{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,11]],"date-time":"2025-11-11T12:50:16Z","timestamp":1762865416242},"reference-count":37,"publisher":"American Chemical Society (ACS)","issue":"33","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["J. Phys. Chem. C"],"published-print":{"date-parts":[[2008,8,1]]},"DOI":"10.1021\/jp8037363","type":"journal-article","created":{"date-parts":[[2008,7,18]],"date-time":"2008-07-18T07:00:55Z","timestamp":1216364455000},"page":"12754-12759","source":"Crossref","is-referenced-by-count":24,"title":["Carboxylic Acids as Oxygen Sources for the Atomic Layer Deposition of High-\u03ba Metal Oxides"],"prefix":"10.1021","volume":"112","author":[{"given":"Erwan","family":"Rauwel","sequence":"first","affiliation":[{"name":"Departments of Chemistry and Ceramics, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal and IMEP, UMR CNRS 5130 and LMGP, UMR CNRS 5628, INPG-Minatec, BP 257, 38016 Grenoble cedex 1, France"}]},{"given":"Marc-Georg","family":"Willinger","sequence":"additional","affiliation":[{"name":"Departments of Chemistry and Ceramics, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal and IMEP, UMR CNRS 5130 and LMGP, UMR CNRS 5628, INPG-Minatec, BP 257, 38016 Grenoble cedex 1, France"}]},{"given":"Fr\u00e9d\u00e9rique","family":"Ducroquet","sequence":"additional","affiliation":[{"name":"Departments of Chemistry and Ceramics, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal and IMEP, UMR CNRS 5130 and LMGP, UMR CNRS 5628, INPG-Minatec, BP 257, 38016 Grenoble cedex 1, France"}]},{"given":"Protima","family":"Rauwel","sequence":"additional","affiliation":[{"name":"Departments of Chemistry and Ceramics, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal and IMEP, UMR CNRS 5130 and LMGP, UMR CNRS 5628, INPG-Minatec, BP 257, 38016 Grenoble cedex 1, France"}]},{"given":"Igor","family":"Matko","sequence":"additional","affiliation":[{"name":"Departments of Chemistry and Ceramics, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal and IMEP, UMR CNRS 5130 and LMGP, UMR CNRS 5628, INPG-Minatec, BP 257, 38016 Grenoble cedex 1, France"}]},{"given":"Dmitry","family":"Kiselev","sequence":"additional","affiliation":[{"name":"Departments of Chemistry and Ceramics, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal and IMEP, UMR CNRS 5130 and LMGP, UMR CNRS 5628, INPG-Minatec, BP 257, 38016 Grenoble cedex 1, France"}]},{"given":"Nicola","family":"Pinna","sequence":"additional","affiliation":[{"name":"Departments of Chemistry and Ceramics, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal and IMEP, UMR CNRS 5130 and LMGP, UMR CNRS 5628, INPG-Minatec, BP 257, 38016 Grenoble cedex 1, France"}]}],"member":"316","published-online":{"date-parts":[[2008,7,18]]},"reference":[{"key":"ref1\/cit1","unstructured":"Suntola, T.; Antson, J.U.S. Patent 4058430 1977."},{"key":"ref2\/cit2","doi-asserted-by":"crossref","unstructured":"Ritala, M.; Leskela, M.InHandbook of Thin Film Materials,H. S. NalwaEd.Academic Press:San Diego, CA, 2002; Vol. 1, pp103\u2212159","DOI":"10.1016\/B978-012512908-4\/50005-9"},{"key":"ref3\/cit3","doi-asserted-by":"crossref","first-page":"3403","DOI":"10.1002\/adma.200700079","volume":"19","author":"Knez M.","year":"2007","journal-title":"Adv. Mater."