.<\/jats:p>","DOI":"10.1021\/acs.nanolett.6c02887","type":"journal-article","created":{"date-parts":[[2026,8,18]],"date-time":"2026-08-18T19:02:50Z","timestamp":1787079770000},"page":"11452-11458","source":"Crossref","is-referenced-by-count":1,"title":["Highly Efficient\nPostprocessing Cleaning of van der\nWaals Devices"],"prefix":"10.1021","volume":"26","author":[{"given":"Zhaokuan","family":"Yu","sequence":"first","affiliation":[{"name":"Tsinghua Shenzhen International Graduate School , , ,","place":["Shenzhen, China, 518055"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yuqing","family":"He","sequence":"additional","affiliation":[{"name":"Tsinghua University , , ,","place":["Beijing, China, 100084"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Juntai","family":"Wu","sequence":"additional","affiliation":[{"name":"Tsinghua University , , ,","place":["Beijing, China, 100084"]},{"name":"Tsinghua University , , ,","place":["Beijing, China, 100084"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Xin","family":"Lu","sequence":"additional","affiliation":[{"name":"Zhejiang University , , ,","place":["Hangzhou, China, 310027"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-0463-9314","authenticated-orcid":true,"given":"Quanshui","family":"Zheng","sequence":"additional","affiliation":[{"name":"Tsinghua Shenzhen International Graduate School , , ,","place":["Shenzhen, China, 518055"]},{"name":"Tsinghua University , , ,","place":["Beijing, China, 100084"]},{"name":"Research Institute of Tsinghua University in Shenzhen , , ,","place":["Shenzhen, China, 518057"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-6016-286X","authenticated-orcid":true,"given":"Ming","family":"Ma","sequence":"additional","affiliation":[{"name":"Tsinghua University , , ,","place":["Beijing, China, 100084"]},{"name":"Tsinghua University , , ,","place":["Beijing, China, 100084"]},{"name":"Research Institute of Tsinghua University in Shenzhen , , ,","place":["Shenzhen, China, 518057"]}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"316","published-online":{"date-parts":[[2026,8,18]]},"reference":[{"key":"2026090311560990600_cit1","doi-asserted-by":"publisher","first-page":"112","DOI":"10.1038\/s42254-018-0016-0","article-title":"Van der Waals Heterostructures\nCombining Graphene and Hexagonal Boron Nitride","volume":"1","author":"Yankowitz","year":"2019","journal-title":"Nature Reviews Physics"},{"key":"2026090311560990600_cit2","doi-asserted-by":"publisher","first-page":"7230","DOI":"10.1021\/acsnano.7b03148","article-title":"High Photovoltaic\nQuantum Efficiency\nin Ultrathin van der Waals Heterostructures","volume":"11","author":"Wong","year":"2017","journal-title":"ACS Nano"},{"key":"2026090311560990600_cit3","unstructured":"Analysis from the Web of Science\nCore Collection, topic with \u201cvan der Waals interface\u201d\nor \u201cvan der Waals contact\u201d or \u201cvan der Waals\njunction\u201d or \u201cvan der Waals heterojunction\u201d or\n\u201cvan der Waals homojunction\u201d or \u201cvan der Waals\nheterostructure\u201d or \u201cvan der Waals homostructure\u201d\nor \u201cvan der Waals device\u201d 2021\u20132025."},{"key":"2026090311560990600_cit4","doi-asserted-by":"publisher","first-page":"ix","DOI":"10.1016\/B978-0-12-816081-7.09987-3","author":"Kohli","year":"2019","journal-title":"Developments in Surface\nContamination and Cleaning Methods for Assessment and Verification\nof Cleanliness of Surfaces and Characterization of Surface Contaminants\nVolume 12 Introduction"},{"key":"2026090311560990600_cit5","unstructured":"SEMI.