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In this method, a photoresist mask is first patterned on an elastomeric polymer stamp and subsequently transferred onto a target substrate by thermally modulating interfacial adhesion and viscoelastic energy dissipation. The process enables high-fidelity pattern formation across a wide range of surfaces including semiconductors, metals, and insulators and even on a curved surface while preventing direct exposure of the target substrate and functional materials to solution-based lithographic chemicals. Utilizing the transferred photoresist pattern as a lift-off mask, the method further enabled patterning of zero-, one-, and two-dimensional colloidal nanomaterials as well as self-assembled molecular layers. Compared with the conventional shadow masking method, the transferred masks provided approximately 6-fold higher pattern precision, with a minimum pattern-edge curvature radius of approximately 0.75 \u03bcm. Raman and X-ray photoelectron spectroscopic analysis confirmed that the intrinsic properties of the patterned nanomaterials were preserved. As a functional demonstration, biphilic surfaces fabricated by the method showed a more than 3-fold increase in fog-harvesting efficiency compared with uniform hydrophobic surfaces owing to controlled droplet nucleation, growth, and coalescence. These findings establish dry mask transfer lithography as a broadly applicable platform for high-precision integration of chemically sensitive colloidal nanomaterials onto diverse substrates, offering strong potential for the fabrication of high-performance functional interfaces, nanodevices, displays, and energy-related systems.<\/jats:p>","DOI":"10.1021\/acsami.6c13121","type":"journal-article","created":{"date-parts":[[2026,10,12]],"date-time":"2026-10-12T12:01:37Z","timestamp":1791806497000},"page":"56795-56806","source":"Crossref","is-referenced-by-count":0,"title":["Dry Mask Transfer Lithography for High-Resolution Patterning of Nanomaterials and Molecular Interfaces on Arbitrary Substrates"],"prefix":"10.1021","volume":"18","author":[{"given":"Na Yoon","family":"Kim","sequence":"first","affiliation":[{"name":"Daegu Gyeongbuk Institute of Science & Technology , , ,","place":["Daegu, Republic of Korea, 42988"]},{"name":"Korea Institute of Industrial Technology , , 89 Yangdaegiro-gil, Ipjang-myeon, Seobuk-gu , , ,","place":["Cheonan-Si, Chungcheongnam-do, Republic of Korea, 31056"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Kyeong Jun","family":"Park","sequence":"additional","affiliation":[{"name":"Daegu Gyeongbuk Institute of Science & Technology , , ,","place":["Daegu, Republic of Korea, 42988"]},{"name":"Korea Institute of Industrial Technology , , 89 Yangdaegiro-gil, Ipjang-myeon, Seobuk-gu , , ,","place":["Cheonan-Si, Chungcheongnam-do, Republic of Korea, 31056"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Junhyung","family":"Kim","sequence":"additional","affiliation":[{"name":"Pohang University of Science and Technology , , 77 Cheongam-Ro , ,","place":["Pohang-Si, Republic of Korea, 37673"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-3206-8061","authenticated-orcid":true,"given":"Seok","family":"Kim","sequence":"additional","affiliation":[{"name":"Pohang University of Science and Technology , , 77 Cheongam-Ro , ,","place":["Pohang-Si, Republic of Korea, 37673"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-9925-2309","authenticated-orcid":true,"given":"Jaehyung","family":"Yu","sequence":"additional","affiliation":[{"name":"Chung-Ang University , , ,","place":["Seoul, Republic of Korea, 06974"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-1180-7830","authenticated-orcid":true,"given":"Hoe Joon","family":"Kim","sequence":"additional","affiliation":[{"name":"Daegu Gyeongbuk Institute of Science & Technology , , ,","place":["Daegu, Republic of Korea, 42988"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-7236-7683","authenticated-orcid":true,"given":"Hohyun","family":"Keum","sequence":"additional","affiliation":[{"name":"Korea Institute of Industrial Technology , , 89 Yangdaegiro-gil, Ipjang-myeon, Seobuk-gu , , ,","place":["Cheonan-Si, Chungcheongnam-do, Republic of Korea, 31056"]},{"name":"Chung-Ang University , , ,","place":["Seoul, Republic of Korea, 06974"]}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"316","published-online":{"date-parts":[[2026,10,12]]},"reference":[{"issue":"8","key":"2026102108064653000_cit1","doi-asserted-by":"publisher","first-page":"486","DOI":"10.1002\/nano.202300038","article-title":"Nanomaterials: An overview of synthesis, classification, characterization, and applications","volume":"4","author":"Mekuye","year":"2023","journal-title":"Nano Sel."},{"issue":"6","key":"2026102108064653000_cit2","doi-asserted-by":"publisher","first-page":"1821","DOI":"10.1039\/D0MA00807A","article-title":"Nanomaterials: a review of synthesis methods, properties, recent progress, and challenges","volume":"2","author":"Baig","year":"2021","journal-title":"Mater. 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