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The NaCo<jats:sub>x<\/jats:sub>O<jats:sub>y<\/jats:sub> crystallized as hexagonal microsheets of 100\u2013200\u00a0nm thickness with the presence of some polyhedral nanocrystals. The surface area was in the range of 1.15\u20131.90\u00a0m<jats:sup>2<\/jats:sup>\u00a0g<jats:sup>\u22121<\/jats:sup>. X-ray photoelectron spectroscopy (XPS) analysis confirmed Co<jats:sup>2+<\/jats:sup> and Co<jats:sup>3+<\/jats:sup> sites in MOFs, which were preserved in NaCo<jats:sub>x<\/jats:sub>O<jats:sub>y<\/jats:sub>. The synthesized adsorbents were studied for room-temperature H<jats:sub>2<\/jats:sub>S removal in both dry and moist conditions. NaCo<jats:sub>x<\/jats:sub>O<jats:sub>y<\/jats:sub> adsorbents were found ~\u200980 times better than the MOF precursors. The maximum adsorption capacity of 168.2\u00a0mg\u00a0g<jats:sup>\u22121<\/jats:sup> was recorded for a 500\u00a0ppm H<jats:sub>2<\/jats:sub>S concentration flowing at a rate of 0.1\u00a0L\u00a0min<jats:sup>\u22121<\/jats:sup>. The adsorption capacity decreased in the moist condition due to the competitive nature of water molecules for the H<jats:sub>2<\/jats:sub>S-binding sites. The PXRD analysis predicted Co<jats:sub>3<\/jats:sub>S<jats:sub>4<\/jats:sub>, CoSO<jats:sub>4<\/jats:sub>, Co<jats:sub>3<\/jats:sub>O<jats:sub>4<\/jats:sub>, and Co(OH)<jats:sub>2<\/jats:sub> in the H<jats:sub>2<\/jats:sub>S-exposed sample. The XPS analysis confirmed the formation of sulfide, sulfur, and sulfate as the products of H<jats:sub>2<\/jats:sub>S oxidation at room temperature. The work reported here is the first study on the use of NaCo<jats:sub>x<\/jats:sub>O<jats:sub>y<\/jats:sub> type materials for H<jats:sub>2<\/jats:sub>S remediation.<\/jats:p>","DOI":"10.1038\/s41598-021-94265-7","type":"journal-article","created":{"date-parts":[[2021,7,19]],"date-time":"2021-07-19T10:03:18Z","timestamp":1626688998000},"update-policy":"https:\/\/doi.org\/10.1007\/springer_crossmark_policy","source":"Crossref","is-referenced-by-count":41,"title":["Metal organic framework derived NaCoxOy for room temperature hydrogen sulfide removal"],"prefix":"10.1038","volume":"11","author":[{"given":"Nishesh Kumar","family":"Gupta","sequence":"first","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jiyeol","family":"Bae","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Kwang Soo","family":"Kim","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"297","published-online":{"date-parts":[[2021,7,19]]},"reference":[{"key":"94265_CR1","doi-asserted-by":"publisher","first-page":"339","DOI":"10.1002\/cben.201600026","volume":"4","author":"OW Agbroko","year":"2017","unstructured":"Agbroko, O. 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