\n          . SEMI E195-0925: Test Method Using\nAdhesive Replacement\nSubstrates to Assess Particulate Surface Contamination on Critical\nChamber Components; Semiconductor\nEquipment and Materials International (SEMI), 2019."},{"key":"2026090311560990600_cit6","unstructured":"Aamir, M. A.\n          \n          ANSI\/AAMI ST98:\n2022 Cleaning Validation for Healthcare Products; Association for the Advancement of Medical Instrumentation (AAMI), 2022."},{"key":"2026090311560990600_cit7","doi-asserted-by":"publisher","DOI":"10.1093\/nsr\/nwae405","article-title":"Controlled van der\nWaals Epitaxy of 2D Single-Crystal\nMolecular Film","volume":"11","author":"Liu","year":"2024","journal-title":"National Science Review"},{"key":"2026090311560990600_cit8","doi-asserted-by":"publisher","DOI":"10.1038\/s41586-023-06404-x","article-title":"Stack Growth of Wafer-Scale\nvan der Waals Superconductor Heterostructures","volume":"621","author":"Zhou","year":"2023","journal-title":"Nature"},{"key":"2026090311560990600_cit9","doi-asserted-by":"publisher","first-page":"41","DOI":"10.1038\/s41586-021-04173-z","article-title":"Reproducibility in\nthe Fabrication and Physics of Moire Materials","volume":"602","author":"Lau","year":"2022","journal-title":"Nature"},{"key":"2026090311560990600_cit10","doi-asserted-by":"publisher","first-page":"14841","DOI":"10.1021\/acsnano.4c00590","article-title":"Transfer of 2D Films: From Imperfection\nto Perfection","volume":"18","author":"Pham","year":"2024","journal-title":"ACS Nano"},{"key":"2026090311560990600_cit11","doi-asserted-by":"publisher","first-page":"1462","DOI":"10.1021\/nl304420b","article-title":"Enhancement of the\nElectrical Properties of Graphene Grown by Chemical Vapor Deposition\nvia Controlling the Effects of Polymer Residue","volume":"13","author":"Suk","year":"2013","journal-title":"Nano Lett."},{"key":"2026090311560990600_cit12","doi-asserted-by":"publisher","first-page":"3270","DOI":"10.1021\/nl5006542","article-title":"Electronic\nProperties of Graphene Encapsulated with Different Two-Dimensional\nAtomic Crystals","volume":"14","author":"Kretinin","year":"2014","journal-title":"Nano Lett."},{"key":"2026090311560990600_cit13","doi-asserted-by":"publisher","first-page":"10379","DOI":"10.1021\/acsami.8b01224","article-title":"Nano-\u2033Squeegee\u2033\nfor the Creation of Clean\n2D Material Interfaces","volume":"10","author":"Rosenberger","year":"2018","journal-title":"ACS Appl. Mater. Interfaces"},{"key":"2026090311560990600_cit14","doi-asserted-by":"publisher","first-page":"81","DOI":"10.1038\/s41586-019-0986-9","article-title":"Resonantly\nHybridized Excitons in Moire Superlattices in van der Waals Heterostructures","volume":"567","author":"Alexeev","year":"2019","journal-title":"Nature"},{"key":"2026090311560990600_cit15","doi-asserted-by":"publisher","first-page":"5635","DOI":"10.1021\/nn301572c","article-title":"Hysteresis in\nSingle-Layer MoS2 Field Effect Transistors","volume":"6","author":"Late","year":"2012","journal-title":"ACS Nano"},{"key":"2026090311560990600_cit16","doi-asserted-by":"publisher","first-page":"363","DOI":"10.1021\/acsnano.2c08693","article-title":"General Synthesis\nof 2D Magnetic Transition Metal Dihalides via Trihalide Reduction","volume":"17","author":"Jiang","year":"2023","journal-title":"ACS Nano"},{"key":"2026090311560990600_cit17","doi-asserted-by":"publisher","first-page":"323","DOI":"10.1038\/s41586-019-1013-x","article-title":"Van der Waals Integration before\nand beyond Two-Dimensional Materials","volume":"567","author":"Liu","year":"2019","journal-title":"Nature"},{"key":"2026090311560990600_cit18","doi-asserted-by":"publisher","DOI":"10.1002\/adma.202303014","article-title":"Toward Clean 2D Materials\nand Devices: Recent Progress in Transfer and Cleaning Methods","volume":"36","author":"Dong","year":"2024","journal-title":"Adv. Mater."