},{"key":"ref4\/cit4","doi-asserted-by":"crossref","first-page":"23","DOI":"10.1016\/S0921-5107(96)01617-0","volume":"41","author":"Niinisto L.","year":"1996","journal-title":"Mater. Sci. Eng., B"},{"key":"ref5\/cit5","doi-asserted-by":"crossref","first-page":"121301","DOI":"10.1063\/1.1940727","volume":"97","author":"Puurunen R. L.","year":"2005","journal-title":"J. Appl. Phys."},{"key":"ref6\/cit6","unstructured":"International Technology Roadmap for Semiconductors, Front End Process,http:\/\/public.itrs.net\/, 2005."},{"key":"ref7\/cit7","doi-asserted-by":"crossref","first-page":"1032","DOI":"10.1038\/35023243","volume":"406","author":"Kingon A. I.","year":"2000","journal-title":"Nature"},{"key":"ref8\/cit8","doi-asserted-by":"crossref","first-page":"484","DOI":"10.1063\/1.371888","volume":"87","author":"Wilk G. D.","year":"2000","journal-title":"J. Appl. Phys."},{"key":"ref9\/cit9","first-page":"192","volume":"27","author":"Wallace R. M.","year":"2002","journal-title":"Mater. Res. Bull."},{"key":"ref10\/cit10","doi-asserted-by":"crossref","first-page":"327","DOI":"10.1088\/0034-4885\/69\/2\/R02","volume":"69","author":"Robertson J.","year":"2006","journal-title":"Rep. Prog. Phys."},{"key":"ref11\/cit11","doi-asserted-by":"crossref","first-page":"2501","DOI":"10.1143\/JJAP.31.2501","volume":"31","author":"Hsu C. T.","year":"1992","journal-title":"Jpn. J. Appl. Phys"},{"key":"ref12\/cit12","doi-asserted-by":"crossref","first-page":"247","DOI":"10.1016\/0040-6090(77)90312-1","volume":"41","author":"Balog M.","year":"1977","journal-title":"Thin Solid Films"},{"key":"ref13\/cit13","doi-asserted-by":"crossref","first-page":"1897","DOI":"10.1063\/1.1458692","volume":"80","author":"Gutowski M.","year":"2002","journal-title":"Appl. Phys. Lett."},{"key":"ref14\/cit14","doi-asserted-by":"crossref","first-page":"1317","DOI":"10.1126\/science.1065824","volume":"294","author":"Bachtold A.","year":"2001","journal-title":"Science"},{"key":"ref15\/cit15","doi-asserted-by":"crossref","first-page":"1735","DOI":"10.1126\/science.1122797","volume":"311","author":"Chen Z.","year":"2006","journal-title":"Science"},{"key":"ref16\/cit16","doi-asserted-by":"crossref","first-page":"5038","DOI":"10.1088\/0957-4484\/17\/20\/002","author":"Marty L.","year":"2006","journal-title":"Nanotechnology"},{"key":"ref17\/cit17","doi-asserted-by":"crossref","first-page":"1443","DOI":"10.1002\/pssa.200406798","volume":"201","author":"Niinist\u00f6 L.","year":"2004","journal-title":"Phys. Status Solidi A"},{"key":"ref18\/cit18","doi-asserted-by":"crossref","first-page":"215","DOI":"10.1016\/j.cplett.2006.01.057","volume":"421","author":"Mukhopadhyay A. B.","year":"2006","journal-title":"Chem. Phys. Lett."},{"key":"ref19\/cit19","doi-asserted-by":"crossref","first-page":"G203","DOI":"10.1149\/1.1857791","volume":"152","author":"Triyoso D. H.","year":"2005","journal-title":"J. Electrochem. Soc."},{"key":"ref20\/cit20","doi-asserted-by":"crossref","first-page":"346","DOI":"10.1149\/1.1391145","volume":"3","author":"Kim Y. B.","year":"2000","journal-title":"Electrochem. Solid-State Lett."},{"key":"ref21\/cit21","doi-asserted-by":"crossref","first-page":"4051","DOI":"10.1063\/1.1425461","volume":"79","author":"Zhang X.","year":"2001","journal-title":"Appl. Phys. Lett."},{"key":"ref22\/cit22","doi-asserted-by":"crossref","first-page":"4758","DOI":"10.1063\/1.1585129","volume":"82","author":"Frank M. M.","year":"2003","journal-title":"Appl. Phys. Lett."},{"key":"ref23\/cit23","doi-asserted-by":"crossref","first-page":"2292","DOI":"10.1021\/cm970322a","volume":"9","author":"Vioux A.","year":"1997","journal-title":"Chem. Mater."