{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,8,19]],"date-time":"2026-08-19T12:24:34Z","timestamp":1787142274437,"version":"build-2736575974"},"reference-count":32,"publisher":"American Chemical Society (ACS)","issue":"32","license":[{"start":{"date-parts":[[2026,8,9]],"date-time":"2026-08-09T00:00:00Z","timestamp":1786233600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2026,8,9]],"date-time":"2026-08-09T00:00:00Z","timestamp":1786233600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"},{"start":{"date-parts":[[2026,8,9]],"date-time":"2026-08-09T00:00:00Z","timestamp":1786233600000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-045"}],"funder":[{"DOI":"10.13039\/501100001809","name":"National Natural Science Foundation of China","doi-asserted-by":"publisher","award":["22208347"],"award-info":[{"award-number":["22208347"]}],"id":[{"id":"10.13039\/501100001809","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2026,8,19]]},"abstract":"<jats:title>Abstract<\/jats:title>\n                  <jats:p>Lithography plays a crucial role in the fabrication of intricate patterns. Materials that possess both lithographic capabilities and stimuli-responsive characteristics enable the realization of dynamic and controllable information processing. In this work, a self-assembled material with lithographic characteristics was obtained by using a photoresist as the photo-responsive layer and polyethyleneimine (PEI) as the additional layer. Interestingly, the synthesized photoresist based on 2-nitro-benzyl methacrylate undergoes a structural transition to form a polyacrylic acid (PAA) structure. Consequently, after lithography, the PEI\/PAA structure could be selectively formed in the exposed areas. The structures in the exposed and non-exposed areas exhibit different humidity-responsive behaviors; thus, dynamic and controllable processing of lithographic information can be achieved. Unlike other stimuli-responsive processes under strong acid\/base or ultraviolet light environments, these humidity-responsive processes have the advantages of mild conditions and environmental friendliness. This dynamic and controllable process based on the interaction with H2O is non-destructive and can achieve long-term cycling. Moreover, the nitrobenzyl-based photoresist exhibited excellent responsivity to 254 nm and electron-beam lithography (EBL), ultimately achieving a highest resolution of 40 nm. The structural changes occurring during the lithography process were investigated using ultraviolet\u2013visible (UV\u2013vis) spectroscopy, Fourier-transform infrared (FT-IR) spectroscopy, and X-ray photoelectron spectroscopy (XPS). The integration of lithography technique and responsive materials provides a novel approach for achieving dynamic and controllable information manipulation, with significant potential for diverse applications.<\/jats:p>","DOI":"10.1021\/acsami.6c10022","type":"journal-article","created":{"date-parts":[[2026,8,9]],"date-time":"2026-08-09T18:01:43Z","timestamp":1786298503000},"page":"44448-44457","source":"Crossref","is-referenced-by-count":0,"title":["Sustainable Reversible Patterning via Humidity-Switchable Self-Assembled Multilayers Induced by Photolithography"],"prefix":"10.1021","volume":"18","author":[{"given":"Lifei","family":"Liu","sequence":"first","affiliation":[{"name":"Institute of Process Engineering, Chinese Academy of Sciences , , ,","place":["Beijing, China, 100190"]},{"name":"University of Chinese Academy of Sciences , ,","place":["Beijing, China, 100049"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Bing","family":"Tian","sequence":"additional","affiliation":[{"name":"Institute of Process Engineering, Chinese Academy of Sciences , , ,","place":["Beijing, China, 100190"]},{"name":"University of Chinese Academy of Sciences , ,","place":["Beijing, China, 100049"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Tong","family":"Feng","sequence":"additional","affiliation":[{"name":"Institute of Process Engineering, Chinese Academy of Sciences , , ,","place":["Beijing, China, 100190"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Chonghui","family":"Li","sequence":"additional","affiliation":[{"name":"Institute of Process Engineering, Chinese Academy of Sciences , , ,","place":["Beijing, China, 100190"]},{"name":"University of Chinese Academy of Sciences , ,","place":["Beijing, China, 100049"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Weizhen","family":"Zhao","sequence":"additional","affiliation":[{"name":"Institute of Process Engineering, Chinese Academy of Sciences , , ,","place":["Beijing, China, 100190"]},{"name":"University of Chinese Academy of Sciences , ,","place":["Beijing, China, 100049"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-7324-989X","authenticated-orcid":true,"given":"Ting","family":"Song","sequence":"additional","affiliation":[{"name":"Institute of Process Engineering, Chinese Academy of Sciences , , ,","place":["Beijing, China, 100190"]},{"name":"University of Chinese Academy of Sciences , ,","place":["Beijing, China, 100049"]}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"316","published-online":{"date-parts":[[2026,8,9]]},"reference":[{"issue":"12","key":"2026081907183986900_cit1","doi-asserted-by":"publisher","DOI":"10.1002\/macp.202400472","article-title":"Stimuli-Responsive Functional Polymeric Materials: Recent Advances and Future Perspectives","volume":"226","author":"Dolui","year":"2025","journal-title":"Macromol. 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