},{"key":"2026090311560990600_cit19","doi-asserted-by":"publisher","first-page":"191","DOI":"10.1016\/j.vacuum.2017.01.004","article-title":"Graphene on Graphene\nFormation From PMMA Residues During Annealing","volume":"137","author":"Karlsson","year":"2017","journal-title":"Vacuum"},{"key":"2026090311560990600_cit20","doi-asserted-by":"publisher","first-page":"82","DOI":"10.1016\/j.carbon.2014.11.040","article-title":"Optimized Graphene Transfer: Influence of Polymethylmethacrylate\n(PMMA) Layer Concentration and Baking Time on Graphene Final Performance","volume":"84","author":"Barin","year":"2015","journal-title":"Carbon"},{"key":"2026090311560990600_cit21","doi-asserted-by":"publisher","DOI":"10.1063\/1.3549183","article-title":"Contacting graphene","volume":"98","author":"Robinson","year":"2011","journal-title":"Appl. Phys.\nLett."},{"key":"2026090311560990600_cit22","doi-asserted-by":"publisher","first-page":"4013","DOI":"10.1021\/acsomega.0c05934","article-title":"Tip-Based Cleaning\nand Smoothing Improves Performance in Monolayer MoS2 Devices","volume":"6","author":"Chen","year":"2021","journal-title":"Acs Omega"},{"key":"2026090311560990600_cit23","doi-asserted-by":"publisher","DOI":"10.1515\/ntrev-2025-0154","article-title":"AFM: An Important Enabling Technology\nfor 2D Materials and Devices","volume":"14","author":"Uzoma","year":"2025","journal-title":"Nanotechnol. Rev."},{"key":"2026090311560990600_cit24","doi-asserted-by":"crossref","unstructured":"Ding, X. L.; Qiao, B.; Chen, H. H.; Uzoma, P. C.; Xu, Y.; Hu, H. A.\n          Damage-Free Cleaning of 2D van der\nWaals Heterostructures.  IEEE 23rd International\nConference on Nanotechnology (NANO),\nJeju, South Korea; 2023, 899\u2013903.","DOI":"10.1109\/NANO58406.2023.10231217"},{"key":"2026090311560990600_cit25","doi-asserted-by":"publisher","first-page":"12653","DOI":"10.1021\/acsanm.5c01704","article-title":"Effective Interfacial Bubble Elimination\nin 2D Heterostructures via\nAtomic Force Microscope","volume":"8","author":"Wu","year":"2025","journal-title":"ACS Applied Nano Materials"},{"key":"2026090311560990600_cit26","doi-asserted-by":"publisher","first-page":"1370","DOI":"10.1021\/acsnano.0c08642","article-title":"Enhanced Exciton-Exciton\nCollisions\nin an Ultraflat Monolayer MoSe2 Prepared through Deterministic\nFlattening","volume":"15","author":"Hotta","year":"2021","journal-title":"ACS Nano"},{"key":"2026090311560990600_cit27","doi-asserted-by":"publisher","first-page":"94","DOI":"10.1109\/66.136269","article-title":"A Standardized\nMethod for CMOS Unit Process-Development","volume":"5","author":"Weber","year":"1992","journal-title":"IEEE\nTransactions on Semiconductor Manufacturing"},{"key":"2026090311560990600_cit28","doi-asserted-by":"publisher","first-page":"1822","DOI":"10.1039\/C6CS00915H","article-title":"Raman Spectroscopy\nof Graphene-Based Materials and its Applications in Related Devices","volume":"47","author":"Wu","year":"2018","journal-title":"Chem. Soc. Rev."