},{"key":"ref24\/cit24","doi-asserted-by":"crossref","first-page":"7282","DOI":"10.1002\/chem.200600313","volume":"12","author":"Niederberger M.","year":"2006","journal-title":"Chem.\u2014Eur. J."},{"key":"ref25\/cit25","doi-asserted-by":"crossref","first-page":"793","DOI":"10.1021\/ar600035e","volume":"40","author":"Niederberger M.","year":"2007","journal-title":"Acc. Chem. Res."},{"key":"ref26\/cit26","doi-asserted-by":"crossref","first-page":"59","DOI":"10.1016\/j.progsolidstchem.2005.11.032","volume":"33","author":"Niederberger M.","year":"2005","journal-title":"Prog. Solid State Chem."},{"key":"ref27\/cit27","author":"Pinna N.","year":"2008","journal-title":"Angew. Chem., Int. Ed."},{"key":"ref28\/cit28","doi-asserted-by":"crossref","first-page":"319","DOI":"10.1126\/science.288.5464.319","volume":"288","author":"Ritala M.","year":"2000","journal-title":"Science"},{"key":"ref29\/cit29","author":"Clavel G.","journal-title":"J. Mater. Chem"},{"key":"ref30\/cit30","doi-asserted-by":"crossref","first-page":"3592","DOI":"10.1002\/anie.200705550","volume":"47","author":"Rauwel E.","year":"2008","journal-title":"Angew. Chem., Int. Ed."},{"key":"ref31\/cit31","doi-asserted-by":"crossref","first-page":"21","DOI":"10.1002\/1521-3862(20020116)8:1<21::AID-CVDE21>3.0.CO;2-0","volume":"8","author":"Rahtu A.","year":"2002","journal-title":"Chem. Vap. Deposition"},{"key":"ref32\/cit32","doi-asserted-by":"crossref","first-page":"4112","DOI":"10.1063\/1.1812832","volume":"85","author":"Kim S. K.","year":"2004","journal-title":"Appl. Phys. Lett."},{"key":"ref33\/cit33","doi-asserted-by":"crossref","first-page":"199","DOI":"10.1002\/1521-3862(20020903)8:5<199::AID-CVDE199>3.0.CO;2-U","volume":"8","author":"Kukli K.","year":"2002","journal-title":"Chem. Vap. Deposition"},{"key":"ref34\/cit34","doi-asserted-by":"crossref","first-page":"72","DOI":"10.1016\/0040-6090(94)90168-6","volume":"250","author":"Ritala M.","year":"1994","journal-title":"Thin Solid Films"},{"key":"ref35\/cit35","unstructured":"The GPC observed in the case of hafnia is sensibly larger that the one previously reported. This discrepancy is due to a recently implemented improvement of the ALD reactor."},{"key":"ref36\/cit36","doi-asserted-by":"crossref","first-page":"133103","DOI":"10.1063\/1.2058226","volume":"87","author":"Ho M. T.","year":"2005","journal-title":"Appl. Phys. Lett."},{"key":"ref37\/cit37","doi-asserted-by":"crossref","first-page":"C306","DOI":"10.1149\/1.1470659","volume":"149","author":"Jeon W.-S.","year":"2002","journal-title":"J. Electrochem. Soc."}],"container-title":["The Journal of Physical Chemistry C"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/pubs.acs.org\/doi\/pdf\/10.1021\/jp8037363","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2021,10,3]],"date-time":"2021-10-03T04:13:48Z","timestamp":1633234428000},"score":1,"resource":{"primary":{"URL":"https:\/\/pubs.acs.org\/doi\/10.1021\/jp8037363"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2008,7,18]]},"references-count":37,"journal-issue":{"issue":"33","published-print":{"date-parts":[[2008,8,1]]}},"alternative-id":["10.1021\/jp8037363"],"URL":"https:\/\/doi.org\/10.1021\/jp8037363","relation":{},"ISSN":["1932-7447","1932-7455"],"issn-type":[{"value":"1932-7447","type":"print"},{"value":"1932-7455","type":"electronic"}],"subject":[],"published":{"date-parts":[[2008,7,18]]}}}