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By using the NBPZ reagent in the amination step, the self-cross-linking of piperazine (PZ) could be completely suppressed, unlike using the PZ reagent. Consequently, the PZ-DTC group density of the fibrous grafted metal adsorbent synthesized through NBPZ attained 2.122 mmol-PZ-DTC\/g-adsorbent, which was approximately 6 times higher than that of the metal adsorbent synthesized through PZ. The fibrous grafted metal adsorbent with the PZ-DTC group selectively adsorbed heavy metal ions over light metal ions. Furthermore, it exhibited high adsorption capacity, particularly for Cu2+. The Cu2+ adsorption capacity was determined to be 1.903 mmol-Cu2+\/g-adsorbent by a batchwise adsorption test using a single-metal-ion aqueous solution at pH 6. The order of metal ion selectivity of the fibrous grafted metal adsorbent with the PZ-DTC group was Na+ &amp;lt; Mg2+, Ca2+, Co2+, Cd2+ &amp;lt; Pb2+ \u226a Cu2+, and Co2+ \u2248 Ni2+ &amp;lt; Zn2+ \u226a Cu2+. In addition, the fibrous grafted metal adsorbent with the PZ-DTC group did not lose its metal adsorption function even under highly alkaline conditions (pH 15). It could recover Cu2+ efficiently and selectively from a high-concentration Na+ aqueous solution at this pH. The Cu2+ adsorption capacity of the fibrous grafted metal adsorbent with the PZ-DTC group was 0.754 mmol-Cu2+\/g-adsorbent under a highly alkaline condition, a 10 M NaOH aqueous solution at pH 15. This value was approximately 2.4 times higher than that of the other grafted adsorbent with an amine-type functional group.<\/jats:p>","DOI":"10.1021\/acsomega.9b03799","type":"journal-article","created":{"date-parts":[[2020,2,7]],"date-time":"2020-02-07T10:09:40Z","timestamp":1581070180000},"page":"2947-2956","source":"Crossref","is-referenced-by-count":22,"title":["Synthesis of Fibrous Metal Adsorbent with a Piperazinyl-Dithiocarbamate\nGroup by Radiation-Induced Grafting and Its Performance"],"prefix":"10.1021","volume":"5","author":[{"ORCID":"https:\/\/orcid.org\/0000-0002-8976-7026","authenticated-orcid":true,"given":"Yuji","family":"Ueki","sequence":"first","affiliation":[{"name":"National Institutes for Quantum and Radiological Science and Technology , , 1233 Watanuki-machi , , ,","place":["Takasaki, Gunma, Japan, 370-1292"]}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Noriaki","family":"Seko","sequence":"additional","affiliation":[{"name":"National Institutes for Quantum and Radiological Science and Technology , , 1233 Watanuki-machi , , ,","place":["Takasaki, Gunma, Japan, 370-1292"]}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"316","published-online":{"date-parts":[[2020,2,7]]},"reference":[{"key":"2026090209251811100_cit1","doi-asserted-by":"publisher","first-page":"114","DOI":"10.1109\/N-SSC.2006.4785860","article-title":"Cramming\nmore components onto integrated circuits","volume":"38","author":"Moore","year":"1965","journal-title":"Electronics"},{"key":"2026090209251811100_cit2","unstructured":"TSMC and OIP Ecosystem Partners Deliver Industry\u2019s\nFirst Complete\nDesign Infrastructure for 5nm Process Technology;  (accessed 23 December 2019)."},{"key":"2026090209251811100_cit3","doi-asserted-by":"publisher","first-page":"2834","DOI":"10.1149\/1.2059240","article-title":"Mechanism of metallic particle growth\nand metal-induced pitting on Si wafer surface in wet chemical processing","volume":"141","author":"Morinaga","year":"1994","journal-title":"J. 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