},{"key":"2026090311560990600_cit29","doi-asserted-by":"publisher","DOI":"10.1103\/PhysRevLett.132.096201","article-title":"Ultrahigh Critical Current Density across Sliding Electrical\nContacts in Structural Superlubric State","volume":"132","author":"Wu","year":"2024","journal-title":"Phys.\nRev. Lett."},{"key":"2026090311560990600_cit30","doi-asserted-by":"publisher","DOI":"10.1093\/nsr\/nwae019","article-title":"The Anomalous Effect\nof Electric Field on Friction for Microscale Structural Superlubric\nGraphite\/Au Contact","volume":"11","author":"Wang","year":"2024","journal-title":"National Science Review"},{"key":"2026090311560990600_cit31","doi-asserted-by":"publisher","first-page":"16159","DOI":"10.1021\/acs.nanolett.4c05174","article-title":"The Evolution\nof Nanoscale Third Body Layer Revealed by Graphite Structural Superlubric\nContact","volume":"24","author":"He","year":"2024","journal-title":"Nano Lett."},{"key":"2026090311560990600_cit32","doi-asserted-by":"publisher","first-page":"30","DOI":"10.1016\/j.carbon.2018.10.094","article-title":"Atomic-Force\nMicroscopy Study of\nSelf-assembled Atmospheric Contamination on Graphene and Graphite\nSurfaces","volume":"143","author":"Temiryazev","year":"2019","journal-title":"Carbon"},{"key":"2026090311560990600_cit33","doi-asserted-by":"publisher","first-page":"8","DOI":"10.1016\/j.elspec.2019.06.001","article-title":"Airborne Contamination\nof Graphite as Analyzed by Ultra-violet Photoelectron Spectroscopy","volume":"235","author":"Salim","year":"2019","journal-title":"J. Electron Spectrosc. Relat. Phenom."},{"key":"2026090311560990600_cit34","doi-asserted-by":"publisher","DOI":"10.1002\/adma.202108425","article-title":"Fermi Level\nPinning Dependent 2D Semiconductor Devices: Challenges and Prospects","volume":"34","author":"Liu","year":"2022","journal-title":"Adv. Mater."},{"key":"2026090311560990600_cit35","doi-asserted-by":"publisher","DOI":"10.1038\/srep13743","article-title":"Electrically Tunable and Negative Schottky Barriers\nin Multi-layered Graphene\/MoS2 Heterostructured Transistors","volume":"5","author":"Qiu","year":"2015","journal-title":"Sci. Rep."},{"key":"2026090311560990600_cit36","doi-asserted-by":"publisher","DOI":"10.1103\/RevModPhys.96.011002","article-title":"Colloquium: Sliding\nand Pinning in Structurally Lubric 2D Material Interfaces","volume":"96","author":"Wang","year":"2024","journal-title":"Rev. Mod. Phys."},{"key":"2026090311560990600_cit37","doi-asserted-by":"publisher","first-page":"485","DOI":"10.1038\/s41586-018-0704-z","article-title":"Structural Superlubricity\nand Ultralow Friction Across the Length Scales","volume":"563","author":"Hod","year":"2018","journal-title":"Nature"},{"key":"2026090311560990600_cit38","doi-asserted-by":"publisher","DOI":"10.1093\/nsr\/nwab109","article-title":"100 km Wear-free\nSliding Achieved by Microscale Superlubric Graphite\/DLC Heterojunctions\nunder Ambient Conditions","volume":"9","author":"Peng","year":"2022","journal-title":"National Science Review"},{"key":"2026090311560990600_cit39","doi-asserted-by":"publisher","first-page":"57","DOI":"10.1016\/S0304-3991(02)00297-8","article-title":"Some Comments\non Models for Field\nEnhancement","volume":"95","author":"Forbes","year":"2003","journal-title":"Ultramicroscopy"},{"key":"2026090311560990600_cit40","doi-asserted-by":"publisher","DOI":"10.1103\/PhysRevLett.100.067205","article-title":"Self-Retracting\nMotion of Graphite Microflakes","volume":"100","author":"Zheng","year":"2008","journal-title":"Phys. Rev. Lett."