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Critical-dimension small-angle X-ray scattering (CD-SAXS) enables reconstruction of nanoscale patterns from angle-dependent scattering data, but measurements of organic, chemically active materials, such as photoresists, are strongly limited by beam-induced damage. Here, we demonstrate that CD-SAXS can be successfully applied to organic resists when X-ray exposure is carefully managed to mitigate beam damage. We quantify beam-induced damage in multiple resist systems by monitoring diffraction pattern evolution under continuous X-ray exposure, establishing a fluence threshold of \u223c1000 photons\/nm2 at 16.1 keV for the resist systems and measurement conditions investigated. We evaluate complementary strategies to extend the usable measurement window: reversing the sample orientation to exploit beam attenuation by the substrate (about sixfold dose reduction), increasing the photon energy, and reducing the angular sampling density.<\/jats:p>","DOI":"10.1021\/acsami.6c15289","type":"journal-article","created":{"date-parts":[[2026,10,9]],"date-time":"2026-10-09T19:08:04Z","timestamp":1791572884000},"page":"54062-54074","source":"Crossref","is-referenced-by-count":0,"title":["Mitigating X-ray-Induced Damage in CD-SAXS Metrology of EUV Resists"],"prefix":"10.1021","volume":"18","author":[{"ORCID":"https:\/\/orcid.org\/0000-0001-7938-1464","authenticated-orcid":true,"given":"Philipp Aldo","family":"Wieser","sequence":"first","affiliation":[{"name":"Brookhaven National Laboratory , , , ,","place":["Upton, New York, United States, 11973"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Xinpei","family":"Wu","sequence":"additional","affiliation":[{"name":"Brookhaven National Laboratory , , , ,","place":["Upton, New York, United States, 11973"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-8229-7108","authenticated-orcid":true,"given":"Nikhil","family":"Tiwale","sequence":"additional","affiliation":[{"name":"Brookhaven National Laboratory , , , ,","place":["Upton, New York, United States, 11973"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0009-0000-4866-4146","authenticated-orcid":true,"given":"Masafumi","family":"Fukuto","sequence":"additional","affiliation":[{"name":"Brookhaven National Laboratory , , , ,","place":["Upton, New York, United States, 11973"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Guillaume","family":"Freychet","sequence":"additional","affiliation":[{"name":"Universite\u0301 Grenoble Alpes, CEA-LETI , ,","place":["Grenoble, France, 38000"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-5570-8880","authenticated-orcid":true,"given":"Eliot","family":"Gann","sequence":"additional","affiliation":[{"name":"Brookhaven National Laboratory , , , ,","place":["Upton, New York, United States, 11973"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Dario","family":"Goldfarb","sequence":"additional","affiliation":[{"name":"IBM Thomas J. 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