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This thinning approach can also be utilized for the preparation of monolayer MoS\n                    <jats:sub>2<\/jats:sub>\n                    .\n                  <\/jats:p>","DOI":"10.1039\/d3nh00358b","type":"journal-article","created":{"date-parts":[[2023,10,4]],"date-time":"2023-10-04T23:01:38Z","timestamp":1696460498000},"page":"132-142","update-policy":"https:\/\/doi.org\/10.1039\/rsc_crossmark_policy","source":"Crossref","is-referenced-by-count":10,"title":["Sublimation-based wafer-scale monolayer WS\n                    <sub>2<\/sub>\n                    formation\n                    <i>via<\/i>\n                    self-limited thinning of few-layer WS\n                    <sub>2<\/sub>"],"prefix":"10.1039","volume":"9","author":[{"ORCID":"https:\/\/orcid.org\/0000-0002-6620-8889","authenticated-orcid":false,"given":"Mingxi","family":"Chen","sequence":"first","affiliation":[{"name":"Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology 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Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Republic of Singapore"},{"name":"Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117583, Republic of Singapore"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-1557-1469","authenticated-orcid":false,"given":"Wen-Ya","family":"Wu","sequence":"additional","affiliation":[{"name":"Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Republic of Singapore"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-2606-8073","authenticated-orcid":false,"given":"James","family":"Lourembam","sequence":"additional","affiliation":[{"name":"Institute of Materials Research and Engineering (IMRE), Agency for 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