},{"key":"2026090311560990600_cit41","doi-asserted-by":"publisher","DOI":"10.1016\/j.jmps.2022.105063","article-title":"Structural\nsuperlubricity with a contaminant-rich interface","volume":"169","author":"Wang","year":"2022","journal-title":"Journal of the Mechanics and Physics of Solids"},{"key":"2026090311560990600_cit42","unstructured":"Merck\nPerformance Materials, AZP4000 Series Photoresists: Technical Data\nSheet, AZ Electronic Materials\/Merck, dielectric constant of thermally\ncured films."},{"key":"2026090311560990600_cit43","volume-title":"CRC Handbook of Chemistry\nand Physics","author":"Lide","year":"2009","edition":"89"},{"key":"2026090311560990600_cit44","doi-asserted-by":"publisher","first-page":"12179","DOI":"10.1021\/acs.nanolett.4c03084","article-title":"On-Device\nPressure-Tunable Moving\nSchottky Contacts","volume":"24","author":"Yu","year":"2024","journal-title":"Nano Lett."},{"key":"2026090311560990600_cit45","doi-asserted-by":"publisher","DOI":"10.1088\/1361-648X\/ad5507","article-title":"Edge-enhanced super\nmicrogenerator based on a two-dimensional Schottky\njunction","volume":"36","author":"Yu","year":"2024","journal-title":"J. Phys.: Condens. Matter"},{"key":"2026090311560990600_cit46","doi-asserted-by":"publisher","first-page":"25578","DOI":"10.1021\/acsami.9b06594","article-title":"Chemical Identification\nof Interlayer\nContaminants within van der Waals Heterostructures","volume":"11","author":"Schwartz","year":"2019","journal-title":"ACS Appl. Mater. Interfaces"},{"key":"2026090311560990600_cit47","doi-asserted-by":"publisher","first-page":"14182","DOI":"10.1021\/acsnano.9b06992","article-title":"Reliable\nPostprocessing Improvement of van der Waals Heterostructures","volume":"13","author":"Kim","year":"2019","journal-title":"ACS Nano"},{"key":"2026090311560990600_cit48","doi-asserted-by":"publisher","first-page":"3095","DOI":"10.1039\/D4NR03583F","article-title":"Nano-spherical Tip-based\nSmoothing with Minimal Damage for 2D van der Waals Heterostructures","volume":"17","author":"Ding","year":"2025","journal-title":"Nanoscale"}],"container-title":["Nano Letters"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/pubs.acs.org\/doi\/pdf\/10.1021\/acs.nanolett.6c02887","content-type":"application\/pdf","content-version":"vor","intended-application":"unspecified"},{"URL":"https:\/\/pubs.acs.org\/nalefd\/article-pdf\/26\/34\/11452\/66854579\/acs.nanolett.6c02887.pdf","content-type":"application\/pdf","content-version":"vor","intended-application":"syndication"},{"URL":"https:\/\/pubs.acs.org\/nalefd\/article-pdf\/26\/34\/11452\/66854579\/acs.nanolett.6c02887.pdf","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2026,9,3]],"date-time":"2026-09-03T16:21:53Z","timestamp":1788452513000},"score":1,"resource":{"primary":{"URL":"https:\/\/pubs.acs.org\/nalefd\/article\/26\/34\/11452\/5275753\/Highly-Efficient-Postprocessing-Cleaning-of-van"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2026,8,18]]},"references-count":48,"journal-issue":{"issue":"34","published-online":{"date-parts":[[2026,8,18]]},"published-print":{"date-parts":[[2026,9,2]]}},"URL":"https:\/\/doi.org\/10.1021\/acs.nanolett.6c02887","relation":{},"ISSN":["1530-6984","1530-6992"],"issn-type":[{"value":"1530-6984","type":"print"},{"value":"1530-6992","type":"electronic"}],"subject":[],"published":{"date-parts":[[2026,8,18]]}}}