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Instead, such atomic substitution can be more effectively achieved in situ through chemical vapor deposition synthesis. However, the mechanistic details governing this growth process have remained poorly understood. Using V-doped monolayer MoS2 as a model system, this work elucidates its growth mechanism and doping tunability facilitated by a potassium iodide (KI) promoter. A Raman spectroscopic probe, established through correlation with scanning transmission electron microscopy, was developed to quantify the V dopant concentration and distribution uniformity. Systematic growth experiments and detailed characterizations revealed that doping saturation levels were significantly below the precursor feeding ratio. This saturation phenomenon could be modulated by KI dosage following a Boltzmann sigmoid function, indicative of an iodide-activated doping mechanism compatible with the edge passivation substitution (EPS) model. Our findings advance the doping theory in low-dimensional systems and provide essential insights into achieving controlled heteroatom substitution in 2D semiconductors.<\/jats:p>","DOI":"10.1021\/acs.nanolett.6c03019","type":"journal-article","created":{"date-parts":[[2026,10,5]],"date-time":"2026-10-05T11:02:28Z","timestamp":1791198148000},"page":"13836-13842","source":"Crossref","is-referenced-by-count":0,"title":["Boltzmann Sigmoidal\nModulation of Vanadium Doping\nin Monolayer MoS2 by Potassium Iodide"],"prefix":"10.1021","volume":"26","author":[{"given":"Yuanyuan","family":"Qiu","sequence":"first","affiliation":[{"name":"ShanghaiTech University , , ,","place":["Shanghai, China, 201210"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Bin","family":"Hua","sequence":"additional","affiliation":[{"name":"ShanghaiTech University , , ,","place":["Shanghai, China, 201210"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-8429-7160","authenticated-orcid":true,"given":"Zhenping","family":"Wang","sequence":"additional","affiliation":[{"name":"Yale University , , , ,","place":["New Haven, Connecticut, United States, 06511"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Fei","family":"Hu","sequence":"additional","affiliation":[{"name":"ShanghaiTech University , , ,","place":["Shanghai, China, 201210"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Dong","family":"Zhang","sequence":"additional","affiliation":[{"name":"ShanghaiTech University , , ,","place":["Shanghai, China, 201210"]},{"name":"ShanghaiTech University , , ,","place":["Shanghai, China, 201210"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yang","family":"Lu","sequence":"additional","affiliation":[{"name":"ShanghaiTech University , , ,","place":["Shanghai, China, 201210"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Marvin L.","family":"Cohen","sequence":"additional","affiliation":[{"name":"University of California at Berkeley , , , ,","place":["Berkeley, California, United States, 94720"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Alex","family":"Zettl","sequence":"additional","affiliation":[{"name":"University of California at Berkeley , , , ,","place":["Berkeley, California, United States, 94720"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-7180-7237","authenticated-orcid":true,"given":"Kecheng","family":"Cao","sequence":"additional","affiliation":[{"name":"ShanghaiTech University , , ,","place":["Shanghai, China, 201210"]},{"name":"ShanghaiTech University , , ,","place":["Shanghai, China, 201210"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Cong","family":"Su","sequence":"additional","affiliation":[{"name":"Yale University , , , ,","place":["New Haven, Connecticut, United States, 06511"]},{"name":"University of California at Berkeley , , , ,","place":["Berkeley, California, United States, 94720"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-4725-1299","authenticated-orcid":true,"given":"Young Woo","family":"Choi","sequence":"additional","affiliation":[{"name":"University of California at Berkeley , , , ,","place":["Berkeley, California, United States, 94720"]},{"name":"Sogang University , , ,","place":["Seoul, Korea, 04107"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-5526-3746","authenticated-orcid":true,"given":"Qingqing","family":"Ji","sequence":"additional","affiliation":[{"name":"ShanghaiTech University , , ,","place":["Shanghai, China, 201210"]}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"316","published-online":{"date-parts":[[2026,10,5]]},"reference":[{"issue":"2","key":"2026101408321149600_cit1","doi-asserted-by":"publisher","first-page":"289","DOI":"10.1103\/RevModPhys.61.289","article-title":"Point Defects and Dopant Diffusion\nin Silicon","volume":"61","author":"Fahey","year":"1989","journal-title":"Rev. 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